List of Semiconductor Manufacturing Equipment products

  • classification:Semiconductor Manufacturing Equipment

271~315 item / All 5156 items

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Reduce the workload from handling heavy objects! Here are five case studies that solved customer challenges! We are also accepting free consultations and tests tailored to your work!

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  • Other conveying machines

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Strong cold wind from room temperature to -13°C! Depending on the usage environment, you can choose between the combo type or the separate type!

  • Cooling system

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April 10, 2024 (Wednesday) to April 12, 2024 (Friday) Notice of Participation in Nagoya Manufacturing World 2024

Sanwa Shiki Ventilator Co., Ltd. will be exhibiting at the 2024 Monozukuri World (Nagoya) held at Port Messe Nagoya. We will also be showcasing our large cooling fans and cool/warm ambient products. Date: April 10, 2024 - April 12, 2024 Opening: 10:00 AM Location: Nagoya Port Messe (Exhibition Hall 1) *Our booth: 19-1 We would be grateful if you could visit us if you have the time.

We recommend a semi-auto coater or auto coater equipped with an automatic dispense function for production!

  • Coater

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Mass production / NSG(SiO2)/PSG/BPSG deposition High-productivity / Continuous atmospheric pressure CVD (APCVD) system (for 12-inch wafers)

  • CVD Equipment

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IPA vapor displaces moisture and dries the object. For 4 to 8-inch wafers. Can be installed into and docked to various cleaning tools.

  • Other semiconductor manufacturing equipment

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Vertical cleaning system (VTC series) saves space and contributes to the "reduction of chemical solution and pure water". World's top-class delivery record (over 400 units)

  • Other semiconductor manufacturing equipment

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Mass Production / NSG(SiO2)/PSG/BPSG deposition  High-productivity/Continuous atmospheric pressure CVD (APCVD) system (for up to 8-inch wafers)

  • CVD Equipment

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4.5 generation glass substrate deposition system for rigid/flexible devices such as FPD.

  • CVD Equipment

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Equipped with a spin cleaning unit that uses tap water. This method utilizes a cleaning solution that replaces the RCA cleaning solution.

  • Other semiconductor manufacturing equipment

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Automatic transfer of wafers in a cassette to another cassette/Possible to add functions such as simultaneous transfer of 2 cassettes, pitch conversion, and face-to-face (back-to-back) transfer.

  • Other semiconductor manufacturing equipment

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Highly accurate temperature measurement function is ideal for temperature control of heat treatment process!

  • Other semiconductor manufacturing equipment

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For mass production of crystalline Si solar cells/For NSG(SiO2)/PSG/BSG deposition High productivity/Continuous atmospheric pressure CVD (APCVD) system

  • CVD Equipment

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For prototyping, development, and small lot production For deposition of NSG(SiO2)/BSG/PSG/BPSG Batch processing (simultaneous processing of multiple substrates) APCVD system

  • CVD Equipment

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Small quantities and wide varieties. NSG(SiO2)/PSG/BPSG deposition. Single-wafer processing atmospheric pressure CVD (APCVD) system (Compatible with 8-inch SiC wafers)

  • CVD Equipment

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No damage to the substrate! A vacuum deposition device capable of ultra-low temperature sputtering.

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  • Sputtering Equipment

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High cleaning performance! The internal structure is very simple with no fluid retention areas! No metal leaching!

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  • Semiconductor inspection/test equipment

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Notice of Participation in the 28th Interphex Japan

We will be exhibiting at the "28th Interphex Japan" trade show, which will be held from May 20 to 22, 2026, featuring auto connectors, automatic piping switching devices, Quitto, and electronic listening rods. At our booth, we will have demonstration units of the auto connectors and automatic piping switching devices, allowing you to see how the connectors automatically align and how the piping is attached and detached. In the Quitto experience corner, you can try out the new product "Quitto" for easy attachment and detachment with just one action. Additionally, we will also display the actual electronic listening rod Kirari MUSE, a diagnostic device that digitizes and visualizes "sound." If you are interested in factory automation, facing challenges with automation, want to eliminate the hassle of Hurel clamps, or are troubled by abnormal sound diagnostics, please stop by. We sincerely look forward to your visit. "28th Interphex Japan" Date: May 20 (Wed), May 21 (Thu), May 22 (Fri), 2026, 10:00 AM - 5:00 PM Venue: Makuhari Messe (Booth Number: 30-27) Exhibits: Auto connectors for powder, automatic piping switching devices, "Quitto," electronic listening rods.

The dressing of the grinding pad significantly changes the time in tool management.

  • Wafer processing/polishing equipment

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When it comes to the modification of grinding pads, it's the DP-equipped modification carrier, but what about improving work efficiency?

  • Wafer processing/polishing equipment

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We have a proven track record in various fields such as semiconductors, physical and chemical instruments, and kitchen equipment. Our heater bending technology allows us to design various shapes.

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  • Other semiconductor manufacturing equipment
  • Electric furnace
  • Other heaters

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The comprehensive catalog has been renewed.

We have renewed our comprehensive catalog to convey our products and services in a clearer and more understandable manner. Our company is a manufacturer that specializes in industrial heaters and machinery equipped with heating components. We deliver customized products tailored to each customer, handling everything from design and manufacturing to sales in-house. We also welcome inquiries about sheath heaters and various consultations regarding heat-related issues, so please feel free to contact us.

A heater that achieves high efficiency and clean heating without the need for insulation! The gas heater "Clean Hot" is an electric heater that utilizes bending technology!

