昭和真空 List of Products and Services

The newly developed injection molding machine-linked high-speed sputtering and polymerization system, SPP-SERIES, enables automatic film formation of metal films and protective films on resin substrates used in automotive and decorative parts. It is capable of fully automatic vacuum film formation (sputtering and polymerization) on injection molded substrates. 【Target Products】 ◆ Automotive headlamp reflectors ◆ Mirrors ◆ Metal decorative films *For more details, please contact us or download the PDF to view.

• Vacuum Equipment
• Sputtering Equipment

The SPE-2136A is a plasma cleaner device capable of residue removal, surface modification, and ashing treatment for wafers ranging from φ4 to φ6 inches. It comes with an automatic transport mechanism, which helps prevent wafer breakage and reduces labor costs and working time associated with wafer transfer. The process chamber can handle two wafers simultaneously, achieving high throughput. 【Features】 ■ Compact design measuring 1400(W) × 3000(D) × 1900(H) mm ■ Distribution within the wafer is ±5% or less ■ Compatible with ultra-thin piezoelectric wafers such as SAW devices ■ Ar plasma cleaning is also available as an option *For more details, please refer to the documentation. Feel free to contact us with any inquiries.

• Plasma surface treatment equipment
• others

In the optical thin film process, by using the ALD (Atomic Layer Deposition) method, which is different from the commonly used deposition and sputtering techniques, it has become possible to form high-quality thin films with excellent conformity on substrates such as ball lenses and high-curvature lenses, which have been considered difficult until now. 【Overview】 ○ Up to 50 φ10 inch substrates can be processed at once (25 substrates × 2 axes) 　* This varies depending on the substrate shape and conditions. ○ Equipped with a substrate rotation mechanism.

• lens

The newly developed injection molding machine-linked high-speed sputtering and polymerization system, SPP-SERIES, enables automatic film formation of metal films and protective films on resin substrates used in automotive and decorative parts. It is capable of fully automatic vacuum film formation (sputtering and polymerization) on injection-molded substrates. 【Features】 ○ Fully automatic ○ Cycle time: 80 sec (Al: 100nm + SiOx: 20nm) ○ High adhesion → High adhesion can be achieved even without an undercoat For more details, please contact us or download the catalog.

• Vacuum Equipment
• Sputtering Equipment

Sapio-DBR (SGC-S1550i/S1300i series) is a vacuum deposition device specialized for optical multilayer DBR films for LEDs, offering good uniformity within the dome and enabling improved production efficiency. It is optimal for the deposition of optical multilayer DBR films for LEDs. 【Features】 ○ Excellent mass production performance → Substrate capacity: Approximately 400 pieces of φ2 inch wafers/batch Approximately 110 pieces of φ4 inch wafers/batch → Cycle time: Within 3 hours/batch → Required installation area: W4.6m × D6.3m × H3.2m * When using SGC-S1550i * Removal of the ceiling panel on the factory side may be necessary when attaching or detaching the quartz film thickness gauge. ○ Excellent reproducibility, continuous batch guarantee also available ○ Film quality adjustment is possible; we can assist with condition correction to suppress film damage due to chipping. For more details, please contact us or download the catalog.

• Evaporation Equipment

The ultra-high-performance optical film deposition device "Sapio 1300/1550" achieves high precision by incorporating a newly developed fiber-optic monitoring system and an 80-point monitor glass mechanism that enables stable temperature control, ensuring the desired characteristics are obtained. Thorough measures against outgassing allow for stable film quality and characteristics even when the chamber is contaminated. 【Features】 ○ High-efficiency exhaust system ○ Low particle specification (optional) ○ High-precision film thickness control system ○ High-output, large-area irradiation ion source For more details, please contact us or download the catalog.

• Vacuum Equipment
• Evaporation Equipment

The "SLS-401T" is a vacuum heating sealing device for Au/Sn aimed at SMD crystal oscillators. Related vacuum devices for crystals are one of Showa Vacuum's main products. Here, "crystal" refers to electronic components known as quartz devices, which include crystal oscillators, crystal oscillators, etc., that use crystal as a substrate. Quartz devices have a very stable oscillation frequency and have become essential key devices in various products related to our daily lives. Their applications are diverse, being used in almost all electrical products around us, including computers, clocks, automobiles, mobile phones, home game consoles, cordless phones, CDs, and digital cameras. 【Features】 - Vacuum heating sealing device for Au/Sn aimed at SMD crystal oscillators - Leak checks can be performed via CI measurement in the extraction chamber (optional) - Tact time of 0.4 seconds per piece or less - Connection to frequency adjustment devices is also possible (optional) - High-temperature sealing (up to 450°C) is also possible (optional) For more details, please contact us or download the catalog.

