ジャパンクリエイト List of Products and Services

SRC-15001 is a sheet-type spray cleaning device. Place the item to be cleaned on the sample table, and by turning ON the start switch, the sample table begins to rotate while the nozzle arm swings the radius of the cleaning item, spraying high-pressure pure water from a two-fluid nozzle. Next, finishing cleaning is performed using megasonic waves, followed by spin drying. For more details, please contact us or refer to the catalog.

The "tabletop spin coater" is a device that generates a coating film by rapidly rotating a smooth substrate, utilizing centrifugal force. It is mainly used in semiconductor manufacturing processes. The coating sizes available range from MAX φ150 to MAX φ450 (tabletop / inner cup method). Additionally, we are always accepting requests for demo machine rentals and thickness measurement tests at our company. If you are interested, please feel free to contact us. *For more details, please download the catalog or contact us.

The SD-8004 model is a spin spray development system for 4" to 8" wafers. It performs developing, rinsing, water washing, and spin drying through automatic and manual operation. Condition settings are done via a touch panel on the operation panel. Each processing mode is displayed on the touch panel during the respective mode. For more details, please contact us or refer to the catalog.

The automatic photoresist coating device automatically performs resist spin coating, vacuum baking, alignment, and spray development from cassette to cassette. Of course, you can also select the processes. The loader and unloader can be operated by one operator from the same side. A multi-joint robot is used for transportation between processes. This machine is suitable for 200mm square substrates or φ300mm substrates. For more details, please contact us or refer to the catalog.

The high-performance vacuum spin coater is a device that automatically spin-coats resist liquid onto various substrates. It incorporates technology to control the atmosphere within the chamber to achieve uniform and high-precision coatings. Specifically, it automatically performs functions such as nitrogen replacement, solvent gas introduction, and maintaining a vacuum state. For more details, please contact us or refer to the catalog.

The JASC-200 model is an automatic spin coater for cassette-to-cassette processing, which coats the resist and then automatically performs the baking process. The processing steps are arranged in a U-shape, allowing a single operator to work on the same side for loading and unloading. A multi-joint robot is used for transportation between processes. This machine is suitable for target workpieces ranging from 2" square to 5" square substrates or φ2" to φ5" substrates. For more details, please contact us or refer to the catalog.

The JASC-150 model is a fully automatic spinner with a developer solution temperature accuracy of ±1°C. It accommodates φ4", φ5", and φ6" through fixture exchange. By adopting high-precision robots, it has achieved high throughput. For more details, please contact us or refer to the catalog.

The MSC-500 model is a tabletop manual spin coater compatible with 300mm square glass substrates. Condition settings are performed via the touch panel on the control panel. Each processing mode is displayed on the touch panel during operation. For more details, please contact us or refer to the catalog.

The MSC-300 model is a manual tabletop spin coater with a dispenser that supports substrates ranging from φ2" to φ6". It is equipped with two dispense arms for automatic application. Condition settings are performed via a touch panel on the operation panel. Each processing mode is displayed on the touch panel during operation. For more details, please contact us or refer to the catalog.

Japan Create Co., Ltd.'s spinner is a product developed with a focus on performance and price among many spinners. It is a manual spinner intended for use in laboratories, schools, and other experimental settings. It can be applied mainly for resist coating of silicon wafers (gallium arsenide, glass, ceramics), as well as in developing devices, etching devices, stripping devices, and spin-drying devices. For more details, please contact us or refer to the catalog.

The tabletop manual spin coater is a manual type compatible with 300mm square glass substrates. Condition settings are made via the touch panel on the operation panel. Each processing mode is displayed on the touch panel during operation. For more details, please contact us.

This machine is a spin-type spray developing device that performs developing, rinsing, washing, and drying through automatic and manual operation. It can process several workpieces at once. For more details, please contact us or refer to the catalog.

The high-performance vacuum spin coater is a device that automatically spin coats resist liquid onto various substrates. It incorporates technology to control the atmosphere within the chamber, allowing for uniform and high-precision coatings. In other words, it automatically performs functions such as nitrogen replacement, solvent gas introduction, and maintaining a vacuum state. For more details, please contact us.

The automatic resist spin coater is a cassette-to-cassette automatic spin coater that coats resist and then also performs the baking process automatically. The processing area is arranged in a U-shape, allowing one operator to work on both the loader and unloader from the same side. A multi-joint robot is used for transportation between processes. This machine is suitable for target workpieces ranging from 2" square to 5" square substrates or φ2" to φ5" substrates. For more details, please contact us.

The automatic photoresist device is a machine that automatically performs resist spin coating, vacuum baking, alignment, and spray development from cassette to cassette. Of course, process selection is also possible. The loader and unloader can be operated by one operator from the same side. A multi-joint robot is used for transportation between processes. This machine is suitable for 200mm square substrates or φ300mm substrates. For more details, please contact us.