ジャパンクリエイト List of Products and Services

The "Load Lock Type EB Evaporation Device" achieves excellent film thickness distribution and reproducibility through substrate rotation. It supports high vacuum processes using a load lock system, as well as lift-off processes and tray transport. It is capable of high-temperature processes up to 900°C, and maintenance of the chamber is easy. Please feel free to contact us when needed. 【Features】 ■ Capable of high-temperature processes up to 900°C ■ Achieves excellent film thickness distribution and reproducibility through substrate rotation ■ Supports high vacuum processes with a load lock system ■ Reduces particles through suitable surface treatment ■ Easy maintenance of the chamber *For more details, please refer to the PDF materials or feel free to contact us.

We would like to introduce the custom manufacturing achievements of Japan Create Co., Ltd. in "various vacuum devices." We have a track record that includes "annealing equipment for research and development," "batch-type plasma treatment equipment," "ultra-low temperature film deposition experimental equipment," and "exhaust gas switching equipment." We are conducting sample processing with demo units. Please feel free to contact us if you have any inquiries. 【Manufacturing Achievements (Excerpt)】 ■ Annealing equipment for research and development ■ Batch-type plasma treatment equipment ■ ZnS treatment equipment ■ Ultra-low temperature film deposition experimental equipment ■ Ultra-high vacuum chamber for analysis * For more details, please refer to the PDF materials or feel free to contact us.

We would like to introduce the custom manufacturing achievements of Japan Create Co., Ltd. regarding "deposition devices." We have a track record of "two-stage composite Pt deposition devices," "lubrication deposition devices for HDD media research and development," and "load-lock type high vacuum ultra-high temperature EB deposition devices." Sample processing is being conducted using demo equipment. Please feel free to contact us when needed. 【Manufacturing Achievements】 ■ Two-stage composite Pt deposition device ■ Lubrication deposition device for HDD media research and development ■ Load-lock type high vacuum ultra-high temperature EB deposition device *For more details, please refer to the PDF materials or feel free to contact us.

The "Organic EL Deposition Device" is a multi-chamber system suitable for device and material development. It is capable of processing from pre-treatment to film formation and sealing without exposure to the atmosphere. Depending on the purpose, you can freely choose from a plasma cleaning chamber, organic deposition chamber, electrode deposition chamber, sealing chamber, etc. 【Features】 ■ Supports substrate sizes up to 300mm ■ Deposition cells can be selected from various materials and sizes ■ Can be combined with CVD chambers, sputtering chambers, etc. ■ Custom orders can also be manufactured ■ Sample processing is conducted using a demo machine *For more details, please refer to the PDF document or feel free to contact us.

The "Epitaxial-EB Deposition Device" is a product suitable for single crystal film formation of metal films and oxide films through an epitaxial promotion mechanism. It achieves excellent film thickness distribution and reproducibility through substrate rotation, and the maintenance of the chamber is easy. It also supports the lift-off process and reduces particles through appropriate surface treatment. Multi-chamber specifications and batch types can also be manufactured. 【Features】 ■ Oxidation-promoting gas introduction mechanism ■ Material oxidation prevention mechanism ■ Capable of high-temperature processes up to 900°C ■ Supports high vacuum processes with a load-lock system ■ Compatible with lift-off processes ■ Supports tray transport *For more details, please refer to the PDF document or feel free to contact us.