PI Japan Product Lineup

In semiconductor processes and inspection equipment, position correction and focus adjustment at the submicron level are key to stabilizing quality. Particularly in inspection and fine processing stages, high-precision position control with nanometer resolution is required. The P-616 NanoCube is a compact XYZ piezo nano positioner with a stroke of 100 µm on each axis. Its high-rigidity flexure guide structure enables smooth operation without backlash, allowing for fine position adjustments with nanometer resolution. It is suitable for applications such as fine motion correction stages in semiconductor manufacturing equipment and integration into inspection devices. 【Application Scenarios】 - Fine position correction for wafer inspection equipment - Mask inspection processes - Focus adjustment for laser annealing devices - Fine motion control for probing equipment - Semiconductor research and development applications 【Benefits of Implementation】 - High-precision position correction with nanometer resolution - High reproducibility due to backlash-free structure - Easy integration into devices with compact design - Contributes to the stabilization of fine processes

In optical systems, even slight deviations in beam position or optical axis can significantly affect coupling efficiency and measurement accuracy. This is especially critical in applications such as interferometric measurements, laser focusing, and fiber alignment, where sub-micron positioning control is essential. The P-616 NanoCube is a compact XYZ piezo nanopositioner with a working range of 100 µm per axis. Its flexure guide structure enables backlash-free, highly linear motion. With nanometer resolution for fine positioning and high mechanical stability, it supports the precise alignment of optical systems with high reproducibility. Designed to accommodate a range of applications from research to device integration, it meets the advanced positioning control needs in the photonics field. 【Application Scenarios】 - Optical fiber alignment (optimization of coupling efficiency) - Fine adjustment of laser focusing positions - Interferometric and holography devices - Microscopy stage fine motion control - Integration into photonics research equipment 【Benefits of Implementation】 - Improved optical axis adjustment accuracy with nanometer resolution - High reproducibility due to backlash-free structure - Drift reduction through high-stiffness flexure design - Easier integration into devices due to compact design

In the field of nanotechnology, the precision of sample and probe positioning significantly affects the reproducibility of experimental results. Scanning Probe Microscopy (SPM) and nano-lithography applications require stable XYZ control with nanometer resolution. The P-616 NanoCube is a compact XYZ piezo nanopositioner with a stroke of 100 µm on each axis. Its high-rigidity flexure guide structure enables smooth operation without backlash, allowing for high-precision positioning at nanometer resolution. It is utilized as a positioning control platform that supports nanoscale measurement, processing, and evaluation, catering to both research applications and device integration. 【Application Scenarios】 - Scanning Probe Microscopy (SPM/AFM/STM) - Nano-lithography equipment - Nano material evaluation - Nano device research and development - High-precision sample positioning 【Benefits of Implementation】 - High-precision position control with nanometer resolution - High reproducibility due to backlash-free structure - Stable scanning enabled by high-rigidity design - Compact design facilitates integration into vacuum systems and research equipment

In laser microfabrication, even slight deviations in beam position or focus directly affect processing quality. This is especially true for microfabrication and high aspect ratio processing, where precise position control at the sub-micron level is essential. The P-616 NanoCube is a compact XYZ piezo nanopositioner with 100 µm stroke on each axis. Its high-rigidity flexure guide structure enables backlash-free, highly linear motion, allowing for fine position adjustments with nanometer resolution. By integrating it into laser processing equipment, it supports: - Fine adjustment of beam position - High-precision control of focus position - Correction of processing position to enhance the stability of microfabrication. 【Application Scenarios】 - Integration into laser microfabrication equipment - Precise control of focus position - Position correction for micro-drilling processes - Thin film processing and precision patterning 【Benefits of Implementation】 - High-precision control of focus position with nanometer resolution - High reproducibility due to backlash-free structure - Easy integration into equipment with compact design - Stabilization of microfabrication quality

In high-magnification microscopy, even slight positional shifts can significantly affect the clarity and reproducibility of images. This is especially true for confocal microscopes, fluorescence microscopes, and live cell observations, where precise XYZ control at sub-micron levels is essential. The P-616 NanoCube is a compact XYZ piezo nanopositioner with a working range of 100 µm on each axis. Its high-stiffness flexure guide structure enables smooth operation without backlash, allowing for fine positioning with nanometer resolution. It also supports Z-axis focus control and XY scanning applications, making it versatile for a wide range of research uses and equipment integration. 【Usage Scenarios】 - Z-axis focus control for confocal microscopes - Multi-point observation with fluorescence microscopes - Live cell imaging - Fine positioning under high-magnification objectives - Observation of nanoscale materials 【Benefits of Implementation】 - High-precision focus control with nanometer resolution - High reproducibility due to backlash-free structure - Stable scanning operation due to high-stiffness design - Easy integration into existing microscopes with compact design

