ジャパンクリエイト List of Products and Services

The "DLC Coating Device" has a wealth of accumulated data, achieving excellent film thickness distribution and reproducibility. The film formation sources can be selected from RF plasma CVD method and ionized deposition method. It can be used for semiconductors, electronic components, optical components, automotive parts, and more. Additionally, multi-chamber specifications and various custom-made options can be produced. Please feel free to contact us when you need assistance. 【Features】 ■ Film formation sources can be selected from RF plasma CVD method and ionized deposition method ■ Substrate heating sources can be selected from water-cooled and heated types ■ Achieves excellent film thickness distribution and reproducibility ■ Capable of film formation on various substrate materials ■ Extensive control over film properties *For more details, please refer to the PDF materials or feel free to contact us.

This product is a device that applies our specialized sputtering technology to form films on various three-dimensional shapes made of metal, ceramics, and resin. It can be used for applications such as cosmetics, electronic components, battery parts, and the development of high-performance materials. In addition, we can propose various devices for miniaturization/large-scale production, CVD/various plasma treatments, and barrel/drum types. 【Features】 ■ Space-saving ■ Large capacity ■ Equipped with a unique sputter cathode ■ Screw-type stirring mechanism *For more details, please refer to the PDF materials or feel free to contact us.