アリオス List of Products and Services

The "SS-DC・RF301" is a compact sputtering device equipped with one 2" magnetron cathode and a substrate heating mechanism. Thanks to its simple design, it can be installed in about half the space of an office desk. It employs a substrate up-and-down mechanism, allowing for adjustable distance between the target and the substrate. In addition to being able to heat the substrate at high temperatures, it can also operate using only electricity and gas, and allows for reconfiguration between sputter-up and sputter-down. 【Features】 ■ Space-saving with a simple design ■ Adjustable distance between the target and the substrate ■ Capable of high-temperature substrate heating ■ Standard equipped with a chiller *For more details, please refer to the catalog. Feel free to contact us with any inquiries.

• Sputtering Equipment

It has been simplified by limiting it for process use and making it manual. The bending type has a structure that allows the tip to be bent arbitrarily by joints, enabling measurements in directions other than the straight direction of the flange. The joint cannot be operated from outside the vacuum, but the entire probe section can rotate, allowing for circular movements. Combined with linear movement, it enables measurements over a wide range. Both move in a straight line within the specified stroke range, measuring each point of interest one by one.

• Other energy equipment
• Other safety equipment

The plasma chamber is made of quartz, and it enables a process with minimal metal contamination due to the use of non-electrode discharge. It can operate stably for long periods even during the introduction of active gases, and it can produce clean atomic and radical beams.

• Other energy equipment
• Other safety equipment

The discharge section and the extraction section are made of high-purity PBN, allowing for long-term stable operation even during the introduction of reactive gases, and enabling the generation of a clean atomic and radical beam. It has particularly proven effective as a nitrogen radical source, with a wealth of experience.

• Other energy equipment
• Other safety equipment

In addition to standard products, we design and manufacture according to customer specifications by utilizing our extensive experience and CAD. To date, we have a wealth of delivery records ranging from standard products to special specification cells and alternatives for various MBE devices, covering everything from research and development to large-scale production equipment.

• Other energy equipment
• Other safety equipment

In addition to standard products, we design and manufacture according to customer specifications by utilizing our extensive experience and CAD. To date, we have a wealth of delivery records, including standard products, special specification cells, and alternatives for various MBE devices, ranging from research and development to large-scale production equipment.

• Other energy equipment
• Other safety equipment

We consistently manufacture everything in-house, from major components such as molecular beam cells, RHEED, BFM, and substrate heating mechanisms to control units like chambers, shrouds, process controllers, and shutter controllers.

• Other energy equipment
• Other safety equipment

Installation of various components Hollow Z-stage with direct movement adjustment from the atmospheric side 【Features】 ○ Bakeable due to all-metal seals ○ Compatible with various ultra-high vacuum devices such as MBE systems due to Conflat flange specifications ○ Supports φ34CF to φ114CF ○ Facilitates easy movement into the vacuum by combining with various sensors and deposition sources ● For other functions and details, please download the catalog.

• Other FA equipment

A super compact rotary feedthrough that can be used for continuous high-speed rotation, utilizing a powerful rare earth magnet-based magnetic coupling structure. 【Features】 ○ Can be used semi-permanently by simply replacing the bearings ○ Compact design allows for flexible installation locations Many common parts are used for a low-cost design ○ Long lifespan due to magnetic coupling structure ○ High-temperature baking compatible up to 200°C (150°C for NW flange type) ○ Abundant torque selection based on application ○ Various options available (high-temperature type up to 260°C, pneumatic drive, motor drive, etc.) ○ Custom special shaft shapes can also be manufactured ● For other functions and details, please download the catalog.

