We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for CMP Equipment.
ipros is IPROS GMS ・ IPROS One of the largest technical database sites in Japan that collects information on.

CMP Equipment Product List and Ranking from 8 Manufacturers, Suppliers and Companies | IPROS GMS

Last Updated： Aggregation Period:Apr 01, 2026～Apr 28, 2026
This ranking is based on the number of page views on our site.

CMP Equipment Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Apr 01, 2026～Apr 28, 2026
This ranking is based on the number of page views on our site.

  1. D-process Tokyo//Manufacturing and processing contract
  2. TECHNICAL INFOMATION INSTITUTE CO.,LTD Tokyo//Service Industry
  3. 北川グレステック 本社 Chiba//Trading company/Wholesale
  4. 4 AMTEC ＡＭＴＥＣ　株式会社 Fukuoka//Industrial Machinery
  5. 4 グローバルネット株式会社 Tokyo//Trading company/Wholesale
Go to Company Ranking

CMP Equipment Product ranking

Last Updated： Aggregation Period:Apr 01, 2026～Apr 28, 2026
This ranking is based on the number of page views on our site.

  1. Desktop CMP System : Melissa300D/400D D-process
  2. [Book] Trends in Advanced Semiconductor Manufacturing Processes and Miniaturization (No. 2220) TECHNICAL INFOMATION INSTITUTE CO.,LTD
  3. CMP device [Desktop type for research and development, compatible with wafers up to 300mm!] 北川グレステック 本社
  4. CMP device POLI-400 AMTEC ＡＭＴＥＣ　株式会社
  5. 4 Introduction to GNC pattern wafer services and other contract processing services. グローバルネット株式会社

CMP Equipment Product List

1～9 item / All 9 items

Displayed results
Desktop CMP System : Melissa300D/400D

Desktop CMP System : Melissa300D/400D

Supports wafer sizes up to φ6 inch. Specially designed for CMP.

Since its establishment in 2003 as a company providing CMP contract processing services, D-process, which has numerous achievements in CMP processing, offers and provides desktop CMP equipment ideal for research and development purposes. From this page, you can download the catalog for the "Melissa300D," which features a φ300mm platen suitable for wafers up to φ4 inches. For the φ400mm platen specification, which accommodates wafers up to φ6 inches, detailed information can be provided separately by our sales representative. Please feel free to contact us.

  • CMP Equipment
  • CMP Equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
[Book] Trends in Advanced Semiconductor Manufacturing Processes and Miniaturization (No. 2220)

[Book] Trends in Advanced Semiconductor Manufacturing Processes and Miniaturization (No. 2220)

【Available for preview】 - Film formation technology, lithography, etching, CMP, cleaning -

Book Title: Latest Trends in Advanced Semiconductor Manufacturing Processes and Miniaturization Technologies --- ★ Amidst the calls for the limits of Moore's Law, how far will the development of miniaturization technologies continue? A comprehensive book covering the latest technologies in the "front-end" of advanced semiconductor manufacturing, where new structures and materials are being applied. --- ■ Key Points of This Book 1 - Latest trends in EUV lithography and the technical challenges of resists, masks, and light sources - The development history of metal resists that breaks conventional wisdom and future challenges - Recent development cases of atomic layer processes (ALD, ALE) that are rapidly gaining momentum in research and development - Latest trends in nanoimprint systems aimed at mass production applications for next-generation semiconductor memory devices - Latest trends in film deposition technologies and process optimization in semiconductor multilayer wiring - Cleaning performance required for advanced semiconductor manufacturing, the reality of contamination, and the latest cleaning technologies - Latest technologies and process control for high aspect ratio etching that enables the miniaturization of integrated circuits - CMP processes and consumable materials that respond to advancements in miniaturization and new materials, along with performance requirements for post-cleaning.

  • IPROS3391385136135994447_220x220.png
  • others
  • CMP Equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
φ300 compatible CMP device TCRM900

φ300 compatible CMP device TCRM900

This is a manual CMP device compatible with φ300 wafers. It is ideal for MEMS, TSV, and thin processing.

It is ideal for film processing (CMP) of silicon wafers and thin plate processing. There are devices compatible with Low-K films, conductors, and insulating films. Thin plate processing of wafer materials can also be performed separately with an optional device, allowing for the separation of wafers as thin as 30μm and 50μm.

  • Casting Machine
  • CMP Equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Introduction to GNC pattern wafer services and other contract processing services.

Introduction to GNC pattern wafer services and other contract processing services.

We can provide consistent production from substrate arrangement to mask design! Introducing the contract processing services of Global Net Co., Ltd., including pattern wafer services!

