プレテック　静岡製作所 Product Lineup

In the metal processing industry, the removal of burrs after machining is crucial for ensuring quality and safety. Especially in the case of precision parts and complex-shaped metal products, complete removal of burrs is required. If burrs remain, they can lead to product malfunctions and safety issues. The cleaning unit "Fine Jet" meets a wide range of needs for burr removal cleaning in metal processing through stable oscillation from low to high output. 【Usage Scenarios】 * Cleaning after burr removal of metal parts * Cleaning of precision machine parts * Cleaning of parts after cutting processing 【Benefits of Implementation】 * Improvement in product quality through reliable burr removal * Reduction and efficiency of cleaning time * Compatibility with various metal materials

• Other cleaning equipment

In the field of chemistry, there is always a demand for improving the efficiency and accuracy of reactions. In particular, the cleaning of reaction vessels and substrates is crucial for the removal of impurities that can hinder reactions. If proper cleaning is not performed, it can lead to delays in reactions or incomplete combustion, ultimately negatively affecting the quality of the final product. Our cleaning unit, "Fine Jet," provides stable oscillation from low to high output, contributing to the efficiency of chemical reaction processes. [Usage Scenarios] - Cleaning of reaction vessels - Cleaning of substrates - Pre-cleaning before reagent preparation [Effects of Implementation] - Improved reaction efficiency - Stabilization of product quality - Reduction of cleaning time

• Other cleaning equipment

In the glass surface treatment industry, thorough cleaning of the substrate is essential to achieve high-quality surface treatment. In particular, if foreign substances or oil residues remain, it can significantly impair the quality of subsequent coatings or processing. Inconsistent cleaning or insufficient cleaning power can lead to product defects and reduced yield. FineJet allows for the selection of various frequencies, enabling the setting of optimal cleaning conditions for the characteristics of glass substrates and the surface treatment process. 【Usage Scenarios】 - Post-CMP cleaning of glass substrates - Cleaning of various glass substrates - Pre-treatment before surface processing 【Benefits of Implementation】 - Improved cleaning quality - Enhanced yield - Increased efficiency of the surface treatment process

• Other cleaning equipment

In the electronics industry, substrate cleaning is an important process for ensuring product quality and reliability. Especially in the case of miniaturized electronic components, thorough removal of foreign substances and residues is required. Inadequate cleaning can lead to decreased product performance or failure. Our cleaning unit, "Fine Jet," responds to a wide range of needs for electronic device substrate cleaning with stable oscillation from low to high output. 【Usage Scenarios】 - Cleaning of various wafer substrates - Cleaning of magnetic disks - Wafer cleaning after CMP 【Benefits of Implementation】 - Compatibility with diverse substrates - Improvement in product quality - Yield enhancement

• Other cleaning equipment

Precision cleaning in the semiconductor industry is a crucial process that affects product quality and yield. Particularly as miniaturization advances, fine foreign substances and residues adhering to wafers and substrates can lead to decreased device performance and defects. Therefore, high cleaning capability and minimizing damage to substrates are required. Fine jets contribute to solving challenges in semiconductor manufacturing by providing stable oscillation from low to high output, addressing various cleaning needs. 【Usage Scenarios】 - Wafer substrate cleaning - Magnetic disk cleaning - Post-CMP wafer cleaning 【Benefits of Implementation】 - Response to a wide range of cleaning needs - Improved yield through high-quality cleaning - Optimal cleaning through diverse nozzle variations

• Other cleaning equipment

This product is a spin cleaning unit designed to efficiently clean and dry square-shaped substrates (square substrates), including photomask substrates. ■ Cleaning process specialized for square substrates It provides stable spin cleaning for square substrates, which are generally considered difficult to process with rotation. It is primarily designed for photomask substrates of size 152×152mm, but it can accommodate various sizes of square substrates. ■ Complete process from cleaning to drying in one unit The drying process, using high-speed rotation, is performed within the same unit following the cleaning process. This allows for the completion of the entire series of processes without moving the substrate, contributing not only to a reduction in takt time but also to a decrease in the risk of recontamination during movement, thereby maintaining high cleaning quality. *For more details, please download the catalog or feel free to contact us.

