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  1. Home
  2. Testing, Analysis and Measurement
  3. ジャパンクリエイト
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Testing, Analysis and Measurement
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ジャパンクリエイト

EstablishmentDecember 7, 1963
capital3000Ten thousand
addressSaitama/Tokorozawa-shi/1-203-4 Lin Street
phone04-2938-3111
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last updated:Jun 25, 2025
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ジャパンクリエイト List of Products and Services

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Wafer automatic cleaning device Wafer automatic cleaning device
Etching device Etching device
Spin cleaning device Spin cleaning device
Spin dryer Spin dryer
Other cleaning equipment Other cleaning equipment
Wire saw Wire saw
Sputtering device Sputtering device
Vacuum deposition device Vacuum deposition device
Annealing device Annealing device
CVD equipment CVD equipment
Dry etching equipment Dry etching equipment
CO2 cleaning machine CO2 cleaning machine
Custom production achievements Custom production achievements
Coating device Coating device
Synthesis device Synthesis device
Drying oven Drying oven
Dry

Dry etching equipment

We would like to introduce the "dry etching equipment" that we handle.

Dry etching equipment

Switching between RIE mode and DP mode is possible! Reduction of metal contamination through special surface treatment.

The "Dry Etching Equipment" is a mass production device capable of fully automatic continuous processing of substrates up to φ12 inches. It features a dual-frequency independent application method that reduces metal contamination through special surface treatment. We also offer multi-chamber specifications and various custom-made options. This versatile device enables etching, ashing, and ion cleaning by switching gas types and plasma modes. 【Features】 ■ Switchable between RIE mode and DP mode ■ Reduction of metal contamination through special surface treatment ■ Compact footprint ■ Dual-frequency independent application method ■ Ultra-low temperature cooling stage *For more details, please refer to the PDF materials or feel free to contact us.

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Custom-made production achievements: Dry etching equipment

We have a track record of devices such as "XeF2 etching equipment" and "batch-type ashing equipment."

We would like to introduce the custom manufacturing achievements of Japan Create Co., Ltd. regarding "Dry Etching Equipment." We have a track record of "ICP Etching Equipment for Research and Development," "ICP Plasma Etching Equipment," "XeF2 Etching Equipment," and "Batch-type Ashing Equipment." Sample processing is being conducted using demo units. Please feel free to contact us when needed. 【Manufacturing Achievements】 ■ ICP Etching Equipment for Research and Development ■ ICP Plasma Etching Equipment ■ XeF2 Etching Equipment ■ Batch-type Ashing Equipment *For more details, please refer to the PDF materials or feel free to contact us.

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Assing device

It is a versatile and compact device that enables etching, ashing, and ion cleaning!

The "Ashing Device" is a mass production equipment capable of fully automated continuous processing of substrates up to a maximum of 12 inches in diameter. It is a versatile device that enables etching, ashing, and ion cleaning by switching gas types and plasma modes. 【Features】 ■ Switchable between RIE mode and DP mode ■ Reduced metal contamination through special surface treatment ■ Compact footprint ■ Independent application of two frequencies ■ Ultra-low temperature cooling stage Multi-chamber specifications, as well as custom designs for square substrates, can also be manufactured. *Please also refer to the PDF materials. *Feel free to contact us.

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  • 大型品の切削や低コストな複合加工に。ロボットシステムの資料進呈

    大型品の切削や低コストな複合加工に。ロボットシステムの資料進呈

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