slurryのメーカーや取扱い企業、製品情報、参考価格、ランキングをまとめています。
イプロスは、 製造業 BtoB における情報を集めた国内最大級の技術データベースサイトです。

slurry - メーカー・企業26社の製品一覧とランキング

更新日: 集計期間:Nov 05, 2025~Dec 02, 2025
※当サイトの各ページの閲覧回数を元に算出したランキングです。

slurryのメーカー・企業ランキング

更新日: 集計期間:Nov 05, 2025~Dec 02, 2025
※当サイトの各ページの閲覧回数を元に算出したランキングです。

  1. ピュアオンジャパン Kanagawa//Chemical
  2. アイエムティー Wakayama//Testing, Analysis and Measurement
  3. null/null
  4. 4 TOPPANインフォメディア Tokyo//others
  5. 5 MFCテクノロジー Saitama//Other manufacturing

slurryの製品ランキング

更新日: 集計期間:Nov 05, 2025~Dec 02, 2025
※当サイトの各ページの閲覧回数を元に算出したランキングです。

  1. Diamond slurry for sample grinding アイエムティー
  2. Coated electrodes for lithium-ion batteries (LIB) / electrode slurry
  3. Diamond slurry for wire saw "WSG": Glycol-based ピュアオンジャパン
  4. 4 CMP slurry (chemical mechanical polishing liquid abrasive) TOPPANインフォメディア
  5. 5 Recycled CMP slurry MFCテクノロジー

slurryの製品一覧

1~15 件を表示 / 全 50 件

表示件数

Sapphire polishing RCD diamond slurry

Sapphire polishing RCD diamond slurry

Grish Corporation's diamond slurry comes in two types: single crystal diamond and RCD diamond, depending on the type of diamond. By harmonizing carefully selected diamond particles and dispersants, we can manufacture original diamond slurries tailored to your applications and requests. It is particularly suitable for lapping and polishing processes that require high precision, mainly for metal materials, sapphire substrates, and ceramics.

  • Other abrasives
  • Other consumables

ブックマークに追加いたしました

ブックマーク一覧

ブックマークを削除いたしました

ブックマーク一覧

これ以上ブックマークできません

会員登録すると、ブックマークできる件数が増えて、ラベルをつけて整理することもできます

無料会員登録

Water-based and oil-based wrapping liquid "Diamond Slurry"

We offer a variety of single crystals, polycrystals, and various particle sizes, making it possible to provide the products you desire!

"Diamond slurry" is used for polishing various materials such as magnetic heads, ceramics, and metals. It has good dispersion of diamonds and is resistant to scratches and other damage. We offer a lineup of water-based diamond slurry series PRA (polycrystalline) and PRB (single crystal), as well as oil-based diamond slurry series PBP (polycrystalline) and PBQ (single crystal). 【Features of Water-Based Diamond Slurry Series PRA (Polycrystalline) and PRB (Single Crystal)】 - Excellent lubricity and resistant to liquid drainage - Superior rust and corrosion resistance, suitable for general metal polishing - Good washability with water - High polishing rate allows for cost reduction - Various types of liquids are available *For more details, please refer to the PDF document or feel free to contact us.

  • Other abrasives

ブックマークに追加いたしました

ブックマーク一覧

ブックマークを削除いたしました

ブックマーク一覧

これ以上ブックマークできません

会員登録すると、ブックマークできる件数が増えて、ラベルをつけて整理することもできます

無料会員登録

Diamond slurry (abrasive)

Diamond slurry classified by Kemet's advanced classification technology.

【Product PR】 This is diamond slurry classified using advanced classification technology by Kemet. We offer both polycrystalline and single crystal diamonds, and you can choose from aqueous or oil-based solvents. 【Features】 ◆ Custom-made options are available upon request. The basic diamond size ranges from approximately 1/10 to 15 micrometers, but other sizes can also be custom-made according to your requirements. ◆ When used in conjunction with Kemet plates, it is possible to achieve high-precision finishes at high polishing rates. Samples are available upon request. *Please note that it may take some time for the samples to arrive. Thank you for your understanding in advance. For more details, please refer to the PDF or feel free to contact us.

  • Other abrasives

ブックマークに追加いたしました

ブックマーク一覧

ブックマークを削除いたしました

ブックマーク一覧

これ以上ブックマークできません

会員登録すると、ブックマークできる件数が増えて、ラベルをつけて整理することもできます

無料会員登録

CMP slurry

Widely customizable CMP slurry

CMP (Chemical Mechanical Polishing) slurry is used in the semiconductor manufacturing process to polish the surface of substrates. Chemical etching softens the material, and mechanical abrasion removes the material, resulting in the flattening of the original three-dimensional shape. This is the mechanism of CMP. Our CMP slurry has a proven track record for various applications, including copper wiring for semiconductor circuit miniaturization and speed enhancement, low-temperature sputtering for cost-effective aluminum wiring, and compounds that excel in high-speed signal processing. It is composed of a chemical reaction solution and nano-sized polishing particles, characterized by minimal generation of coarse particles and sedimentation, ensuring stable quality. *Please feel free to contact us.*

  • Wafer processing/polishing equipment

ブックマークに追加いたしました

ブックマーク一覧

ブックマークを削除いたしました

ブックマーク一覧

これ以上ブックマークできません

会員登録すると、ブックマークできる件数が増えて、ラベルをつけて整理することもできます

無料会員登録

Kemet Diamond Slurry

Classifying diamonds in-house! Introducing the characteristics of "water-based (W2)" and "oil-based (O3)" as well as the polishing targets!