In high-resolution observation using electron microscopes (SEM/TEM), the positioning accuracy of the sample affects image quality. Even slight vibrations or crosstalk can impact measurement precision, making a high-rigidity and high-response positioning stage essential. The P-561, P-562, P-563, and PIMars Nanopositioning Stages achieve high precision and positioning stability through capacitive sensors. The operational range is 100/200/300 µm in each XYZ direction (depending on the model), with a reproducibility of ±2nm and linearity of 0.03%. [Application Scenarios] - Sample positioning in electron microscope observation - Semiconductor inspection - Super-resolution microscopy - Photonics alignment [Benefits of Implementation] - Improved observation accuracy through precise positioning at the nanoscale - Efficient observation enabled by high resolution and fast response - Stable operation achieved through high reliability and long lifespan

In high-precision measurement, the positioning accuracy of the probe affects the reliability of the measurement results. Even slight vibrations or crosstalk can be sources of error, necessitating stable nanopositioning achieved through high rigidity and closed-loop control. The P-561, P-562, and P-563 PIMars Nanopositioning Stages are XYZ multi-axis piezo flexure stages that utilize a parallel kinematics structure and capacitive sensors. They achieve a reproducibility of ±2 nm and linearity of 0.03%, enabling high-precision probe positioning with low crosstalk. With high resonance frequency and excellent dynamic characteristics, they are suitable for high-speed scanning measurements and micro-displacement measurements. They are ideal for precision measurement applications such as semiconductor inspection and nanomaterial analysis. 【Application Scenarios】 - Semiconductor inspection - Super-resolution microscopy - Photonics alignment 【Benefits of Implementation】 - Achievement of high-precision measurement results - Reduction of measurement time - Improvement of product quality

The S-335 Chip/Tilt Piezo Platform is a high-performance stage that achieves both large deflection angles and high dynamic response. It enables high-precision angle control without friction or backlash through piezoelectric elements, and realizes equivalent high performance with a two-axis parallel kinematics design. It is ideal for applications such as microscope scanning, high-speed imaging, and beam steering, supporting stable and high-precision operation. For detailed performance, please refer to the catalog. 【Application Scenes】 - Laser scanning microscopy - High-speed sample scanning and optical imaging - Beam steering/scanning control - Image processing/beam stabilization devices 【Benefits of Implementation】 - Achieves a wide scanning range with ±35 mrad high angle control - Enables high-speed step and settle due to high dynamic performance - High reliability with high-precision angle control without friction or backlash

In the semiconductor manufacturing industry, high-precision control in the positioning of wafers and masks is essential due to the advancement of manufacturing processes. Particularly in fine processing and inspection stages, accurate positioning at the nanometer level significantly affects product quality and yield. Low positioning accuracy can lead to the occurrence of defective products and a decrease in manufacturing efficiency. The N-331 PICMAWalk is an embedded linear actuator that combines high thrust of up to 50 N with sub-nanometer resolution. It supports high-speed operation of up to 12 mm/s, contributing to the reduction of takt time in inspection equipment. The friction drive mechanism allows for position holding even when the power is off. Additionally, its vacuum-compatible specifications make it suitable for use in semiconductor inspection equipment and clean environments. 【Application Scenarios】 - Wafer positioning in semiconductor manufacturing equipment - Positioning in mask aligners - High-precision positioning in inspection equipment 【Benefits of Implementation】 - Achieves high-precision positioning at the nanometer level - Contributes to improved quality and yield in manufacturing processes - Usable in vacuum environments For details on thrust characteristics, other specifications, and vacuum-compatible options, please refer to the catalog.

In the optical industry, precise positioning at the nanometer level is required for the adjustment of intricate optical systems. Particularly in situations such as optical axis alignment and lens positioning, where even slight misalignments can significantly impact system performance, high-precision positioning capability is essential. Inaccurate adjustments can lead to image distortion and reduced measurement accuracy. The high-thrust PICMAWalk actuator N-331 achieves positioning with nanometer precision, maximizing the performance of optical systems. 【Application Scenarios】 - Adjustment of objective lenses in optical microscopes - Optical axis alignment in laser processing machines - Wafer positioning in semiconductor manufacturing equipment 【Benefits of Implementation】 - High-precision positioning at the nanometer level - Improved performance of optical systems - Enhanced work efficiency