At Global Net Co., Ltd., we provide services such as GNC processing foundry and GNC patterned wafer services. We mainly offer processing services for silicon wafers, glass, and other materials tailored to our customers' needs. We are capable of providing integrated production from substrate arrangement to mask design. 【Business Overview】 ■ GNC Processing Foundry - Film deposition foundry - Process evaluation ■ GNC Patterned Wafer Services - GNC fine patterned wafers - GNC advanced CMP evaluation patterned wafers - GNC MEMS and silicon special processing services ■ GNC 2.1D/2.5D/3D Solutions - Bump wafer and redistribution processing / FOWLP process services *For more details, please refer to the PDF materials or feel free to contact us.

  • Processing Contract
  • Wafer processing/polishing equipment
  • CMP Equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Automatic CMP device

Automatic CMP device

You can monitor the COF (friction coefficient), pad surface temperature, polishing liquid temperature, and room temperature inside the device.

【Tribo】 - Compatible with 400mm diameter polishing plates - 100mm/4-inch polishing head x2 axes - Two slurry pumps, compatible with acidic slurries - Supports industry-standard In-Situ diamond conditioning - Controlled by a built-in touch panel PC 【Orbis】 - Compatible with 600mm diameter polishing plates - 200mm/8-inch polishing head x2 axes - Two slurry pumps, compatible with acidic slurries *Equipped with two types of slurries - Supports industry-standard In-Situ diamond conditioning - Controlled by a built-in touch panel PC

  • CMP Equipment
  • CMP Equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
[Commissioned CMP] MAT Division

[Commissioned CMP] MAT Division

CMP process development, prototyping, and contract processing! With reliable technical skills and experience, we meet our customers' needs.

We would like to introduce our CMP/Dicing business, "MAT Division." We offer services such as "flattening," "smoothing," and "thinning (thin film)," not only in the semiconductor field but also for SiC power devices, SOI, micro-machines (MEMS), optical devices, LED sapphire, organic EL, and more. With our reliable technical expertise and experience, we respond to our customers' needs in advanced technologies such as "grinding," "lapping," "polishing," "CMP," and "cleaning." 【Features】 ■ CMP process development, prototyping, and contract processing ■ "Flattening," "smoothing," "thinning (thin film)" ■ Not limited to the semiconductor field ■ Responding to customer needs with reliable technical expertise and experience *For more details, please refer to the related link page or feel free to contact us.

  • Processing Contract
  • CMP Equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
CMP device [Desktop type for research and development, compatible with wafers up to 300mm!]

CMP device [Desktop type for research and development, compatible with wafers up to 300mm!]

We offer a lineup of CMP equipment ranging from tabletop models to those compatible with 300mm wafers! Customization and new designs are possible, including features like Dry-in/Dry-out!

We offer a lineup ranging from compact models suitable for research and development to models compatible with 300mm wafers. We can also propose specification changes, custom orders, and CMP automatic devices that allow for Dry-in / Dry-out according to your needs. We have demo units available, so we can conduct demo tests in your presence. 【We can also accommodate requests such as the following】 ■ Chemical compatibility (capable of handling various acidic and alkaline slurries) ■ Support for abrasive supply systems ■ Desire to include sensors to measure vibrations ■ Wanting to apply higher loads than usual ■ Wanting to measure temperature and humidity inside the device *For more details, please refer to the PDF document or feel free to contact us.

  • Wafer processing/polishing equipment
  • CMP Equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
CMP device POLI-400

CMP device POLI-400

Leave it to us for double-sided grinding machines, polishing machines, and CMP equipment.

We have received high praise from customers in various fields for our grinding, polishing, cutting, and have developed technologies for flying line grinding, wrapping and polishing related equipment, semiconductor-related products, dicing machines, and back grinding machines, providing products with a solid foundation of trust.

  • Other processing machines
  • Grinding Machine
  • CMP Equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Fully Automatic CMP Device 'MGP-808XJ'

Fully Automatic CMP Device 'MGP-808XJ'

Dry in / dry out is possible! Equipment for mirror finishing of silicon wafers.

The "MGP-808XJ" is a fully automatic CMP device that is the successor to the Lap Master SFT's "LGP-808XJ." It adopts a newly developed head by our company, achieving improvements in GBIR and SFQR on the wafer surface. The transport method is either edge clamp or edge contact. Additionally, it allows for dry in/dry out capabilities through integration with a cleaning machine. 【Features】 ■ Successor model to the Lap Master SFT's "LGP-808XJ" ■ Achieves improvements in GBIR and SFQR on the wafer surface ■ High throughput with 8 polishing heads and 3 polishing plates ■ All transport systems use either edge clamp or edge contact methods ■ Allows for dry in/dry out capabilities through integration with a cleaning machine *For more details, please refer to the PDF document or feel free to contact us.

  • CMP Equipment
  • CMP Equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration

Search Keywords Related to CMP Equipment

COPYRIGHT © 2001-2026 IPROS CORPORATION ALL RIGHTS RESERVED.