List of Heating device products
- classification:Heating device
1~45 item / All 1985 items
It won't break even after 1 million repetitions! A mat switch with reliable operation, high durability, and low price. Suitable for options in machine tools as well. Please consult us about delivery t...
- Sensors
We can accommodate high resistance over 10,000 ohms, with diameters ranging from approximately 30 mm to 8 inches, and we also offer thinning and chip processing arrangements!
- Other semiconductors
- Processing Contract
- Wafer
Eliminate winter "troubles" from the ground up! Free yourself from the anxiety of slipping due to snow and ice, and support a safe and comfortable winter.
- Other safety and hygiene products
- Heating device
- others
This is a heater for thin film experiments such as PVD and CVD, featuring excellent uniformity, heating characteristics, and controllability. RF/DC bias specifications are also available.
- Heating device
Lab6 Discharge Plasma Generation Heater for Thermal Electron Gun
Vacuum Ultra-High Temperature Cylindrical Heater Unit Maximum Temperature 1800℃ (Graphite, C/C Composite) We will manufacture according to your requested specifications. This is a cylindrical heating unit that can be applied in high vacuum for various purposes. We can custom-make it for heating samples in crucibles within the cylindrical heating range, heating metal, ceramic, and wire-shaped samples, depending on the purpose. ◎ Usable Environment: In vacuum, in inert gas, etc. ◎ Heating Element: Graphite, C/C composite heater, SiC coating, PG coating, tungsten, tantalum, etc. ◎ Manufacturing Range: Heater section (up to approximately Φ150 x 100mm), introduction flange, temperature control unit ◎ Applications: Sample heating in various vacuum device process chambers, discharge plasma generation unit thermal electron gun (Lab6), rapid heating of gas supply system piping (liquid rapid vaporization) We also manufacture custom specifications according to other requests. For details, please contact us.
From microwave ovens to high-temperature heating furnaces! A thorough explanation of the basics and applications of microwave heating, equipment design, problem-solving, and chemical reactions.
- Heating device
- Microwave Reactor
- Technical Seminar
Smartly attached to the test device. A high-performance IR imaging furnace equipped with heating, atmosphere control, and evacuation mechanisms.
- Heating device
Pressure vessels have different management requirements depending on their type! (Type I, Small, Type II)
- Distillation Apparatus
- Heating device
- High Pressure Reactor
A pressure vessel is a container designed to efficiently store gases or liquids!
- Heating device
- High Pressure Reactor
- Evaporation/Concentration Equipment
Metal knit for mold heating! It reduces damage to molds (local heating and oxidation)! Custom designs can be made to fit the mold shape, achieving uniform heating.
- Other processing machines
- Heating device
- Casting Machine
Thank you for visiting Thermotech 2022!! June 1 (Wednesday) to June 3 (Friday), 2022 at Tokyo Big Sight.
The Thermotech '2022 event held at Tokyo Big Sight has successfully concluded. We would like to express our heartfelt gratitude to the many customers who visited our booth. The most popular item was indeed the "hydrogen combustion burner." We received various questions and words of encouragement after watching the comparison video of hydrogen and natural gas combustion flames. We will continue to develop and refine the hydrogen burner to meet our customers' needs. Additionally, we received many requests for detailed information on other products, including environmental equipment (odor removal systems for on-site demonstrations), painting equipment (hybrid gas and electric), and aluminum alloy oxidation suppression furnaces, as well as surface combustion burners and package mixers. Thank you very much.
Supports a mixing ratio from 100% hydrogen to 100% city gas. We meet customer needs with low NOx combustion and stable flames.
- Heating device
- Industrial Furnace
- Drying Equipment
Explains the basics of microwave heating to engineering applications. Learn about the principles of rapid, internal, and selective heating, thermal runaway, temperature distribution control, and heati...