• Other cleaning machines

In the food processing industry, maintaining product quality and ensuring safety are crucial. In particular, effective sterilization methods are required to suppress the growth of bacteria and mold that can cause foodborne illnesses. Traditional sterilization methods carry the risk of quality degradation due to the use of chemicals or high-temperature heating. Our radical cleaning unit generates OH radicals to efficiently sterilize bacteria and microorganisms attached to food. With an LED design that does not use mercury, it achieves safe sterilization without compromising food quality. 【Usage Scenarios】 - Sterilization on food processing lines - Sterilization of food packaging materials - Sterilization of food manufacturing equipment 【Benefits of Implementation】 - Preservation of food quality - Reduction of foodborne illness risks - Safe food provision

• Other cleaning machines

In the pharmaceutical industry, advanced decontamination technologies are required to minimize the risk of contamination in the manufacturing process. In particular, in the pharmaceutical manufacturing environment, trace amounts of organic matter or metal contamination can have a serious impact on product quality. Our radical cleaning unit efficiently generates OH radicals to address these challenges. 【Application Scenarios】 * Decontamination of pharmaceutical manufacturing equipment * Removal of contaminants in clean rooms * Cleaning of laboratory instruments in research and development facilities 【Benefits of Implementation】 * Reduction of contamination risk * Improvement of product quality * Streamlining of the manufacturing process

• Other cleaning machines

In the display industry, the removal of foreign substances, which affects product quality, is crucial. In particular, the presence of fine foreign particles can lead to display malfunctions and a decrease in product lifespan. Our radical cleaning unit efficiently generates OH radicals and strongly supports the removal of foreign substances in the display manufacturing process. 【Application Scenarios】 - Removal of foreign substances in the display manufacturing process - Removal of photoresist residues - Suppression of metal contamination 【Benefits of Implementation】 - Quality improvement through high-purity cleaning - Cost reduction through space-saving design - Reduction of environmental impact

• Other cleaning machines

In the photomask industry, the removal of fine particles during the manufacturing process is a critical challenge that affects product quality and yield. In particular, the cleaning of wafers and photomasks requires the removal of submicron-level contaminants. Inadequate cleaning can lead to decreased device performance and the occurrence of defective products. Our cleaning unit, the "Proximity Megasonic PA10-Q60AE-S," enables cleaning close to the substrate and addresses these challenges by removing submicron particles. [Usage Scenarios] - Cleaning of silicon wafers - Cleaning of photomasks - Cleaning after CMP - Batch cleaning [Benefits of Implementation] - Improved yield due to high cleaning performance - Enhanced product quality - Reduced cleaning time

• Ultrasonic Cleaner

In the pharmaceutical industry, the integrity of containers is crucial for ensuring product quality. The cleanliness of containers and the presence of foreign substances directly impact product safety, necessitating thorough inspections. In the inspection of containers after ultrasonic cleaning, accurately measuring sound pressure levels and evaluating the uniformity of cleaning are key elements of quality control. The Sonic Checker PT-VM02 contributes to this challenge with precise sound pressure measurement and portability. 【Usage Scenarios】 - Inspection of cleanliness of pharmaceutical containers - Measurement and management of sound pressure in cleaning devices - Quality control on the manufacturing line 【Benefits of Implementation】 - Improved quality through optimization of the cleaning process - Reduced inspection time - Enhanced product reliability

• Other measurement, recording and measuring instruments

In the food industry, managing the cleaning process is crucial for maintaining product quality. In particular, optimizing the cleaning process is essential to prevent foreign matter contamination and ensure product safety. Inadequate cleaning can increase the risk of product quality deterioration and foreign matter contamination. The Sonic Checker PT-VM02 measures the sound pressure of ultrasonic cleaning and visualizes the cleaning effect, thereby supporting quality management. 【Usage Scenarios】 - Management of cleaning processes in food manufacturing lines - Maintenance of cleaning equipment - Inspections in quality control departments 【Benefits of Implementation】 - Improved quality through visualization of cleaning effects - Cost reduction through optimization of cleaning processes - Reduced risk of foreign matter contamination

