ジャパンクリエイト List of Products and Services

The cleanliness of the quartz tubes used in the manufacturing process of wafers greatly affects the quality of the products. Therefore, the cleaning of quartz tubes used in the diffusion process, CVD process, and annealing process is an important point. Japan Create Co., Ltd. provides quartz tube cleaning equipment that meets customer needs based on many years of experience and achievements. There are two types of systems: horizontal and vertical, and we can accommodate the shape of the quartz tubes, so please consult with us. For more details, please contact us.

This machine is a resist stripping device. The robot automatically transports the cassette set in the loader, goes through each processing stage, dries it with hot air blow/spin dryer, and discharges it to the unloader. For more details, please contact us.

This machine is an automatic cleaning device that precisely cleans and dries carriers and boxes stored in a basket, transporting them from the loader through each processing stage to the unloader (which also serves as the drying section). For more details, please contact us.

The cleaning machines for wafers and mask glasses are equipped with brush cleaning and fine jet cleaning. For more details, please contact us.

This machine automatically transports masks stored in the loader, passing through each processing tank and storing them in the unloader. It supports various options such as batch type and scrub washing. Please contact us for more details.

We would like to introduce the "CVD equipment" that we handle. Starting with the "Oxide/Nitride Plasma CVD Equipment," which achieves low stress, high hardness, and high insulation through a two-frequency independent application method, we also offer a lineup that includes "DLC Coating Equipment" and "Carbon Nanotube Synthesis Equipment." We can also manufacture multi-chamber specifications and various custom orders. Please feel free to contact us when needed. 【Features of Oxide/Nitride Plasma CVD Equipment】 ■ Achieves excellent film thickness distribution and reproducibility ■ Reduces metal contamination through special surface treatment ■ Capable of controlling a wide range of film properties ■ Abundant accumulated data ■ Compatible with tray transport *For more details, please refer to the PDF materials or feel free to contact us.