We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for slurry.
ipros is IPROS GMS ・ IPROS One of the largest technical database sites in Japan that collects information on.

slurry Product List and Ranking from 25 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

slurry Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

  1. アイエムティー Wakayama//Testing, Analysis and Measurement
  2. ピュアオンジャパン Kanagawa//Chemical
  3. null/null
  4. 4 null/null
  5. 5 TOPPANインフォメディア Tokyo//others
Go to Company Ranking

slurry Product ranking

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

  1. Diamond slurry for sample grinding アイエムティー
  2. Coated electrodes for lithium-ion batteries (LIB) / electrode slurry
  3. Pre-CMP slurry: Reducing CMP process time ピュアオンジャパン
  4. 4 Optical material series "ULTRA-SOL OPTIQPRO" ピュアオンジャパン
  5. 5 2025-2026 Edition: Current Status and Future Outlook of CMP Slurries for Semiconductors

slurry Product List

1～15 item / All 49 items

Displayed results
Sapphire polishing RCD diamond slurry

Sapphire polishing RCD diamond slurry

Sapphire polishing RCD diamond slurry

Grish Corporation's diamond slurry comes in two types: single crystal diamond and RCD diamond, depending on the type of diamond. By harmonizing carefully selected diamond particles and dispersants, we can manufacture original diamond slurries tailored to your applications and requests. It is particularly suitable for lapping and polishing processes that require high precision, mainly for metal materials, sapphire substrates, and ceramics.

  • Other abrasives
  • Other consumables

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Water-based and oil-based wrapping liquid "Diamond Slurry"

Water-based and oil-based wrapping liquid "Diamond Slurry"

We offer a variety of single crystals, polycrystals, and various particle sizes, making it possible to provide the products you desire!

"Diamond slurry" is used for polishing various materials such as magnetic heads, ceramics, and metals. It has good dispersion of diamonds and is resistant to scratches and other damage. We offer a lineup of water-based diamond slurry series PRA (polycrystalline) and PRB (single crystal), as well as oil-based diamond slurry series PBP (polycrystalline) and PBQ (single crystal). 【Features of Water-Based Diamond Slurry Series PRA (Polycrystalline) and PRB (Single Crystal)】 - Excellent lubricity and resistant to liquid drainage - Superior rust and corrosion resistance, suitable for general metal polishing - Good washability with water - High polishing rate allows for cost reduction - Various types of liquids are available *For more details, please refer to the PDF document or feel free to contact us.

  • Other abrasives

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Diamond slurry (abrasive)

Diamond slurry (abrasive)

Diamond slurry classified by Kemet's advanced classification technology.

【Product PR】 This is diamond slurry classified using advanced classification technology by Kemet. We offer both polycrystalline and single crystal diamonds, and you can choose from aqueous or oil-based solvents. 【Features】 ◆ Custom-made options are available upon request. The basic diamond size ranges from approximately 1/10 to 15 micrometers, but other sizes can also be custom-made according to your requirements. ◆ When used in conjunction with Kemet plates, it is possible to achieve high-precision finishes at high polishing rates. Samples are available upon request. *Please note that it may take some time for the samples to arrive. Thank you for your understanding in advance. For more details, please refer to the PDF or feel free to contact us.

  • Other abrasives

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
CMP slurry

CMP slurry

Widely customizable CMP slurry

CMP (Chemical Mechanical Polishing) slurry is used in the semiconductor manufacturing process to polish the surface of substrates. Chemical etching softens the material, and mechanical abrasion removes the material, resulting in the flattening of the original three-dimensional shape. This is the mechanism of CMP. Our CMP slurry has a proven track record for various applications, including copper wiring for semiconductor circuit miniaturization and speed enhancement, low-temperature sputtering for cost-effective aluminum wiring, and compounds that excel in high-speed signal processing. It is composed of a chemical reaction solution and nano-sized polishing particles, characterized by minimal generation of coarse particles and sedimentation, ensuring stable quality. *Please feel free to contact us.*

  • Wafer processing/polishing equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Kemet Diamond Slurry

Kemet Diamond Slurry

Classifying diamonds in-house! Introducing the characteristics of "water-based (W2)" and "oil-based (O3)" as well as the polishing targets!

"Kemet Diamond Slurry" offers a wide range of particle sizes, concentrations, and solutions to meet the needs of the lapping and polishing process. We provide two types of slurries: "Water-based (W2)," which has excellent cleaning properties and achieves a fast processing rate, and "Oil-based (O3)," which excels in lubrication and achieves a high surface roughness. Additionally, we can also provide slurries with other particle sizes. 【Features】 <Water-based (W2)> ■ Characteristics: Excellent cleaning properties and fast processing rate ■ Polishing targets: Sapphire, SiC, SUS304, SUS316, carbon, cemented carbide, ceramics, etc. <Oil-based (O3)> ■ Characteristics: Excellent lubrication and high surface roughness ■ Polishing targets: General iron-based materials, workpieces prone to rust *For more details, please refer to the PDF document or feel free to contact us.

  • Other abrasives

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Diamond slurry for sample grinding

Diamond slurry for sample grinding

Uniform particle size distribution achieved through an advanced grading system.

This is a product from one of the few diamond manufacturers in the world. It maintains a uniform particle size distribution thanks to an advanced grading system. The abrasive particles do not settle and maintain a stable colloidal state. Affordable pricing. An all-in-one type that does not require lubricants is also available.*1 Using the dedicated spray bottle (S90KS-0337) allows for efficient spraying without waste. Diamond suspension Poly & Mono. *Please purchase it together with the cloth for sample polishing.