"Kemet Diamond Slurry" offers a wide range of particle sizes, concentrations, and solutions to meet the needs of the lapping and polishing process. We provide two types of slurries: "Water-based (W2)," which has excellent cleaning properties and achieves a fast processing rate, and "Oil-based (O3)," which excels in lubrication and achieves a high surface roughness. Additionally, we can also provide slurries with other particle sizes. 【Features】 <Water-based (W2)> ■ Characteristics: Excellent cleaning properties and fast processing rate ■ Polishing targets: Sapphire, SiC, SUS304, SUS316, carbon, cemented carbide, ceramics, etc. <Oil-based (O3)> ■ Characteristics: Excellent lubrication and high surface roughness ■ Polishing targets: General iron-based materials, workpieces prone to rust *For more details, please refer to the PDF document or feel free to contact us.

  • Other abrasives

ブックマークに追加いたしました

ブックマーク一覧

ブックマークを削除いたしました

ブックマーク一覧

これ以上ブックマークできません

会員登録すると、ブックマークできる件数が増えて、ラベルをつけて整理することもできます

無料会員登録

Diamond slurry for sample grinding

Uniform particle size distribution achieved through an advanced grading system.

This is a product from one of the few diamond manufacturers in the world. It maintains a uniform particle size distribution thanks to an advanced grading system. The abrasive particles do not settle and maintain a stable colloidal state. Affordable pricing. An all-in-one type that does not require lubricants is also available.*1 Using the dedicated spray bottle (S90KS-0337) allows for efficient spraying without waste. Diamond suspension Poly & Mono. *Please purchase it together with the cloth for sample polishing.

  • Other abrasives

ブックマークに追加いたしました

ブックマーク一覧

ブックマークを削除いたしました

ブックマーク一覧

これ以上ブックマークできません

会員登録すると、ブックマークできる件数が増えて、ラベルをつけて整理することもできます

無料会員登録

"Water-based polycrystalline diamond slurry" Diamond Push

High dispersion leads to high efficiency and a clean finish!

【Product Description】 *High-quality industrial diamond powder, finely granulated with advanced technology, maintains a highly dispersed state without aggregation or sedimentation for a long time, making it very easy to use. It allows for continuous polishing at a consistent concentration, resulting in high efficiency and a clean finish. 【Features】 1. Highly dispersed type that does not aggregate or settle for a long time. It provides a uniform and excellent polishing surface. 2. With a large particle size and very high concentration, it offers strong polishing power and improves work efficiency. 3. The polycrystalline diamond features a hybrid structure that combines a high number of cutting edges with "flexibility." It results in a good finish and long lifespan. 4. Water-based type that is less likely to cause scratches on the polishing surface. After use, simply rinse with water or wipe off to complete the task. 5. One-push spray method that effectively reaches the areas to be polished without waste.

  • Other abrasives
  • Other Auto Parts
  • Other molds

ブックマークに追加いたしました

ブックマーク一覧

ブックマークを削除いたしました

ブックマーク一覧

これ以上ブックマークできません

会員登録すると、ブックマークできる件数が増えて、ラベルをつけて整理することもできます

無料会員登録

Cartridge-type mechanical seal for stationary slurry, PB-C series

Slurry cartridge-type stationary mechanical seal

This is a cartridge seal that incorporates a sleeve and mechanical seal compactly into the flange. It features a stationary design with a high-quality O-ring for the secondary seal, ensuring that components like springs and drive pins are non-contact, providing stable sealing performance against slurries. For more details, please contact us or download the catalog. Slurry pumps (horizontal slurry pumps) (vertical slurry pumps) Chemical pumps (various chemical pumps) Mixers (mixers) (kneaders) (homogenizers) (ribbon mixers)

  • Other machine elements

ブックマークに追加いたしました

ブックマーク一覧

ブックマークを削除いたしました

ブックマーク一覧

これ以上ブックマークできません

会員登録すると、ブックマークできる件数が増えて、ラベルをつけて整理することもできます

無料会員登録

Diamond slurry

Diamond slurry, suspension

Features: Diamond slurry is a mixture of carefully selected high-quality diamond abrasives with liquids such as water or oil. It is widely used for polishing hard materials such as silicon wafers, gemstones, optical lenses, ceramics, hard disks, and hard alloys. Depending on the type of diamond, there are three varieties: single crystal, polycrystalline, and nano. We also provide original polishing slurry tailored to the products you handle.

