リソテックジャパン List of Products and Services

The Resist Development Analyzer RDA series allows for rapid analysis of development characteristics such as measuring the development speed of photoresists, generating contrast curves, and calculating sensitivity. Additionally, it can accurately determine the resist modeling parameters required for lithography simulators.

• Other analytical and testing equipment

This product is a simple UV nanoimprint device for experimental use, equipped with an automatic mode release function. UV irradiation is performed while pressing. The mold size ranges from 25mm to 40mm, and the UV intensity is 0.5mW/cm². Additionally, you can choose optional features such as HP functionality and a degassing unit. We also have a wide lineup of other products available for selection based on different applications. 【Features】 ■ Equipped with automatic mode release function ■ High resolution at low cost ■ Pressing pressure of 10MPa *For more details, please refer to the catalog or feel free to contact us.

• Other analytical and testing equipment

This series is a resist coating, developing, and baking device that can be adapted to all areas related to semiconductor manufacturing processes, from research and development applications to production applications. It features a highly flexible design, making it ideal for both research and development as well as mass production specifications. Additionally, it is equipped with a coating unit and a developing unit, allowing for easy switching between 2” and 8” wafers. 【Features】 ■ Highly flexible design ■ Equipped with coating unit and developing unit ■ Capable of supporting mass production specifications *For more details, please refer to the catalog or feel free to contact us.

• Other printing machines and peripheral equipment
• Other analytical and testing equipment

The lithography simulator expresses the imaging by the exposure optical system and the process of photoresist exposure and development through numerical calculations on a computer, and calculates the shape of the photoresist after development. It has become an indispensable tool for research, development, and manufacturing in lithography.

• Spectroscopic Analysis Equipment
• Other core systems

The exposure analysis tool, phase shift focus monitor, has high precision within ±25nm 3σ. No focus matrix is required. Focus measurements can be made with existing overlay measurement devices. For more details, please contact us or refer to the catalog.

• Other process controls
• Spectroscopic Analysis Equipment

The Deprotection Reaction Analysis Device PAGA series features in-situ reaction analysis using PEB and 248mm exposure, as well as the capability to calculate deprotection reaction parameters. A bake plate is placed in the FT-IR chamber, allowing for the observation of functional group changes while heating. Additionally, it is equipped with a UV (248nm) irradiation device, which can also be used to analyze mechanisms of acid generation during exposure. For more details, please contact us or refer to the catalog.

• Other process controls
• Spectroscopic Analysis Equipment

The Resist Development Analyzer RDA series allows for rapid analysis of development characteristics such as measuring the development speed of photoresists, generating contrast curves, and calculating sensitivity. Additionally, it can accurately determine the resist modeling parameters required for lithography simulators.

• Other process controls
• Analytical Equipment and Devices

The EUV exposure device EUVES-7000 for resist analysis is equipped with the EQ-10 EUV light source manufactured by Energetiq Technology in the United States, enabling open-frame exposure compatible with extreme ultraviolet light at a wavelength of 13.5 nm.

• Other process controls
• Spectroscopic Analysis Equipment

The photo process analysis exposure device ES-3500LP is equipped with a Ushio Electric Co., Ltd. excimer lamp instead of the laser light source used in the VUVES-4500. It does not require a large gas supply system like a laser light source, allowing for installation in various locations. For more details, please contact us or refer to the catalog.

• Other process controls
• Spectroscopic Analysis Equipment

The UVES series photo process analysis exposure device is an exposure tool for research and development of photoresists. By performing step exposure, it allows for open-frame exposure with varying exposure conditions at up to 25 locations. By developing and analyzing the exposed samples using a resist development analyzer, it accelerates the material and process development of photoresists. Furthermore, by using the optional degassing collection unit, it enables component analysis of outgassing from the resist during exposure. For more details, please contact us or refer to the catalog.

• Other process controls
• Spectroscopic Analysis Equipment

The KV-300/KF-10 automatic resist film thickness measurement device can perform high-precision non-contact measurements of ultra-thick resist films, which have traditionally been difficult to measure with stability. The standard automatic mapping function quickly displays the in-plane film thickness distribution of the substrate using a high-precision automatic stage. The KV-300 features an automatic R-θ stage, allowing it to accommodate 300mm substrates while minimizing its footprint. For more details, please contact us or refer to the catalog.

• Other process controls
• Other measurement, recording and measuring instruments

The Manual Bake Cooling LWB series is a manual bake and cooling device that features an automatic resist coating and developing bake system, high-precision bake plates, and high-precision cooling plates found in the LITHOTRAC series. Process gas is uniformly purged onto the substrate from the inside of the upper cover, protecting the substrate from contamination during baking. Additionally, the structure prevents the outgassing generated during baking from being released into the cleanroom through uniform exhaust. It supports substrate sizes up to a maximum of 300mm in diameter and offers high performance with a high degree of freedom, accommodating irregularly shaped substrates as well. For more details, please contact us or refer to the catalog.

• Other physicochemical equipment

The Riso Spin Cup Series adopts a spin unit equivalent to automatic coating/developing equipment while being manual, and it comes standard with features such as auto dispensers, various rinses, automatic waste liquid recovery, and cup exhaust. It allows for easy and safe high-precision resist processing. Additionally, we offer various options such as primary dispensers, chemical temperature control, fan filter units, and temperature/humidity controllers, enabling advanced coating and developing processes. At Risotech Japan, we design and manufacture equipment tailored to the coating chemicals (resist, polyimide, insulating films, etc.) and wafer sizes and applications used by our customers, providing sophisticated equipment.

• Other physicochemical equipment

The LITHOTRAC series of automatic resist coating, developing, and baking equipment has been developed uniquely by our company to be adaptable to all areas of wafer manufacturing processes, from research and development applications to mass production. We strive for a highly flexible design that meets our customers' needs, and our design philosophy that customization of specifications is no longer a special order has received positive feedback from many customers. For more details, please contact us.

• Other physicochemical equipment

<Main lineup of resist analysis exposure equipment> ■UVES-2000 　(Supports g-line/h-line/i-line/248nm and broad light analysis exposure equipment) ■VUVES-4700i 　(Supports 248nm, 193nm exposure, and 193nm immersion exposure) ■EUVES-7000 　(Equipped with an EUV light source, capable of 13.5nm open frame exposure)

• Microscope
• Analytical Equipment and Devices