• Other measurement, recording and measuring instruments

In the medical device industry, performance evaluation of ultrasonic cleaning is crucial to ensure product quality and safety. Especially for medical devices that use precise components and delicate materials, optimizing the cleaning process is essential. Improper cleaning can lead to equipment failure or performance degradation. The Sonic Checker PT-VM02 accurately measures the sound pressure of ultrasonic cleaning, making it easier to manage the cleaning process. 【Usage Scenarios】 - Evaluation of the cleaning process in the manufacturing of medical devices - Performance evaluation of cleaning equipment - Optimization of cleaning solutions 【Benefits of Implementation】 - Improved cleaning quality - Increased product reliability - Reduction of defective products

• Other measurement, recording and measuring instruments

In the surface treatment process of the electronic components industry, the removal of fine organic and metal contaminants significantly affects product quality and reliability. Particularly in electronic components where high density is advancing, it is crucial to thoroughly eliminate contamination and perform high-quality surface treatment. The radical cleaning unit addresses these challenges through highly efficient OH radical generation. 【Application Scenarios】 - Photoresist removal - Prevention of metal film oxidation - Removal of organic and metal contamination 【Benefits of Implementation】 - Improved cleaning efficiency - Reduced environmental impact - Enhanced product quality

• Other cleaning machines

In experiments conducted at research institutions, accurate data acquisition is essential. Particularly in experiments utilizing ultrasound, precise measurement and management of sound pressure levels significantly affect the reproducibility and reliability of the experiments. Traditional measurement methods often required large equipment or were limited to specific measurement locations, which could hinder efficient experimentation. Our ultrasonic sound pressure meter, the "Sonic Checker PT-VM02," employs a compact amplifier that can be held with one hand, enabling stable measurements. With a 7-segment LED display and auto-ranging function, even weak sound pressures are accurately displayed. 【Usage Scenarios】 - Sound pressure measurement in ultrasonic cleaning experiments - Research and development utilizing ultrasound - Acoustic property evaluation 【Benefits of Implementation】 - Improved reliability of experimental data - Enhanced experimental efficiency - Greater flexibility in measurement locations

• Other measurement, recording and measuring instruments

In the quality control of the electronic components manufacturing industry, the cleaning process is a crucial factor that affects product reliability. Changes in cavitation intensity within the cleaning tank and aging deterioration can lead to reduced cleaning effectiveness and adverse effects on products. To prevent these issues and maintain stable quality, it is essential to accurately understand the condition of the cleaning tank and implement appropriate management. The PT-VM02 supports problem-solving in quality control by quantifying the condition of the cleaning tank. 【Usage Scenarios】 - Daily management of the cleaning tank - Aging deterioration management - Performance comparison of cleaning equipment - Evaluation of cavitation intensity 【Benefits of Implementation】 - Visualization of the cleaning tank's condition for early detection of abnormalities - Quality improvement through optimization of the cleaning process - Stable operation of equipment and improved product yield - Reduction of maintenance costs

• Other measurement, recording and measuring instruments

In the semiconductor industry, it is crucial to strictly manage the cleanliness of the manufacturing process to improve product quality and yield. Particularly in the ultrasonic cleaning process, the contamination of cleaning solutions and the uniformity of cavitation significantly affect cleanliness. Improper sound pressure management can lead to inadequate cleaning and damage to wafers. 【Application Scenarios】 * Measurement of sound pressure in ultrasonic cleaning equipment * Management of cleaning solution cleanliness * Quality control of the cleaning process 【Benefits of Implementation】 * Improved yield through optimization of the cleaning process * Stabilization of cleaning quality * Reduction of contamination risks Our company develops, designs, manufactures, and sells various equipment for the semiconductor industry, specializing in customized production tailored to customer needs. We provide comprehensive support from design to maintenance, reflecting technological trends in product development through close relationships with our customers.