  • Grindstone
  • Other abrasives
  • Diamond cutter

ブックマークに追加いたしました

ブックマーク一覧

ブックマークを削除いたしました

ブックマーク一覧

これ以上ブックマークできません

会員登録すると、ブックマークできる件数が増えて、ラベルをつけて整理することもできます

無料会員登録

Diamond slurry

This is an introduction to diamond slurry for smoothing the surface of semiconductor package substrates.

The product smooths the surface of semiconductor package substrates. The type is POLYCRYSTALLINE DIAMOND, with a particle size of 2-4/D10 (2.3≦), D50 (3.2±0.5μm), D99 (7.5≧). Additionally, the color is transparent, and after material dispersion, it appears dark gray or black, with a viscosity of 3.6 (±0.2). 【Specifications】 ■ Viscosity (40℃): 3.6 (±0.2) ■ Powder: 0.25% or more ■ Specific gravity (23℃): 1.05–12g/cm3 ■ Flash point: 210℃ *For more details, please refer to the PDF document or feel free to contact us.

  • Other office supplies

ブックマークに追加いたしました

ブックマーク一覧

ブックマークを削除いたしました

ブックマーク一覧

これ以上ブックマークできません

会員登録すると、ブックマークできる件数が増えて、ラベルをつけて整理することもできます

無料会員登録

High-performance natural material (additive): cellulose nanofiber slurry

It is a natural-derived high-performance additive that has functions such as high viscosity and high transparency, which are superior to conventional additives that do not exist in traditional products.

"AUROVISCO" is a water dispersion of ultra-fine wood fiber cellulose nanofiber (CNF) with a fiber width of 3nm. By adding a small amount to water-based liquid agents, the following outstanding functions are expected to be imparted. <Functions> - High transparency - High viscosity - dispersion stability - Water retention - Coating stability function - Thixotropy <Applications> - Thickening and dispersing agents for paints and inks: dispersion stability of pigments and additives / coating film stability - Cleaning and disinfectant solutions: dispersion of abrasives, etc., and coating film stability after application of liquid agents - Ceramic products such as concrete: reinforcing effect for ceramic products *The Oji Group has adopted the "phosphate esterification method" as an effective technique to reduce the energy required for fine processing during manufacturing. This method has enabled the production of high-quality (high transparency, high viscosity, thixotropic) cellulose nanofibers with higher production efficiency compared to conventional methods. In 2017, the cellulose nanofiber production facility began operation at the Oji Paper Tomioka Plant.

  • Su_01.png
  • Su04.png
  • Organic Natural Materials

ブックマークに追加いたしました

ブックマーク一覧

ブックマークを削除いたしました

ブックマーク一覧

これ以上ブックマークできません

会員登録すると、ブックマークできる件数が増えて、ラベルをつけて整理することもできます

無料会員登録

Single crystal diamond slurry & RCD diamond slurry

Single crystal diamond slurry & RCD diamond slurry

Features ◆Single Crystal Diamond Slurry Single crystal diamond slurry has high grinding power and enables low-cost processing, making it widely used for grinding and polishing hard materials. ◆RCD Diamond Slurry RCD diamond slurry is harmonized with our proprietary RCD diamond powder and advanced dispersion technology, providing a diamond slurry that is resistant to scratching and has high dispersion stability. It is primarily ideal for polishing processes of sapphire, ceramics, and hard alloys.

  • Other abrasives
  • Other consumables

ブックマークに追加いたしました

ブックマーク一覧

ブックマークを削除いたしました

ブックマーク一覧

これ以上ブックマークできません

会員登録すると、ブックマークできる件数が増えて、ラベルをつけて整理することもできます

無料会員登録

CMP slurry

CMP slurry

Features ◆ Uniform particle size (sharp particle size distribution, spherical particles). ◆ High efficiency (unique formulation, stable pH). ◆ High flatness (surface quality: Ra < 0.2 nm, TTV < 3 μm). ◆ High number of circulation uses. ◆ Capable of low-temperature polishing (below 35°C). ◆ We offer a specially formulated slurry for processing SIC wafers. ◆ Neutral and weakly acidic slurries are available for aluminum nitride processing.

  • Other abrasives
  • Other consumables

ブックマークに追加いたしました

ブックマーク一覧

ブックマークを削除いたしました

ブックマーク一覧

これ以上ブックマークできません

会員登録すると、ブックマークできる件数が増えて、ラベルをつけて整理することもできます

無料会員登録

CO・AO・SC polishing slurry

CO・AO・SC polishing slurry

Features ◆ Excellent polishing rate. ◆ Non-agglomerating, high dispersibility. ◆ Uniform and good finish surface can be obtained.

  • Other abrasives
  • Other consumables

ブックマークに追加いたしました

ブックマーク一覧

ブックマークを削除いたしました

ブックマーク一覧

これ以上ブックマークできません

会員登録すると、ブックマークできる件数が増えて、ラベルをつけて整理することもできます

無料会員登録

slurryに関連する検索キーワード