Last Updated： Aggregation Period:May 27, 2026～Jun 23, 2026
This ranking is based on the number of page views on our site.
Last Updated： Aggregation Period:May 27, 2026～Jun 23, 2026
This ranking is based on the number of page views on our site.
Last Updated： Aggregation Period:May 27, 2026～Jun 23, 2026
This ranking is based on the number of page views on our site.
61～68 item / All 68 items
This is a support service for customers using Bronco products. You can use our service line available 24 hours a day, 7 days a week.
This is a service system for customers using Bronco products. Thanks to our global service network, we can also provide support at night.
![[English Market Research Report] Global Market for Mass Flow Controllers](https://image.mono.ipros.com/public/product/image/76a/2001155813/IPROS2025657915488069472.png?w=280&h=280)
"Free samples" are currently available! Please check the application method from the [PDF Download] button, or apply directly through the related links.
The mass flow controller market size is expected to reach 3 billion USD by 2030, with a projected market growth of 8.3% CAGR during the forecast period. In 2022, the market reached a volume of 1,980,600 units, achieving a growth of 8.1% (2019-2022). Furthermore, alternative energy sources often rely on precise gas flow control during the production process. For example, in the manufacturing of solar cells, MFCs control the flow of gases used in the chemical vapor deposition (CVD) process to deposit thin films of semiconductor materials on substrates. Therefore, the demand for alternative energy sources will drive market growth.
Acquired certification from the High-Pressure Gas Safety Association (KHK). For gas control in the heat treatment process.
In the metal heat treatment industry, it is essential to accurately and stably control the gas flow in the heat treatment process, which significantly affects product quality. In particular, the atmosphere gas within the heat treatment furnace directly impacts the hardness and strength of the products, making proper flow management crucial for reducing the occurrence of defective products. The SLA5800 series accommodates a variety of gases used in heat treatment processes, such as hydrogen, methane, LNG, carbon dioxide, and ammonia, achieving high reproducibility and stability required for atmosphere control. Furthermore, as a KHK certified product, it simplifies inspection and application procedures for high-pressure gas equipment, supporting smooth equipment installation. Additionally, by adopting an elastomer seal structure, it achieves an excellent balance between cost and durability. This also contributes to reducing maintenance burdens during long-term operation, supporting the stable operation of heat treatment equipment. 【Usage Scenarios】 - Gas supply to heat treatment furnaces - Flow control of atmosphere gases - High-precision temperature management 【Benefits of Implementation】 - Improvement in heat treatment process quality - Reduction in defect rates - Simplification of procedures related to high-pressure gases
Accelerating research and development with precise gas control. Smooth procedures with KHK certification obtained.
In various experiments conducted at research institutions, the ability to accurately control and measure gas flow rates and pressures significantly affects the reliability and reproducibility of experimental results. This is particularly true for experiments involving gases such as hydrogen, methane, LNG, carbon dioxide, and ammonia, especially in carbon-neutral related research, where even slight control errors can lead to variations in results and uncertainties in evaluations. Inaccurate gas control undermines the reproducibility of experimental conditions and can lead to increased verification work and delays in research schedules. The SLA5800 series addresses these challenges in research settings by providing high-precision and stable gas flow control and measurement performance. It strongly supports research and development by improving the reproducibility of experimental conditions and ensuring the reliability of data. Additionally, its design allows for compatibility with a wide range of gas types, making it a versatile mass flow controller that can flexibly adapt to various research themes, from fundamental research to applied research and evaluation tests. **Usage Scenarios** - Gas analysis - Reaction experiments - Material synthesis - Fuel cell research **Benefits of Implementation** - Improved reliability of experimental data - Enhanced research efficiency - Simplification of procedures related to high-pressure gases
Precision mass flow controller. Enhances the accuracy of the mixing process and contributes to the stabilization of pharmaceutical quality.
In pharmaceutical manufacturing, even slight fluctuations in the mixing process flow can affect the efficacy and safety of the product. Therefore, high-precision and stable control of gas flow is essential. The SLAMf series mass flow controllers achieve optimized formulation balance through high-precision control and excellent long-term stability. They support improved consistency in quality across a wide range of processes, from manufacturing to research and development. 【Application Scenarios】 - Gas mixing and supply control in pharmaceutical manufacturing - Precise gas mixing in research and development - Flow measurement and monitoring in quality control processes 【Benefits of Implementation】 - Stabilization of product quality through improved mixing accuracy - Realization of highly reproducible process control - Increased manufacturing efficiency and reduced losses
GP200 metal-sealed mass flow controller that maximizes the best performance.
In various experiments conducted at research institutions, the accuracy of flow control significantly affects the reliability of data. Particularly in the microflow range, even slight fluctuations can lead to variations in measurement results and decreased reproducibility. The GP200 series mass flow controllers utilize differential pressure sensor technology to achieve excellent responsiveness and high-precision control. By providing stable flow supply, they contribute to enhancing the reliability of experimental data and ensuring reproducibility. 【Benefits of Implementation】 - Improved reliability of experimental data through high-precision control - Establishment of a highly reproducible measurement environment - Increased experimental efficiency due to stable flow supply
Achieving stabilization of the film formation process and improvement of yield with pressure-based MFC.
In the film deposition process of semiconductor manufacturing, even slight variations in gas flow can have a significant impact on film thickness and quality. Particularly in CVD, PVD, and ALD processes, high-precision and highly reproducible flow control is a crucial factor that influences device performance and yield. The GP200 series achieves high-precision flow measurement and excellent reproducibility through differential pressure sensors and optimized control valve design. It supports stable process control and contributes to the formation of high-quality thin films. 【Application Scenarios】 - CVD (Chemical Vapor Deposition) process - PVD (Physical Vapor Deposition) process - ALD (Atomic Layer Deposition) process 【Benefits of Implementation】 - Improved film thickness uniformity - Enhanced composition control accuracy - Yield improvement through process stabilization - Increased reproducibility of gas supply