• Other measurement, recording and measuring instruments

In the cleaning of experimental equipment at research institutions, high cleaning performance is required to prevent contamination and obtain accurate experimental results. In particular, the removal of fine organic materials and metal contaminants is a crucial factor that affects the precision of experiments. Radical cleaning units efficiently generate OH radicals to address these challenges. 【Usage Scenarios】 - Cleaning of experimental equipment - Cleaning of fine parts - Metal contamination countermeasures 【Benefits of Implementation】 - Improved experimental accuracy due to high cleaning power - Reduced environmental impact - Lower running costs

• Other cleaning machines

In the medical device industry, advanced sterilization processes are required. Particularly for medical instruments that come into direct contact with the patient's body, such as surgical tools and endoscopes, reliable sterilization is essential to reduce the risk of infections. Inadequate sterilization can lead to health hazards for patients. Our radical cleaning unit generates OH radicals, achieving efficient sterilization processes. 【Usage Scenarios】 - Sterilization of surgical instruments - Sterilization of endoscopes - Sterilization of medical tubes 【Benefits of Implementation】 - Reduction of infection risks due to high sterilization effectiveness - Space-saving design due to compact structure - Reduced environmental impact by using mercury-free LEDs

• Other cleaning machines

In the semiconductor industry’s precision cleaning processes, advancements in microfabrication technology have led to demands for higher cleaning accuracy and reduced environmental impact. In particular, the complete removal of organic contaminants and photoresist residues, as well as the suppression of metal contamination, are critical challenges that affect product quality and yield. Radical cleaning units achieve high-purity cleaning and contribute to solving these issues. 【Usage Scenarios】 - SPM-free photoresist removal process - Suppression of organic and metal contamination - Metal film oxidation prevention process 【Benefits of Implementation】 - Improved cleaning efficiency - Reduced environmental impact - Enhanced product quality

• Other cleaning machines

The proximity megasonic cleaning unit "PA10-Q60AE-S" directly irradiates high-frequency sound waves of 1.0MHz or 3.0MHz onto the substrate, efficiently removing fine particles and residues in a non-contact manner. Equipped with a unique liquid supply system, it ensures a uniform cleaning area up to the outer edge of the substrate. It minimizes liquid splatter and energy loss, making it suitable for the precise cleaning of semiconductor wafers and photomask substrates with fine structures. The main body is made of high-purity quartz, which has low dust generation and excellent chemical resistance, allowing for combined cleaning with strong acids and strong alkalis. Its direct irradiation method above the substrate is compatible with single-wafer cleaning devices, enabling flexible design for each process. [Applications] - Removal of fine particles from semiconductor wafers - Cleaning of residues after photoresist stripping - Cleaning after TSV, MEMS structures, and film formation, etc. *Demo units are available for you to check the usability. *For more details, please download the PDF or feel free to contact us.

• Ultrasonic Cleaner

The Sonic Checker (PT-VM02) is an ultrasonic sound pressure sensor suitable for the maintenance, inspection, and aging deterioration management of cleaning tanks for semiconductor cleaning equipment and parts cleaning. Despite being the lightest handheld type that can be held with one hand, it supports a wide frequency range from 20 kHz to 8 MHz. It prevents cross-contamination in semiconductor cleaning tanks and employs a unique detection algorithm that enables the detection of fine ultrasonic energy, which was difficult with conventional detectors. 【Main Applications】 ■ Daily management and aging deterioration management of cleaning tanks ■ Performance comparison of cleaning equipment ■ Evaluation of cavitation intensity *For more details, please download the PDF or feel free to contact us. *We also have demo units available for you to check the usability.

• Other measurement, recording and measuring instruments

The "LEO Unit PT-0878LEO" is a high-power infrared (UV) LED cleaning unit that features a compact design and localized ultraviolet irradiation, enabling process treatment at low flow rates. It achieves long running times compared to mercury lamps. By combining deep ultraviolet light with ozone water, it generates highly efficient OH radicals, contributing to the breakdown of organic substances. This product is expected to be utilized in the medical and food sectors due to its high sterilization power against viruses and other pathogens. 【Features】 ■ Achieves a cleaning liquid processing unit equipped with deep ultraviolet LEDs for a mercury-free society ■ Achieves long running times compared to mercury lamps ■ Realizes a compact design and localized ultraviolet irradiation, enabling process treatment at low flow rates *For more details, please download the PDF or feel free to contact us.