• Other machine elements

Film deposition processes such as evaporation, sputtering, MBE, and CVD Prevent film deposition and damage to the viewport, which can be problematic in processes involving organic gases. 【Features】 ○ Usable with various ultra-high vacuum devices such as MBE equipment due to the conflat flange specification. ○ The rotary feedthrough uses the RFT series, which supports 200°C baking, allowing for high-temperature baking. ○ Compatible with φ70CF to φ203CF. ○ Can close with almost no gaps, effective for samples with high vapor pressure. ○ Optional shield glass and RHEED screen can be installed. ○ The opening and closing direction can be changed easily with simple reconfiguration. ○ Custom-sized flanges can also be manufactured. ● For other functions and details, please download the catalog.

• Other machine elements

Load lock door used to introduce samples, etc., into a vacuum system 【Features】 ○ Compact and lightweight design allows for flexible installation ○ High vacuum compatibility with fluororubber seals ○ Capable of baking up to 150°C ○ Can be directly attached to CF flanges from φ114 to φ305 ○ Available in various sizes with and without windows; window materials such as quartz glass can be selected as options ○ Custom manufacturing of JIS flanges and special flange shapes is also possible ● For other functions and details, please download the catalog.

• Other machine elements

A hollow XYZ stage optimized for positioning adjustments of heating mechanisms, various introduction devices, and other components, enabled by a 3-axis movement mechanism. 【Features】 ○ Bakeable due to all-metal seals ○ Usable with various ultra-high vacuum devices such as MBE systems, thanks to the conflat flange specification ○ Compatible with φ70CF to φ203CF ○ X-Y movement possible with two adjustment knobs, allowing for precise movement using cross roller bearings ○ Enables multi-axis motion transmission into a vacuum when combined with transfer rods, rotary introduction devices, linear introduction devices, etc. ● For other functions and details, please download the catalog.

• Other FA equipment

Transfer rod that can introduce rotational and linear motion into a vacuum with high torque due to a powerful magnetic circuit. 【Features】 ○ Bakeable with all-metal seals ○ Usable with various ultra-high vacuum devices such as MBE systems due to CF specifications ○ Installation is φ70 CF specification ○ High torque achieved through magnetic coupling of a powerful magnetic circuit ○ Enables 4-axis motion transmission into a vacuum when combined with XY mechanisms and others ● For other functions and details, please download the catalog.

• Vacuum Equipment

Quartz discharge tube type with external chamber magnetic field microwave-excited radical source 【Features】 ○ The plasma chamber is made of quartz glass, allowing visual confirmation of discharge. ○ Can be used with various ultra-high vacuum devices such as MBE systems due to its completely metal-sealed structure. ○ Ion acceleration is possible by using a high-voltage power supply for acceleration (optional) in addition to radical source applications. ○ Capable of introducing various active gases. ○ Microwaves are supplied via a coaxial cable, eliminating the need for cumbersome waveguide connections. ● For other functions and details, please download the catalog.

• Etching Equipment
• Other semiconductor manufacturing equipment

An atmospheric pressure plasma experimental device that allows for experiments with atmospheric pressure plasma simply by connecting the power supply and the gas to be plasma-activated. 【Features】 ○ Reliable ignition achieved by equipping a powerful ignition device and an electron source. ○ High maintenance efficiency due to a simple structure. ○ High plasma ignition capability provided by the ignition device. ● For other functions and details, please download the catalog.

• Other physicochemical equipment

Quartz discharge tube type with chamber protrusion type magnetic field microwave excited ion and radical source 【Features】 ○ The plasma chamber is made of quartz, allowing for the generation of ions and radicals with minimal metal contamination. ○ Due to the special antenna structure and magnetic circuit, there is little leakage magnetic field. ○ With a completely metal-sealed structure, it can be used in various ultra-high vacuum devices such as MBE systems. ○ Easy to install air-cooled type. ○ By using a high-voltage power supply for acceleration (optional), ion acceleration is possible. It can also be used as a radical source. ○ Microwaves are supplied via coaxial cable, eliminating the need for cumbersome waveguide connections. ● For other functions and details, please download the catalog.