• Other processing machines

ALD (Atomic Layer Deposition) is a method for film formation that deposits a single atomic layer in one cycle, forming a thin film by repeating the cycles. It enables uniform layer control at the atomic layer level, allowing for the formation of high-quality thin films with excellent step coverage. 【Features】 ○ Ideal for film deposition on complex-shaped substrates ○ Compatible with resin substrates due to low-temperature deposition ○ Thin films with excellent gas barrier properties can be obtained For more details, please contact us or download the catalog.

• Vacuum Equipment
• Other semiconductor manufacturing equipment

The optical thin film deposition device "SGC-S1700 Series" is a standard machine dedicated to AR coating that incorporates the technology of Sapio 1300 while enhancing cost performance. It offers a variety of specification options, including RF ion sources, optical monitors, and inverted pallets. 【Features】 - High-level fusion of mass production performance and work efficiency - Installation space is only 20% larger than the 1300 class - Product yield is more than double For more details, please contact us or download the catalog.

• Evaporation Equipment

The Holocathode Ion Plating Device SIH-400T is ideal for depositing decorative films on accessories and hardening films on tools. By varying the amount and type of introduction gases (N2, O2, C2H2), it is possible to change the color of the deposited film. 【Features】 ○ Optimal for hardening film deposition on tools ○ Film deposition recipe control via touch panel operation ○ Ideal as a small-scale production machine or experimental machine For more details, please contact us or download the catalog.

• Other semiconductor manufacturing equipment

Showa Vacuum has fully revamped its bestselling device, the SPH-2500, which boasts approximately 15 years of proven performance. The load-lock type sputtering device "SPH-2500-II" inherits the features of the previous model while incorporating the latest technology, achieving performance that surpasses the conventional model in every aspect. 【Features】 ○ Dimensions: W1200×D2500×H1440, maintaining the same footprint while significantly reducing height ○ By improving the cathode, target usage efficiency has been greatly increased to 44% ○ Adopting a rack and pinion system eliminates transport issues caused by roller slippage For more details, please contact us or download the catalog.

• Sputtering Equipment

The SIA-400T is a device that employs an upgraded arc discharge type, which generates an arc discharge on the surface of the evaporation source, going through the processes of melting, deposition, and ionization to form a "surface hardening film" and a "decorative film," making it ideal for tools, blades, molds, etc. 【Features】 ○ Minimizes waste and ensures processing capacity ○ No need for replenishment of the evaporation source for each batch ○ User-friendly device that makes substrate mounting easy ○ Achieves a bonding strength of over 70N for TiN films formed with this device ○ By changing the evaporation source, deposition of almost all metals is possible For more details, please contact us or download the catalog.

• Other semiconductor manufacturing equipment

It enables stable discharge over a wide range and can be used for various applications, from improving adhesion from non-shift films of optical filters to resin substrates. Our unique approach allows for reliable ignition and stable discharge performance. 【Features】 ○ High-output ion source with beam current of 1500mA / beam voltage of 1500V / ion current density of over 100μA/cm² ○ Achieves uniformity of ion current density distribution within ±10% (measured with the 1300 and 1550 devices) at high power → Measurement results from Sapio-1300, limited to specified conditions by Showa Vacuum Co., Ltd. ○ Adoption of an auto-matcher for the neutralizer to ensure reliable ignition performance and stabilization ○ The use of a newly developed collector electrode (patent pending) enables high output with an emission current of 2500mA → Prevents particle generation due to charge-up For more details, please contact us or download the catalog.

• Ion implantation equipment

The high vacuum annealing device "SAF-52T-II" is developed for the purpose of removing internal stress distortions that occur during the processing of quartz oscillators and for thermal treatment to stabilize electrode films. It features a heating shelf measuring W460×D350×H35mm with a total of 10 independent processing chambers, capable of holding up to 60 standard trays measuring 170×134mm. 【Features】 ○ Equipped with two independently operable processing chambers ○ Enhances production efficiency and reduces cycle time ○ Efficient cycle time and labor-saving through full automation For more details, please contact us or download the catalog.

