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Testing, Analysis and Measurement
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ジャパンクリエイト

EstablishmentDecember 7, 1963
capital3000Ten thousand
addressSaitama/Tokorozawa-shi/1-203-4 Lin Street
phone04-2938-3111
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last updated:Jun 25, 2025
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ジャパンクリエイト List of Products and Services

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Wafer automatic cleaning device Wafer automatic cleaning device
Etching device Etching device
Spin cleaning device Spin cleaning device
Spin dryer Spin dryer
Other cleaning equipment Other cleaning equipment
Wire saw Wire saw
Sputtering device Sputtering device
Vacuum deposition device Vacuum deposition device
Annealing device Annealing device
CVD equipment CVD equipment
Dry etching equipment Dry etching equipment
CO2 cleaning machine CO2 cleaning machine
Custom production achievements Custom production achievements
Coating device Coating device
Synthesis device Synthesis device
Drying oven Drying oven
CO2

CO2 cleaning machine

We would like to introduce the "CO2 cleaning machine" that we handle.

CO2 spray cleaning device

The substrate size is up to φ12 inches! Using our unique CO2 rubber jet nozzle.

The "CO2 Spray Cleaning Device" allows for CO2 cleaning in a low dew point environment for cleaning in a vacuum environment. It uses our proprietary nozzle, the CO2 Rubber Jet Nozzle. The speed and density of solid CO2 particles can be varied, enabling us to propose optimal cleaning conditions. It can be used for particle removal on micro lenses, removal of sputter residues, and improvement of wettability. 【Features】 ■ Our proprietary nozzle: CO2 Rubber Jet Nozzle ■ Cleaning in a vacuum environment ■ Damage-free dry cleaning is possible ■ Maximum substrate size is φ12 inches ■ Handheld spray unit available for sale *For more details, please refer to the PDF document or feel free to contact us.

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