• UV/Ozone Sterilization Systems and Equipment

The "Sonic Checker PT-VM02" is a sound pressure meter that employs a compact amplifier that can be held with one hand, providing a stable user experience. It features a 7-segment LED display for improved visibility of values, and it is equipped with an auto-range function that ensures even weak sound pressures are clearly displayed. With measures taken against surrounding nozzles, it achieves a stable analog output method. Additionally, it offers a dual power supply option, allowing users to switch between AC adapter and battery operation as needed. 【Features】 ■ The sensor can be made of quartz, preventing contamination from cleaning solutions. ■ It uses a compact amplifier that can be held with one hand, ensuring a stable user experience. ■ The 7-segment LED display enhances the visibility of values, and the auto-range function ensures that even weak sound pressures are clearly displayed. *For more details, please download the PDF or feel free to contact us.

• Other measurement, recording and measuring instruments

The "Proximity Type Megasonic PA10-Q60AE-S" is a cleaning unit that emits sound waves at 1.0MHz or 3.0MHz from the nozzle tip. It enables high linearity oscillation from a low output range. Since it cleans very close to the substrate, it can remove sub-micron particles. It allows for liquid supply with a cavitation prevention function and enables a sweeping motion on the substrate, achieving highly reproducible cleaning across the entire substrate. 【Features】 ■ The nozzle material is quartz, which has low particle generation and is durable against chemical solutions. ■ Emits sound waves at 1.0MHz or 3.0MHz from the nozzle tip. ■ Enables high linearity oscillation from a low output range. ■ Cleans very close to the substrate, allowing for the removal of sub-micron particles. *For more details, please download the PDF or feel free to contact us.

• Ultrasonic Cleaner

Our company offers "Ultrasonic Cleaning Units" that support various precision cleaning applications using advanced ultrasonic technology. The ultrasonic oscillator employs high-performance transistors, allowing for the selection of output and frequency suitable for specific applications, known as "Ultrasonic." Additionally, we provide "Sweep Sonic," which continuously varies the wavelength of standing waves generated by ultrasound to completely clear the intensity of ultrasonic energy. Please contact us for inquiries. 【Ultrasonic Features】 ■ Removes particles through cavitation generated by liquid resonance of ultrasound ■ The ultrasonic oscillator uses high-performance transistors, allowing for the selection of output and frequency suitable for specific applications ■ Effective for removing particles larger than 1μ from silicon wafers, magnetic disks, lenses, cassettes (carriers), etc. *For more details, please refer to the related links or feel free to contact us.

• Ultrasonic Cleaner
• Other cleaning machines

We offer the "Fine Series Cleaning Units," including a batch cleaning unit that uses 750kHz. The "Fine Sonic (Batch Cleaning Unit)" efficiently transmits sound waves through a specially designed vibrating element, removing sub-micron particles without damaging the workpiece. Additionally, we provide the "Fine Jet (Spray Cleaning Tool)," suitable for cleaning silicon wafers and photomasks, as well as the "Fine Scall (Shower Cleaning Tool)," which sprays ultra-pure water infused with 1.5MHz sound waves for cleaning. 【Features】 < Fine Sonic > ■ Batch cleaning unit using 750kHz ■ Efficiently transmits sound waves through a specially designed vibrating element, removing sub-micron particles without damaging the workpiece ■ Suitable for cleaning silicon wafers, photomasks, and magnetic disks *For more details, please refer to the related links or feel free to contact us.

• Ultrasonic Cleaner
• Batch type cleaning machine
• Spray Cleaner

The "precision cleaning device" is a highly reliable system widely used in the cleaning processes of various precision parts and products. With the adoption of touch panels and other features, operability, safety, and maintainability have been further improved. Additionally, high-grade parts are used throughout the system to enhance its overall quality. The sophisticated ultrasonic cleaning unit achieves super clean cleaning. 【Applications】 ■ CD/LD master discs ■ Plastic lenses and optical lenses ■ Memory discs, aluminum/glass ■ LCD TFT/CF ■ Cases/cassettes *For more details, please refer to the related links or feel free to contact us.

• Ultrasonic Cleaner
• Ozone Generator
• Other cleaning machines

Our company offers a "Disk Cleaning Device" that is highly effective for cleaning memory disks and LCD glass. By adopting a cassette-less system, we have achieved improved cleaning capability and energy savings. The batch cleaning section can be selected from our wide variety of ultrasonic cleaning units according to the application, allowing for particle removal at the appropriate frequency without causing damage. [Features] - The adoption of a cassette-less system enables both batch cleaning and brush cleaning in a single device. - The brush cleaning section uses a sand scrub method, allowing for simultaneous cleaning of both sides. - The combination of the batch cleaning unit and brush cleaning unit is flexible. *For more details, please refer to the related links or feel free to contact us.