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  • Other semiconductor manufacturing equipment
  • Heating device

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Reproducing the process of image formation in the resist on a computer! Efficiently discovering optimal process conditions.

  • Resist Device

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Equipped with a unique resist processing method to accommodate 0.5-inch wafers!

  • Coater

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Introducing HMDS treatment, which is said to improve the adhesion of the resist!

  • Resist Device

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For stainless steel containers and parts processing, leave it to us!

  • Stainless steel container
  • Stone Processing Machinery
  • Other semiconductor manufacturing equipment

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This is a panel mount joint that can be easily installed by simply drilling a hole in the panel and securing it with screws.

  • Other machine tools
  • Other semiconductor manufacturing equipment
  • Pipe Fittings

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Fast and flexible low-volume production

  • Contract manufacturing
  • Etching Equipment
  • Engine parts

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Integrate the functions of the flow sensor and valve to automatically control the water flow, such as coolant, using a microcontroller.

  • Other semiconductor manufacturing equipment
  • Flow Control
  • Piping Materials

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A super high-resolution camera capable of wide-angle and ultra-high-definition imaging, suitable for various MV applications.

  • Monochrome camera
  • Color camera
  • Semiconductor inspection/test equipment

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High-durability PTFE hoses achieve both high flexibility and durability due to their fine wave PTFE structure. They are suitable for chemical supply lines and movable piping sections in semiconductor ...

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  • hose
  • Other semiconductor manufacturing equipment
  • Etching Equipment

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High-pressure resistant PTFE hoses adopt a fine wave PTFE corrugation structure. They achieve both high pressure resistance and low reaction force, making them suitable for high-purity chemical lines ...

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  • hose
  • Other semiconductor manufacturing equipment
  • Etching Equipment

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Filter cartridge replacement without removing piping.

  • Other semiconductor manufacturing equipment
  • Other process controls
  • Piping Materials

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Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace

  • Heating device
  • Annealing furnace
  • Electric furnace

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Multi-Target Sputtering Device [MiniLab-125] Compatible with Φ8" SiC Coating Equipped with 1000℃ Heater Stage! Compact Size!

Multifunctional Multi-Sputtering Device (Compatible with Φ8inch Substrates) - Simultaneous deposition of three components + one component Pulse DC sputtering - Flexible arrangement of RF500W and DC850W power supplies to three cathodes (Source 1, 2, 3) - Equipped with a 5KW Pulse DC power supply → used with dedicated cathode (4) - Substrate heating stage Max 800℃ (SiC coated heater can achieve Max 1000℃) - MFC x 3 systems (Ar, O2, N2) for reactive sputtering - Main chamber RIE etching stage RF300W - LL chamber <30W low power controlled soft etching - Unique "Soft-Etching" technology reduces substrate damage through substrate bias - Touch panel or Windows PC operation: All operations can be performed on the touch panel/PC without dispersing control. - Equipment installation dimensions: 1,960(W) x 1,100(D) x 1,700(H) mm - Multi-chamber type can also be manufactured. ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.

Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace

  • Heating device
  • Annealing furnace
  • Electric furnace

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Multi-Target Sputtering Device [MiniLab-125] Compatible with Φ8" SiC Coating Equipped with 1000℃ Heater Stage! Compact Size!

Multifunctional Multi-Sputtering Device (Compatible with Φ8inch Substrates) - Simultaneous deposition of three components + one component Pulse DC sputtering - Flexible arrangement of RF500W and DC850W power supplies to three cathodes (Source 1, 2, 3) - Equipped with a 5KW Pulse DC power supply → used with dedicated cathode (4) - Substrate heating stage Max 800℃ (SiC coated heater can achieve Max 1000℃) - MFC x 3 systems (Ar, O2, N2) for reactive sputtering - Main chamber RIE etching stage RF300W - LL chamber <30W low power controlled soft etching - Unique "Soft-Etching" technology reduces substrate damage through substrate bias - Touch panel or Windows PC operation: All operations can be performed on the touch panel/PC without dispersing control. - Equipment installation dimensions: 1,960(W) x 1,100(D) x 1,700(H) mm - Multi-chamber type can also be manufactured. ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.

High-precision pressure sensor for high-purity fluids.

  • CMP Equipment

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We are not an ordinary valve manufacturer! We can widely produce "unit integrated valves" that combine filters, sensors, and more, tailored to your needs!

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  • Other semiconductor manufacturing equipment

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High-precision pressure gauge for high-purity fluids.

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  • CMP Equipment

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For the pharmaceutical, food, beverage, biotechnology, and cosmetics industries.

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  • Other semiconductor manufacturing equipment

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All-fluoropolymer durable pressure gauge!!

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  • Pressure
  • CMP Equipment
  • Other semiconductor manufacturing equipment

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Minimize the footprint within the device! But with excellent high pressure and flow capacity! Fluororesin valve.

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  • valve
  • Other semiconductor manufacturing equipment

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We propose a solution for pressure relief valves related to semiconductor chemical supply in a new form! It can be selected for a wide range of applications.

  • valve
  • Other semiconductor manufacturing equipment

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GEMÜ stainless steel diaphragm valve for high-purity organic solvents

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  • valve
  • Resist Device

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Custom-made modular type! Easy maintenance and flexible combinations realized by the customer!

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  • valve
  • Other semiconductor manufacturing equipment

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Achieving stable slurry supply! GEMU slurry supply application case for semiconductor manufacturing.

  • valve
  • Other semiconductor manufacturing equipment

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Filter