- Heating device
- High frequency/microwave parts
- Technical Seminar
Max 1000℃, MFC maximum 3 systems, APC pressure control, compatible with 4" or 6" substrates, high vacuum annealing equipment (<5 × 10^-7 mbar)
- Annealing furnace
- Heating device
- Electric furnace
VOXIA compact X-ray CT imaging device
Compact design with a space-saving layout that can be installed anywhere. Despite its compact body, it generates high-resolution data through advanced calculation software. * X-ray tube voltage: 20-90kV, or 40-maximum 130kV * Focus diameter: 7μm (5μm@4W) * Detector pixel: 89μm, approximately 3.2 million pixels! * Sample size: Φ120mm ◉ Vcap (Control Software): A custom-made imaging stage tailored to the subject and purpose. A series of tasks from shooting to image output can be performed with just a click. High-speed continuous shooting in as fast as 20 seconds, with processing from shooting start to image reconstruction taking about 30 seconds. ◉ VCT (Reconstruction Software): Customizable automatic measurement and analysis software specialized for the specified subject. High-speed reconstruction of shooting data with 992 x 992 pixel images and 600 projections in just 3.8 seconds! ◉ MolcerPlus (3D Display Analysis): Custom software that enables measurement conditions that were difficult with conventional software. Software for displaying, processing, and measuring the imaged object. ● High safety, ● Compatible with a wide variety of samples, ● Intuitive HMI, easy operation.
6 to 8 inch ultra-high temperature wafer annealing equipment, a high-performance machine that widely supports various purposes from research and development to small-scale production.
- Annealing furnace
- Heating device
- Electric furnace
☆★☆★【nanoCVD-WGP】Wafer-scale graphene/carbon nanotube synthesis device ☆★☆★
Plasma CVD equipment compatible with wafer sizes Φ3 inch and Φ4 inch. Rapid synthesis of clean, high-quality graphene while suppressing impurities. Usable with both thermal CVD and low to high temperature plasma CVD methods. The configuration can be customized according to requirements, including mass flow gas supply systems and substrate heating heaters. 【Example of equipment configuration】 - Substrate: Cu, Ni, etc. (film, foil) - Raw materials: CH4, C2H4, solids (PMMA), etc. - Process gases: H2, Ar, N2, etc. - Substrate size: Φ4 inch - 150W, 13.56MHz RF power supply - Substrate heating from 500℃ to Max 1100℃ - High precision process gas pressure APC control - Mass flow controller with a maximum of 4 channels
The "Hydrogen Combustion Specification" of the Package Burner Series! It achieves a stable flame even under high furnace pressure conditions and can be used in a wide range of fields across various in...
- Heating device
- Industrial Furnace
- Drying Equipment
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
- Heating device
Lab6 Discharge Plasma Generation Heater for Thermal Electron Gun
Vacuum Ultra-High Temperature Cylindrical Heater Unit Maximum Temperature 1800℃ (Graphite, C/C Composite) We will manufacture according to your requested specifications. This is a cylindrical heating unit that can be applied in high vacuum for various purposes. We can custom-make it for heating samples in crucibles within the cylindrical heating range, heating metal, ceramic, and wire-shaped samples, depending on the purpose. ◎ Usable Environment: In vacuum, in inert gas, etc. ◎ Heating Element: Graphite, C/C composite heater, SiC coating, PG coating, tungsten, tantalum, etc. ◎ Manufacturing Range: Heater section (up to approximately Φ150 x 100mm), introduction flange, temperature control unit ◎ Applications: Sample heating in various vacuum device process chambers, discharge plasma generation unit thermal electron gun (Lab6), rapid heating of gas supply system piping (liquid rapid vaporization) We also manufacture custom specifications according to other requests. For details, please contact us.
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
- Heating device
- Annealing furnace
- Electric furnace
VOXIA compact X-ray CT imaging device
Compact design with a space-saving layout that can be installed anywhere. Despite its compact body, it generates high-resolution data through advanced calculation software. * X-ray tube voltage: 20-90kV, or 40-maximum 130kV * Focus diameter: 7μm (5μm@4W) * Detector pixel: 89μm, approximately 3.2 million pixels! * Sample size: Φ120mm ◉ Vcap (Control Software): A custom-made imaging stage tailored to the subject and purpose. A series of tasks from shooting to image output can be performed with just a click. High-speed continuous shooting in as fast as 20 seconds, with processing from shooting start to image reconstruction taking about 30 seconds. ◉ VCT (Reconstruction Software): Customizable automatic measurement and analysis software specialized for the specified subject. High-speed reconstruction of shooting data with 992 x 992 pixel images and 600 projections in just 3.8 seconds! ◉ MolcerPlus (3D Display Analysis): Custom software that enables measurement conditions that were difficult with conventional software. Software for displaying, processing, and measuring the imaged object. ● High safety, ● Compatible with a wide variety of samples, ● Intuitive HMI, easy operation.
