Evaporation Equipmentの製品一覧
- 分類：Evaporation Equipment
46～90 件を表示 ／ 全 212 件
For those who have isolators. Achieving high chemical resistance and workability. Low cost and short delivery times are also possible for glove box and isolator gloves.
- Work gloves
Notice of participation in 'INTERPHEX Week Tokyo' from May 20 (Wednesday) to May 22 (Friday), 2026.
Ito Corporation will be exhibiting at "INTERPHEX Week Tokyo" held at Makuhari Messe. This exhibition is the largest in Japan, showcasing a wide range of products and services related to the research and manufacturing of pharmaceuticals, cosmetics, and regenerative medicine from 25 countries and regions around the world. Pharmaceutical and cosmetic manufacturers, as well as regenerative medicine companies, will be attending from all over the globe. We will be showcasing "Gloves for Glove Boxes/Isolators" manufactured by Tron Power. We look forward to your visit.
It is a high-performance vacuum deposition source that can be used as a high-temperature heating cell for vacuum applications, with an organic deposition source up to 800°C and a metal deposition sour...
- Evaporation Equipment
- Heating device
- Electric furnace
★☆★☆【MiniLab-026】Small Thin Film Experimental Device for R&D Development★☆★☆
This is a flexible thin film experimental device for R&D that eliminates waste by integrating the necessary minimum modules and controllers into a 19" compact rack with a Plug & Play feel, achieving compact size, space-saving design, simple operation, and high cost performance. It supports magnetron sputtering (up to 3 sources) or resistance heating evaporation (metal sources up to 2, organic materials x4), and can also be equipped with a substrate heating stage, allowing for the production of annealing devices and RF etching. There is also a glove box storage type available (specifications to be discussed). We offer a wide range of optional components that can be flexibly customized. ◉ Φ2 inch magnetron cathode (up to 3 sources) ◉ Resistance heating evaporation source filament, crucible, boat type (up to 4 poles with automatic switching via controller) ◉ Organic evaporation cell: 1cc or 5cc ◉ Glove box compatible (optional, specifications to be discussed) ◉ Other options: simultaneous film deposition, HiPIMS, automatic film deposition controller, custom substrate holders, load lock, substrate rotation/heating/cooling, and many more options available. *Please first contact us with your required specifications, and we will configure the system to meet your needs.
Introduction of various experimental devices for research and development in semiconductors, electronic devices, fuel cells, displays, and thin film experiments.
- Sputtering Equipment
- Evaporation Equipment
- Annealing furnace
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
Composite thin film experimental device nanoPVD-ST15A capable of mixed installation of vacuum deposition (metal and organic deposition sources) and sputtering cathodes.
- Sputtering Equipment
- Evaporation Equipment
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
High-temperature crucible heating heater for vacuum use. A versatile heater unit that can be used as an organic deposition source at 800°C and a metal deposition source at 1500°C.
- Evaporation Equipment
- Heating device
- Electric furnace
★☆★☆【MiniLab-026】Small Thin Film Experimental Device for R&D Development★☆★☆
This is a flexible thin film experimental device for R&D that eliminates waste by integrating the necessary minimum modules and controllers into a 19" compact rack with a Plug & Play feel, achieving compact size, space-saving design, simple operation, and high cost performance. It supports magnetron sputtering (up to 3 sources) or resistance heating evaporation (metal sources up to 2, organic materials x4), and can also be equipped with a substrate heating stage, allowing for the production of annealing devices and RF etching. There is also a glove box storage type available (specifications to be discussed). We offer a wide range of optional components that can be flexibly customized. ◉ Φ2 inch magnetron cathode (up to 3 sources) ◉ Resistance heating evaporation source filament, crucible, boat type (up to 4 poles with automatic switching via controller) ◉ Organic evaporation cell: 1cc or 5cc ◉ Glove box compatible (optional, specifications to be discussed) ◉ Other options: simultaneous film deposition, HiPIMS, automatic film deposition controller, custom substrate holders, load lock, substrate rotation/heating/cooling, and many more options available. *Please first contact us with your required specifications, and we will configure the system to meet your needs.
We have incorporated all the latest vacuum deposition technology into a compact benchtop-sized device that can effectively utilize limited lab space.
- Evaporation Equipment
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
We have incorporated all the latest vacuum deposition technology into a compact benchtop-sized device that can effectively utilize limited lab space.
- Evaporation Equipment
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
Sputter Cathode and Co-evaporation Source Mixed Thin Film Experimental Device: Metal deposition, organic deposition, and sputter cathode installed in a compact frame.
- Sputtering Equipment
- Evaporation Equipment
- Annealing furnace
【MiniLab】 Evaporation/Sputtering Dual Chamber System
Two thin film experimental devices are connected by a load lock mechanism. Different film deposition devices (sputtering - evaporation, etc.) are seamlessly connected via the load lock. With Moorfield's unique load lock system, connections to the process chamber on the left, right, and rear are also possible (see photo below). 1. MiniLab-E080A (Evaporation Device) - EB evaporation: 7cc crucible x 6 - Resistance heating evaporation x 2 - Organic evaporation limit x 2 2. MiniLab-S060A (Sputtering Device) - Φ2" Magnetron cathode x 4 for simultaneous sputtering - Compatible with both DC and RF power supplies 3. Load Lock Chamber - Plasma etching stage In the load lock chamber, plasma cleaning of the substrate surface is performed using the "RF/DC substrate bias stage," and the company's unique "soft etching" technology allows for a <30W low-power, damage-free plasma etching stage. This enables delicate etching processes that are prone to damage, such as 2D (removal of resists like PMMA), graphene delamination, and etching of Teflon substrates. (*This can also be installed in the main chamber stage.)