• Annealing furnace

The multifunctional vacuum deposition device "SEC-22C" employs an electron beam evaporation source as its evaporation source. It can deposit high melting point metals and oxides. The control of evaporation rate and film thickness is conducted using a quartz oscillation type thickness gauge. The main pump is equipped with a cryopump. The operation control system is fully automated. 【Features】 ○ The evaporation source and substrate fixture are arranged to achieve a good film thickness distribution. ○ The electron beam evaporation source uses a 6-point crucible, allowing for the deposition of six different materials in the same vacuum. ○ The substrate can hold 30 pieces of φ75mm, 20 pieces of φ100mm, and 9 pieces of φ150mm. ○ Deposition is possible within an incident angle of ±5°. ○ The anti-deposition shield inside the vacuum chamber is divided for easy replacement. For more details, please contact us or download the catalog.

• Evaporation Equipment

With the oil level gauge, you can easily check the oil quantity and dirt at a glance. Additionally, for maintenance, simply performing an early oil change is sufficient. This also improves work efficiency. 【Features】 ○ The oil heating heater uses an internal heat sheath heater, achieving energy savings. ○ Improved jet design significantly enhances exhaust performance. ○ Reduced pump startup time. ○ By integrating a direct water-cooled cold cap into the baffle, it is now possible to suppress oil back even with water cooling. For more details, please contact us or download the catalog.

• Vacuum pump

The inline frequency adjustment device "SFE-X2012" separates the processing chamber from the extraction chamber and is equipped with ion sources for both high and low frequencies, enabling efficient operation with minimal idle time. It is equipped with two IGF-201 type 100mm beam ion sources, which were also used in the SFE-B03. Each ion source can process up to 24 units simultaneously, for a total of 48 units. The device adopts the high precision, high stability, and high reproducibility transport mechanism proven in the SFE-B03. Frequency adjustment for small workpieces (2.0×1.6, 1.6×1.2), which was previously difficult in inline processes, can now be stably mass-produced. Each unit allows for the disassembly of individual devices, designed with maintenance in mind. 【Device Performance】 ○ Tact Time: 0.3 sec/pc or less * For workpieces over 18MHz and more than 24 units in a row ○ Adjustment Accuracy: ±1.5 ppm or less ○ Processing Capacity: Up to 24 rows (p4.0) × 32 columns ○ Production Volume: Over 12,000 pcs/hour For more details, please contact us or download the catalog.

• Other semiconductor manufacturing equipment

The ion plating device "SIP-1600" is a machine for depositing metal films onto resin substrates. It is capable of depositing two types of materials in the same batch. It comes with two internal jigs and carts, providing high productivity. The ion plating mechanism allows for smooth film deposition. 【Features】 ○ Depending on the size of the workpiece, either a 6-axis or 8-axis self-rotation jig can be installed. ○ The resistance heating evaporation source is equipped with switchable electrodes (2 sets). ○ An ion plating mechanism is included. ○ Two jig carts are standard equipment. ○ The installation of a refrigeration unit has improved the exhaust speed for H2O. For more details, please contact us or download the catalog.

• Other semiconductor manufacturing equipment

The road lock-type frequency adjustment device "SFE-B03-II" has achieved space-saving, high precision, and low cost, with a takt time of 0.4 s/pcs or less. (※In the case of SMD 3.2 × 2.5, 24 MHz, H1000 ppm/s, L50 ppm/s) Equipped with a new ion gun (beam width: 100 mm), it can process 24 to 32 units simultaneously as standard. The high-precision, high-stability, and high-reproducibility transport mechanism allows for stable production of micro-works measuring 2.0 × 1.6 or less. It features an FL mode (load capacity automatic calculation mode). The maintenance of the ion gun body and contact mechanism has significantly improved. By adopting a two-chamber load lock system, the processing chamber is always maintained in a vacuum, so the takt time does not depend on the time for vacuum evacuation and atmospheric release. With the installation of an overdrive mechanism loader/unloader as an optional unit, continuous operation has become possible. 【Features】 ○ Compact design ○ High precision ○ Low cost ○ High stability ○ High reproducibility For more details, please contact us or download the catalog.

• Other semiconductor manufacturing equipment

The "ECO-22" is an energy-saving unit and thermal insulation jacket that can be easily attached to the Showa Vacuum's internal heating oil diffusion pump (22 inches). By using the ECO-22, it is possible to implement environmental measures and reduce electricity costs without practically diminishing exhaust performance. 【Performance】 In the case of a device equipped with two oil diffusion pumps (SGC-1300 series), using the ECO-22 allows for a reduction of 1.7 kW for one pump and 3.4 kWh for two pumps. If the same system is operated for 300 days a year (24 hours), it can reduce electricity consumption by 24,480 kWh, resulting in a potential savings of 244,800 yen in electricity costs, assuming an electricity rate of 10 yen per kWh. For more details, please contact us or download the catalog.

• Other FA equipment