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
- Heating device
- Annealing furnace
- Electric furnace
☆★☆★【nanoCVD-WGP】Wafer-scale graphene/carbon nanotube synthesis device ☆★☆★
Plasma CVD equipment compatible with wafer sizes Φ3 inch and Φ4 inch. Rapid synthesis of clean, high-quality graphene while suppressing impurities. Usable with both thermal CVD and low to high temperature plasma CVD methods. The configuration can be customized according to requirements, including mass flow gas supply systems and substrate heating heaters. 【Example of equipment configuration】 - Substrate: Cu, Ni, etc. (film, foil) - Raw materials: CH4, C2H4, solids (PMMA), etc. - Process gases: H2, Ar, N2, etc. - Substrate size: Φ4 inch - 150W, 13.56MHz RF power supply - Substrate heating from 500℃ to Max 1100℃ - High precision process gas pressure APC control - Mass flow controller with a maximum of 4 channels
High-precision temperature control for heaters from other manufacturers with terminal block connection. Program control and safety features included.
- Heating device
- Other physicochemical equipment
For heating large glass substrates and large-area workpieces. Thin, energy-efficient, and suitable for desktop installation.
- Heating device
- Drying Equipment
It is a high-performance vacuum deposition source that can be used as a high-temperature heating cell for vacuum applications, with an organic deposition source up to 800°C and a metal deposition sour...
- Evaporation Equipment
- Heating device
- Electric furnace
Lab6 Discharge Plasma Generation Heater for Thermal Electron Gun
Vacuum Ultra-High Temperature Cylindrical Heater Unit Maximum Temperature 1800℃ (Graphite, C/C Composite) We will manufacture according to your requested specifications. This is a cylindrical heating unit that can be applied in high vacuum for various purposes. We can custom-make it for heating samples in crucibles within the cylindrical heating range, heating metal, ceramic, and wire-shaped samples, depending on the purpose. ◎ Usable Environment: In vacuum, in inert gas, etc. ◎ Heating Element: Graphite, C/C composite heater, SiC coating, PG coating, tungsten, tantalum, etc. ◎ Manufacturing Range: Heater section (up to approximately Φ150 x 100mm), introduction flange, temperature control unit ◎ Applications: Sample heating in various vacuum device process chambers, discharge plasma generation unit thermal electron gun (Lab6), rapid heating of gas supply system piping (liquid rapid vaporization) We also manufacture custom specifications according to other requests. For details, please contact us.
Hot Wall Type Thermal CVD Equipment: A compact, high-performance CVD device ideal for fundamental research.
- CVD Equipment
- Annealing furnace
- Heating device
Lab6 Discharge Plasma Generation Heater for Thermal Electron Gun
Vacuum Ultra-High Temperature Cylindrical Heater Unit Maximum Temperature 1800℃ (Graphite, C/C Composite) We will manufacture according to your requested specifications. This is a cylindrical heating unit that can be applied in high vacuum for various purposes. We can custom-make it for heating samples in crucibles within the cylindrical heating range, heating metal, ceramic, and wire-shaped samples, depending on the purpose. ◎ Usable Environment: In vacuum, in inert gas, etc. ◎ Heating Element: Graphite, C/C composite heater, SiC coating, PG coating, tungsten, tantalum, etc. ◎ Manufacturing Range: Heater section (up to approximately Φ150 x 100mm), introduction flange, temperature control unit ◎ Applications: Sample heating in various vacuum device process chambers, discharge plasma generation unit thermal electron gun (Lab6), rapid heating of gas supply system piping (liquid rapid vaporization) We also manufacture custom specifications according to other requests. For details, please contact us.
High-temperature crucible heating heater for vacuum use. A versatile heater unit that can be used as an organic deposition source at 800°C and a metal deposition source at 1500°C.