• Ultrasonic Cleaner
• Batch type cleaning machine
• Other cleaning machines

The "cassette-less cleaning device" is a product that allows for smooth robot transport without chipping and significantly reduces running costs. It uses Fine Sonic (high-frequency oscillator/transducer) to remove particles without causing damage. By adopting various super clean technologies, it resolves all the issues related to cassettes in cleaning. 【Features】 ■ Eliminates uneven cleaning in cassette contact areas ■ Achieves greater cleanliness with a smaller amount of cleaning solution in the tank ■ Significantly reduces power consumption ■ Minimizes the amount of cleaning solution during inter-tank transfers *For more details, please refer to the related links or feel free to contact us.

• Ultrasonic Cleaner
• Bio-related products Cleaning equipment

Introducing the "SpinSonic Cleaner," which achieves high cleaning capability through the adoption of a wafer horizontal placement and sheet-fed fine jet method. It can remove sub-micron particles, reduce the number of processes, and eliminate the need for chemical management and heaters. It demonstrates excellent performance that enables a reduction in cleaning time and savings in running costs. 【Features】 - High cleaning capability achieved with chemical-compatible fine jets and 400kHz fine jets - Maintenance-free and damage-free cleaning through non-contact (brushless) cleaning - Capability to perform all cleaning and drying processes in one stage - No need for heaters due to a completely ambient temperature process, significantly reducing power consumption - Compact installation area and high layout flexibility achieved through function-specific unit configuration *For more details, please refer to the related links or feel free to contact us.

• Ultrasonic Cleaner
• Bio-related products Cleaning equipment

"Fine Sonic" is a cleaning unit that achieves uniform sound pressure. It allows for stable output adjustment in 1W increments. It is suitable for cleaning various types of wafer substrates, photomasks, magnetic disks, and more. Additionally, it contributes to the expansion of the cleaning area with maximum output increase. Please feel free to contact us when you need assistance. 【Features】 ■ Achieves uniform sound pressure ■ Various frequencies available for selection [750kHz/(1000kHz)/(1500kHz)/2000kHz] ■ Fine output adjustment: stable output adjustment in 1W increments ■ Maximum output increase: expansion of the cleaning area ■ Communication function: monitoring of oscillator status, external settings (PT-150MV) ■ Compliance with various standards (FCC, CE, RoHS) *For more details, please download the PDF or feel free to contact us.

• Other cleaning equipment

"Fine Score" is a cleaning unit suitable for FPD substrate cleaning and various wafer substrate cleaning. The cleaning width ranges from 160mm to 2210mm, offering a detailed size variation. Additionally, the maximum output increase contributes to the expansion of the cleaning area and cost reduction. Please feel free to contact us if you have any inquiries. 【Features】 ■ Detailed size variation ■ Cleaning width ranges from 160mm to 2210mm ■ Fine output adjustment: stable output adjustment in 1W increments (PT-150MV) ■ Maximum output increase: expansion of the cleaning area and cost reduction ■ Communication functions: monitoring of oscillator status, external settings ■ Compliance with various standards (FCC, CE, RoHS) *For more details, please download the PDF or feel free to contact us.

• Other cleaning equipment

The "Fine Jet" is a cleaning unit that allows for the selection of various frequencies. It meets a wide range of needs for single wafer cleaning with stable oscillation from low to high output. It is suitable for various applications such as cleaning wafer substrates, magnetic disks, and post-CMP cleaning of wafers. Additionally, there are various nozzle options available, including chemical resistance and metal contamination-free types. 【Features】 ■ Fine output adjustment: Stable output adjustment in 1W increments (PT-010J50) ■ Selection of various frequencies available (400kHz/1500kHz/3000kHz) ■ Variety of nozzle options: Chemical resistance, metal contamination-free ■ Enhanced detection function: Capable of detecting transducer degradation (PT-010J50) ■ Enhanced communication function: Monitoring of oscillator status and external settings (PT-010J50) *For more details, please download the PDF or feel free to contact us.

• Other cleaning equipment