  • Other abrasives

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
"Water-based polycrystalline diamond slurry" Diamond Push

"Water-based polycrystalline diamond slurry" Diamond Push

High dispersion leads to high efficiency and a clean finish!

【Product Description】 *High-quality industrial diamond powder, finely granulated with advanced technology, maintains a highly dispersed state without aggregation or sedimentation for a long time, making it very easy to use. It allows for continuous polishing at a consistent concentration, resulting in high efficiency and a clean finish. 【Features】 1. Highly dispersed type that does not aggregate or settle for a long time. It provides a uniform and excellent polishing surface. 2. With a large particle size and very high concentration, it offers strong polishing power and improves work efficiency. 3. The polycrystalline diamond features a hybrid structure that combines a high number of cutting edges with "flexibility." It results in a good finish and long lifespan. 4. Water-based type that is less likely to cause scratches on the polishing surface. After use, simply rinse with water or wipe off to complete the task. 5. One-push spray method that effectively reaches the areas to be polished without waste.

  • Other abrasives
  • Other Auto Parts
  • Other molds

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Diamond slurry

Diamond slurry

Diamond slurry, suspension

Features: Diamond slurry is a mixture of carefully selected high-quality diamond abrasives with liquids such as water or oil. It is widely used for polishing hard materials such as silicon wafers, gemstones, optical lenses, ceramics, hard disks, and hard alloys. Depending on the type of diamond, there are three varieties: single crystal, polycrystalline, and nano. We also provide original polishing slurry tailored to the products you handle.

  • Grindstone
  • Other abrasives
  • Diamond cutter

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Diamond slurry

Diamond slurry

This is an introduction to diamond slurry for smoothing the surface of semiconductor package substrates.

The product smooths the surface of semiconductor package substrates. The type is POLYCRYSTALLINE DIAMOND, with a particle size of 2-4/D10 (2.3≦), D50 (3.2±0.5μm), D99 (7.5≧). Additionally, the color is transparent, and after material dispersion, it appears dark gray or black, with a viscosity of 3.6 (±0.2). 【Specifications】 ■ Viscosity (40℃): 3.6 (±0.2) ■ Powder: 0.25% or more ■ Specific gravity (23℃): 1.05–12g/cm3 ■ Flash point: 210℃ *For more details, please refer to the PDF document or feel free to contact us.

  • Other office supplies

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
High-performance natural material (additive): cellulose nanofiber slurry

High-performance natural material (additive): cellulose nanofiber slurry

It is a natural-derived high-performance additive that has functions such as high viscosity and high transparency, which are superior to conventional additives that do not exist in traditional products.

"AUROVISCO" is a water dispersion of ultra-fine wood fiber cellulose nanofiber (CNF) with a fiber width of 3nm. By adding a small amount to water-based liquid agents, the following outstanding functions are expected to be imparted. <Functions> - High transparency - High viscosity - dispersion stability - Water retention - Coating stability function - Thixotropy <Applications> - Thickening and dispersing agents for paints and inks: dispersion stability of pigments and additives / coating film stability - Cleaning and disinfectant solutions: dispersion of abrasives, etc., and coating film stability after application of liquid agents - Ceramic products such as concrete: reinforcing effect for ceramic products *The Oji Group has adopted the "phosphate esterification method" as an effective technique to reduce the energy required for fine processing during manufacturing. This method has enabled the production of high-quality (high transparency, high viscosity, thixotropic) cellulose nanofibers with higher production efficiency compared to conventional methods. In 2017, the cellulose nanofiber production facility began operation at the Oji Paper Tomioka Plant.

  • Su_01.png
  • Su04.png
  • Organic Natural Materials

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Single crystal diamond slurry & RCD diamond slurry

Single crystal diamond slurry & RCD diamond slurry

Single crystal diamond slurry & RCD diamond slurry

Features ◆Single Crystal Diamond Slurry Single crystal diamond slurry has high grinding power and enables low-cost processing, making it widely used for grinding and polishing hard materials. ◆RCD Diamond Slurry RCD diamond slurry is harmonized with our proprietary RCD diamond powder and advanced dispersion technology, providing a diamond slurry that is resistant to scratching and has high dispersion stability. It is primarily ideal for polishing processes of sapphire, ceramics, and hard alloys.

  • Other abrasives
  • Other consumables

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
CMP slurry

CMP slurry

CMP slurry

Features ◆ Uniform particle size (sharp particle size distribution, spherical particles). ◆ High efficiency (unique formulation, stable pH). ◆ High flatness (surface quality: Ra < 0.2 nm, TTV < 3 μm). ◆ High number of circulation uses. ◆ Capable of low-temperature polishing (below 35°C). ◆ We offer a specially formulated slurry for processing SIC wafers. ◆ Neutral and weakly acidic slurries are available for aluminum nitride processing.

  • Other abrasives
  • Other consumables

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
CO・AO・SC polishing slurry

CO・AO・SC polishing slurry

CO・AO・SC polishing slurry

Features ◆ Excellent polishing rate. ◆ Non-agglomerating, high dispersibility. ◆ Uniform and good finish surface can be obtained.

  • Other abrasives
  • Other consumables

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Precision Grinding Slurry "Nanopure(TM)"

Precision Grinding Slurry "Nanopure(TM)"

Polishing slurry that achieves nano-level surface quality.

The Nanopure(TM) series is a polishing slurry primarily used for primary polishing, secondary polishing, finishing polishing, and edge polishing of silicon wafers. The abrasive particles are made of high-purity colloidal silica, achieving excellent polishing performance through an optimal blend of additives. We will propose the most suitable product lineup based on your objectives and applications.

  • Other abrasives

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration

Search Keywords Related to slurry

COPYRIGHT © 2001-2025 IPROS CORPORATION ALL RIGHTS RESERVED.