- Evaporation Equipment
- Heating device
- Electric furnace
Lab6 Discharge Plasma Generation Heater for Thermal Electron Gun
Vacuum Ultra-High Temperature Cylindrical Heater Unit Maximum Temperature 1800℃ (Graphite, C/C Composite) We will manufacture according to your requested specifications. This is a cylindrical heating unit that can be applied in high vacuum for various purposes. We can custom-make it for heating samples in crucibles within the cylindrical heating range, heating metal, ceramic, and wire-shaped samples, depending on the purpose. ◎ Usable Environment: In vacuum, in inert gas, etc. ◎ Heating Element: Graphite, C/C composite heater, SiC coating, PG coating, tungsten, tantalum, etc. ◎ Manufacturing Range: Heater section (up to approximately Φ150 x 100mm), introduction flange, temperature control unit ◎ Applications: Sample heating in various vacuum device process chambers, discharge plasma generation unit thermal electron gun (Lab6), rapid heating of gas supply system piping (liquid rapid vaporization) We also manufacture custom specifications according to other requests. For details, please contact us.
Fundamental to applied technologies using thermal/non-thermal processes.
- Technical and Reference Books
- Other process controls
- Heating device
Introducing the latest lineup of hydrogen gas burners and low-carbon equipment! 【Thermal Technology 2024】 (October 10-11, Grand Front Osaka)
- Heating device
- Industrial Furnace
- Drying Equipment
Exhibition Information: Thermotech 2026 9th International Industrial Furnace and Related Equipment Exhibition
We are pleased to announce that Shoei Manufacturing, a manufacturer of gas burners and industrial furnaces, will be exhibiting at "ThermoTech 2026" held at Tokyo Big Sight. This exhibition is themed "Environment, Heat, Future - Let's Think Together About High-Efficiency Heat Technology and a Sustainable Future," and it aims to broadly showcase next-generation heat technologies in response to carbon neutrality, efficiency improvements, labor-saving measures, and advancements in generative AI and digital transformation. At our booth, we will introduce a wide range of product technologies, including "gas burners compatible with decarbonized fuels," "decarbonized industrial furnaces," "energy-saving systems," and "automation and labor-saving solutions." We invite you to visit our booth. Booth: South Hall 1 G016
A heating solution for mass-producing nanoparticles in a "continuous" manner with uniform particle size.
- Heating device
- Other heating equipment
For those struggling with heat radiation and heat conduction from the furnace! Achieve both extended equipment lifespan and energy savings through proper material selection and precise processing base...
- Industrial Furnace
- Electric furnace
- Heating device
Packing used around furnace equipment, high-performance fiber products requiring tensile strength.
- Heating device
- Industrial Furnace
- Electric furnace
An ideal insulation material that can be used from -190℃ to 1100℃ and exhibits excellent performance.
- Heating device
- Industrial Furnace
- Electric furnace
It has become possible to manufacture high-performance insulation materials flexibly to match costs.
- Industrial Furnace
- Heating device
- Electric furnace
High-temperature heat-resistant shoes with excellent safety and functionality.
- Heating device
- Industrial Furnace
- Safety shoes and sneakers
Experts in high-temperature insulation materials essential for heat treatment! We handle everything from insulation material selection to precision processing. *Free product catalog available (PDF dow...
- Electric furnace
- Heating device
- Industrial Furnace
It is a flexible heater that can meet various needs.
- Industrial Furnace
- Heating device
- Electric furnace
We process all types of insulation boards.
- Industrial Furnace
- Electric furnace
- Heating device
If you have any issues with the near-infrared lamp heater, please consult us first.
- Heating device
- Other heaters
Tabletop small-sized experimental furnace - space-saving, with a maximum operating temperature of 2000°C! We also manufacture metal furnaces for reducing atmospheres.
- Heating device
- Electric furnace
- Other heaters
Lab6 Discharge Plasma Generation Heater for Thermal Electron Gun
Vacuum Ultra-High Temperature Cylindrical Heater Unit Maximum Temperature 1800℃ (Graphite, C/C Composite) We will manufacture according to your requested specifications. This is a cylindrical heating unit that can be applied in high vacuum for various purposes. We can custom-make it for heating samples in crucibles within the cylindrical heating range, heating metal, ceramic, and wire-shaped samples, depending on the purpose. ◎ Usable Environment: In vacuum, in inert gas, etc. ◎ Heating Element: Graphite, C/C composite heater, SiC coating, PG coating, tungsten, tantalum, etc. ◎ Manufacturing Range: Heater section (up to approximately Φ150 x 100mm), introduction flange, temperature control unit ◎ Applications: Sample heating in various vacuum device process chambers, discharge plasma generation unit thermal electron gun (Lab6), rapid heating of gas supply system piping (liquid rapid vaporization) We also manufacture custom specifications according to other requests. For details, please contact us.