In the fields of life sciences and biotechnology, stable focusing during microscopic observation greatly affects the reproducibility of acquired data and the accuracy of analysis. Particularly in live cell imaging and 3D observation, high-speed and high-resolution Z-axis control is required. The P-737 PIFOC Z stage employs a piezo-flexure mechanism that directly drives the objective lens, achieving high-speed Z positioning with nanometer resolution. Depending on the model, it can secure sufficient stroke length, making it suitable for Z-stack acquisition and long-duration observations. Its compact design also allows for easy integration into existing microscope systems. 【Usage Scenarios】 - Live cell imaging - 3D observation using confocal microscopy - Cell culture and tissue observation 【Benefits of Implementation】 - Reduced measurement time through high-speed Z scanning - Precise focusing with nanometer resolution - Highly reproducible imaging - Easy integration into microscope systems

In the field of research using microscopes, high-speed and high-precision focusing significantly impacts the quality of observation results and the reproducibility of acquired data. Particularly in 3D imaging and Z-stack acquisition using confocal and fluorescence microscopes, high-speed Z positioning with nanometer resolution is required. The P-737 PIFOC Z stage employs a piezo-flexure structure that directly drives the objective lens, achieving high-speed response and high-precision Z-axis control. Its compact design makes it easy to integrate into existing microscope systems, meeting the advanced focusing requirements in research applications. 【Usage Scenarios】 - 3D imaging with confocal microscopes - Z-stack acquisition with fluorescence microscopes - Live cell imaging - Observation of nanoscale structures 【Benefits of Implementation】 - Reduced measurement time through high-speed Z scanning - High-precision focusing with nanometer resolution - Highly reproducible imaging - Easy integration into microscope systems

In the field of nanotechnology, high-resolution and stable focus position control is required for the observation and evaluation of nanoscale structures. The P-725.xCDE2 PIFOC is a focus scanner for objective lenses that features a maximum travel range of 800 µm (depending on the model) and sub-nanometer resolution (when used with the appropriate controller). It achieves smooth Z-axis motion without friction or backlash through a piezo actuator and flexure guide mechanism. It is suitable for focus adjustment and Z-scan applications at the nanoscale in microscopy systems. 【Application Scenarios】 - Z-scanning in confocal microscopy - Focus position control in multiphoton microscopy - Height adjustment in semiconductor wafer inspection - Precise focus control during the observation of nanostructures 【Benefits of Implementation】 - Sub-nanometer resolution focus position control - High reproducibility motion without backlash - Wide Z travel range of up to 800 µm (depending on the model) - Flexure guide structure with no wear parts

In the semiconductor manufacturing field, extremely high precision and stability are required for the positioning of wafers and masks. With the advancement of miniaturization, we have entered an era where nanometer-level positioning errors directly affect device performance and yield. Particularly in exposure and inspection equipment, precise control that combines reproducibility and stability is essential. The P-733.2 achieves high-precision XY nanopositioning with a reproducibility of ±1nm. With a 100µm stroke and a high-rigidity parallel kinematics structure, it is also suitable for integration into semiconductor manufacturing equipment. High-precision positioning contributes to process stabilization and yield improvement. 【Application Scenarios】 - Exposure equipment - Mask/Wafer positioning - Inspection and measurement equipment 【Benefits of Implementation】 - Process stabilization with reproducibility of ±1nm - Yield improvement through high-precision positioning - Maximization of equipment performance through stable operation

Precise optical axis adjustment and positioning in the field of optics are crucial elements for maximizing system performance. Especially in high-resolution microscopes and precision measurement devices, even slight positional deviations can significantly impact measurement accuracy and reproducibility. The P-733.2, which employs a high-precision parallel kinematics structure, achieves nano-level positioning with a reproducibility of ±1nm and accommodates transmission light applications with a stroke of 100µm on the XY axis. It contributes to the high precision of optical systems and the efficiency of adjustment tasks, from research and development to device integration. 【Application Scenarios】 - High-precision microscopes - Mask/wafer positioning - Interferometers and optical measurement devices 【Benefits of Implementation】 - High-precision positioning with ±1nm reproducibility - Smooth integration into transmission light optical systems - Reduced optical axis adjustment time and improved development efficiency

In the field of optical measurement, the focus accuracy and stability of the detection position are directly linked to the precision of the results in optical imaging and precise measurement. Applications that require evaluation of fine structures or high-speed data acquisition demand high-resolution focus control and responsive operational performance. The P-725.xCDE2 PIFOC focus scanner achieves sub-nanometer resolution position control with a maximum stroke of 800 µm. Equipped with PICMA piezo actuators and high-precision capacitive sensors in a flexure guide mechanism, it provides high linearity and reproducibility in Z-direction focus adjustment for optical measurement devices. This helps to minimize the impact of focus position shifts in optical measurements, contributing to improved measurement accuracy and device yield. 【Use Cases】 - High-precision measurements with confocal microscopy - High-speed Z-scanning in multiphoton microscopy - High-resolution imaging evaluation devices - Optical interferometers and phase measurement devices 【Benefits of Implementation】 - Sub-nanometer resolution focus control - Wide measurement range with a maximum stroke of 800 µm - Reduced inspection and measurement time due to high-speed response - Long-term stability through PIFOC/flexure structure

