ジャパンクリエイト Product Lineup

The SF series is widely used for compact tabletop drying of small quantities of silicon or compound semiconductor wafers. The operation is extremely simple: after placing the wafers on the rotating platform, just lower the top cover and press the start button to perform a safe spin-dry finish. For more details, please contact us.

The SFH type is a tabletop spin dryer. It is a tabletop spin dryer that specifically accommodates substrates of 150mm square or smaller in a cassette, allowing for manual vertical loading of either 2 or 4 cassettes for spin drying. It features a built-in HEPA or ULPA filter in the lid, which improves the cleanliness of the chamber by introducing clean air. For more details, please contact us.

This machine is a device for drying glass substrates, ceramic substrates, film substrates, and other materials. The items to be dried are placed in a dedicated cassette, which is then set into the rotor of the spin dryer using a cassette frame. The chamber creates a negative pressure through rotation, and clean air that passes through the HEPA filter integrated into the lid enhances the cleanliness within the chamber, allowing for high-quality spin drying. For more details, please contact us.

The SRD type is a drying device of the single carrier (25 sheets or 13 sheets) processing type that achieves high quality in addition to the excellent drying performance and operability of conventional models. By incorporating ULPA or HEPA filters into the lid and introducing clean air, it dramatically improves the cleanliness within the chamber. By changing the cradle, it can dry 2 to 3 types of wafers. For more details, please contact us.

The SPD type simultaneously dries 2 or 4 carriers, equipped with a clean filter at the top, ensuring that clean air continuously flows through the main body, maintaining cleanliness within the chamber. By changing the cradle, it can dry wafers ranging from 4 to 12 inches. For more details, please contact us.

~Overview~ - By incorporating an ULPA or HEPA filter into the lid, the cleanliness within the chamber is significantly improved by introducing clean air. - The replacement of the cradle allows for the drying of 4 to 8-inch wafers. For 12-inch wafers, it accommodates up to 2 carriers. - In the event of abnormal vibrations, it automatically stops.