For applications in solar cells, organic devices, and bio-related fields! Comprehensive catalog of deposition equipment giveaway!
- Evaporation Equipment
We will introduce research and development equipment suitable for the development of organic EL devices.
- Evaporation Equipment
The E-100 retains its features while omitting the automatic exhaust control function to reduce costs.
- Evaporation Equipment
It is possible to measure optical properties in real time during vacuum deposition!
- Evaporation Equipment
A deposition device for ellipsometry that can measure optical properties in real time during vacuum deposition.
- Evaporation Equipment
Uniform carbon deposition is now possible! Ideal for pretreatment in EPMA and analytical SEM.
- Evaporation Equipment
The precision wobble stick was developed for delicate operations within ultra-high vacuum chambers, minimizing the risk of damage to the equipment!
- Vacuum Equipment
- Evaporation Equipment
- Plasma surface treatment equipment
We will introduce hand clean rolls made of silicone-based and non-silicone-based materials.
- Other cleaning tools
- Special labels, etc.
- Evaporation Equipment
To customers considering ultra-wide equipment for roll-to-roll production lines.
- Evaporation Equipment
- Extrusion Machine
- Food Packaging Machinery
The passivation MBE device is composed of various chambers specially designed for laser facet passivation and other purposes.
- Evaporation Equipment
- CVD Equipment
Metal, dielectric, and organic film deposition! Introducing the thermal evaporation device.
- Evaporation Equipment
A one-axis sample transporter designed for transporting samples between UHV chambers!
- Vacuum Equipment
- Evaporation Equipment
- Transport and handling robots
Robust cold cathode ionization vacuum gauge
- Evaporation Equipment
This is a compact thermal cathode ionization vacuum gauge with an integrated sensor, circuit, and display. It supports 16 types of gases and also uses a metal sensor!
- Evaporation Equipment
A wide range of measurements from atmospheric pressure to high vacuum with this one device! A vacuum gauge with an integrated sensor, circuit, and display.
- Evaporation Equipment
One device for measuring a wide range from atmospheric pressure to high vacuum! A vacuum gauge with an integrated sensor, circuit, and display. Compact and saves installation space!
- Evaporation Equipment
"Complete Case Collection of Flow Paths" - Presenting examples of diaphragm valves made with PFA resin sheets that can be used in high-temperature environments up to 200°C for the entire valve.
- Evaporation Equipment
- Other semiconductor manufacturing equipment
- valve
Optimized thermal design for handling delicate organic materials! Suppressing thermal effects on evaporated substances and substrates.
- Evaporation Equipment
Opening up the future of the medical device industry with high-performance and safe materials!
- Evaporation Equipment
A technology that deposits molecules onto a substrate surface to form a thin film! An explanation of vacuum deposition!
- Evaporation Equipment
Easy maintenance and workability! The lift-off film formation mechanism employs a special heat insulation mechanism!
- Evaporation Equipment
You can attach and detach the bell jar inside the glove box, and exchange or replenish the substrate and deposition materials!
- Evaporation Equipment
Can be fixed at any position on an arc-shaped rail corresponding to substrate incidence! The deposition position can be adjusted.
- Evaporation Equipment
Equipped with a holder that supports substrate rotation and substrate heating! Continuous film deposition is possible without releasing into the atmosphere!
- Evaporation Equipment
Transport between chambers is achieved by the transfer rod! Continuous film formation is possible without releasing into the atmosphere!
- Evaporation Equipment
- Sputtering Equipment
Equipped with an EB source expansion port! Compatible with 4-inch substrates, it features a substrate heating mechanism and a film thickness control mechanism!
- Evaporation Equipment
Solving issues such as storage and supply stability, wettability, and heat resistance! Next-generation environmental compatibility!
- Reflow Equipment
- Evaporation Equipment
- Bonding Equipment
Not only can we create films on flat surfaces, but we can also apply films to three-dimensional objects! Please let us know the areas where you would like the film to be applied.
- Evaporation Equipment
- Sensors
- Contract manufacturing
The refined and simple glove box is suitable for anyone. It comes with a new era gas purification device that does not require recycled gas or recycling processes.
- Glove box
- Vacuum Equipment
- Evaporation Equipment
Glove box system with gas refining equipment for a new era that does not require regeneration gas or regeneration processes.
- Glove box
- Vacuum Equipment
- Evaporation Equipment
MBE cells (molecular beam epitaxy sources) are important for the quality of epitaxial films. We introduce the MBE cells from RIBER, a company with a proven track record.
- Evaporation Equipment
We will handle everything from material arrangement to He leak testing with one company.
- Vacuum Equipment
- Evaporation Equipment
Materials require high purity and stable dissolution. Our company provides materials suitable for deposition!
- Evaporation Equipment
Build a reliable system! Leave maintenance and modifications to us.
- Evaporation Equipment
- Sputtering Equipment
- Vacuum Equipment
Easy-to-handle design allows for easy control of various film formation conditions! Six types of targets can be used.
- Evaporation Equipment
Standard equipped with scanning RHEED! Two motor-driven combinatorial masks installed.
- Evaporation Equipment
A rich lineup is available! Introducing electron beam deposition applicable to the deposition of organic molecules.
- Evaporation Equipment
- Other machine elements