In semiconductor inspection equipment, high-resolution Z-axis position control and rapid step motion are required for detecting fine defects and evaluating 3D focus. The P-725.xCDE2 PIFOC focus scanner is a high-precision actuator that achieves sub-nanometer resolution with a maximum focus range of 800 µm. By combining the PICMA piezo actuator with a flexure guide mechanism that incorporates capacitive sensors, high linearity, reproducibility, and stability are realized. This enables high-precision control of Z focus and high-speed scanning in semiconductor inspection, contributing to improved accuracy in the inspection process and enhanced throughput of the equipment. [Application Scenarios] - Z focus control for wafer surface defect inspection - High-resolution imaging in chip and package inspection - High-speed Z scanning in optical and laser-based inspection equipment - Defect analysis using optical inspection and confocal optical microscopy [Benefits of Implementation] - Improved measurement accuracy through high-precision focus control - Enhanced inspection throughput due to rapid Z step motion - Increased reliability of the equipment with stable long-term operation

In the field of photonics, the angle control and position stability of laser beams greatly influence coupling efficiency and system performance. Particularly in fiber coupling, beam steering, and high-speed correction control, high responsiveness, resolution, and excellent dynamic characteristics are essential. The S-331 is a high-speed Tip/Tilt piezo stage boasting a maximum resonance frequency of 10 kHz. It achieves both high resolution and fast response, enabling real-time beam correction and precise angle control. It contributes to improved focusing efficiency and stable operation in photonics systems. 【Application Scenarios】 - Laser beam steering - High-efficiency coupling to optical fibers - High-speed beam correction control - Optical alignment/stabilization applications 【Benefits of Implementation】 - High-speed and high-precision beam angle control - Improved coupling efficiency and reduced losses - Stabilization through real-time correction - Maximization of photonics device performance

In the field of microscopy, precise scanning of samples is required. Especially in high-magnification observations and analysis of fine structures, accurate positioning is essential. Misalignment can lead to degradation of the observed image and a decrease in measurement accuracy. The PIHera P-620.1/629.1 series addresses these challenges with 0.1 nm resolution and high-precision positioning. 【Application Scenes】 - Scanning of microscope samples - Optical alignment - Interferometric measurements 【Benefits of Implementation】 - High-precision observation and measurement - Accurate analysis of fine structures - Improved experimental efficiency You can check the detailed product specifications in the catalog. If you have any questions, please feel free to contact us.

In optical field adjustment work, precise positioning of the optical axis is a crucial factor that influences the performance of the system. Particularly in fiber alignment and the arrangement of optical elements, accurate adjustments at the sub-micron level are required. Conventional stages often have limited degrees of freedom for adjustment, making high-precision positioning difficult. The NanoCube 6-axis piezo system P-616.65S addresses these challenges with its six degrees of nano control. 【Application Scenarios】 - Fiber alignment - Position adjustment of optical elements - Precision instruments such as microscopes 【Benefits of Implementation】 - Enables fine positioning at the nanometer level - Achieves stable adjustments with high rigidity and low crosstalk - Reduces maintenance costs through long-term stable operation

In the field of biotechnology, particularly in cell manipulation and live cell observation, even slight positional shifts of samples can significantly impact the results. To achieve smooth and high-precision positioning while minimizing damage to cells, sub-nanometer resolution and high reproducibility are essential. This product offers high resolution below 1nm and bidirectional reproducibility of ±0.2nm, ensuring high reliability and efficiency in cell manipulation. 【Application Scenarios】 - Biosensor evaluation - Integration into microfluidic devices 【Benefits of Implementation】 - Improved reproducibility of experiments - Enhanced research efficiency - For detailed product specifications, please refer to the catalog.

In the field of microscopy, it is essential to scan the observation target with high precision to obtain clear images. Particularly in the observation of fine structures and biological samples such as cells, the accuracy of positioning significantly influences the observation results. Low positioning accuracy can lead to a lack of focus, making accurate observation difficult. A compact XY-axis piezo stage achieves high-precision scanning with a resolution of less than 1nm and bidirectional reproducibility of ±0.2nm. 【Application Scenarios】 - Scanning samples in microscopic observation - Fine adjustments during high magnification observation - Cell imaging 【Benefits of Implementation】 - Clear image acquisition through high-precision positioning - Reduction of observation time - Improvement of experimental reproducibility