• Etching Equipment
• Other semiconductor manufacturing equipment

Microwave Excitation Ion Source with Magnetic Field, External Chamber Type, Lamic Discharge Tube Type 【Features】 ○ Ion beams with low metal contamination can be obtained due to ultra-high vacuum specifications. ○ The plasma chamber is made of high-purity alumina, allowing for ion beams with low metal contamination. ○ Can be used with various ultra-high vacuum devices, such as MBE systems, due to a completely metal-sealed structure. ○ Ion acceleration is possible with the use of a high-voltage power supply (optional) (can also be used as a radical source or plasma source). ○ Microwave is supplied via a coaxial cable, eliminating the need for cumbersome waveguide connections. ○ External control via sequencer or computer is possible. ● For other functions and details, please download the catalog.

• Etching Equipment
• Other semiconductor manufacturing equipment

Introducing the plasma experimental equipment using microwaves handled by Arios Corporation. Arios Corporation, which designs all components such as plasma sources and microwave power supplies in-house, offers flexible designs that only we can provide. We will design and manufacture according to the specifications required by our customers. 【Features】 ○ Microwave experimental equipment capable of various plasma exposure experiments, including DLC films, carbon nanotubes, plasma sterilization, and vacuum ultraviolet irradiation, can be produced in a wide variety. ○ The substrate movement mechanism allows for arbitrary positioning of the substrate and plasma, enabling compatibility with various processes. ○ By inserting the substrate into the plasma, it is heated by the plasma, eliminating the need for a heater during diamond thin film production. ○ The exhaust system can accommodate rotary pumps and mechanical boosters, and can even support ultra-high vacuum conditions. ● For other functions and details, please download the catalog.

• Testing Equipment and Devices

An RF plasma source that enables a process with minimal metal contamination due to non-electrode discharge. 【Features】 ○ Discharge can be visually confirmed thanks to the optical window. ○ High-precision plasma spectroscopy and other applications are possible with the quartz window. ○ The automatic matching mechanism allows for easy operation and stable long-term performance. ○ It is air-cooled, eliminating concerns about cooling water, and can be easily installed on existing equipment. ○ Stable operation for extended periods is achievable even when introducing active gases, allowing for the generation of clean atomic and radical beams. ● For other functions and details, please download the catalog.

• Other semiconductor manufacturing equipment

A super compact microwave-excited plasma source developed for installation and use in the middle of gas lines and exhaust lines. 【Features】 ○ The plasma chamber is made of high-purity alumina, allowing for visual observation of the discharge. ○ Electrode-less discharge. Achieves high-density plasma through a new microwave supply method. ○ Extremely safe against microwave leakage due to a completely shielded structure. ○ Fully air-cooled, eliminating the need for cooling water. ○ Capable of using various active gases. ○ Microwaves are supplied via a coaxial cable, eliminating the need for cumbersome waveguide connections. ○ Equipped with an igniter for easier discharge. ○ The weight of the plasma source itself is a lightweight design of only 1.9 kg. ● For other functions and details, please download the catalog.

• Etching Equipment
• Other semiconductor manufacturing equipment

Plasma CVD equipment for conducting high-purity diamond synthesis experiments capable of single crystal diamond growth (homoepitaxial). 【Features】 ○ Compact and energy-efficient ○ Utilizes ultra-high vacuum technology, ensuring that the plasma does not contact the chamber walls, allowing for single crystal high-purity diamond synthesis experiments suitable for device fabrication ○ Spherical compact chamber and special electrodes enable high-efficiency operation ○ Experiments can be conducted while observing the discharge state ○ Sample introduction can be developed into a load-lock system ○ Complete shielding structure ensures excellent microwave leakage prevention ○ Operates solely on power and gas supply due to all air-cooled specifications ● For other functions and details, please download the catalog.

• CVD Equipment

This is an introduction to the plasma experimental equipment using an RF 13.56MHz excitation plasma source handled by Arios Corporation. A flexible design that only Arios Corporation, which designs its own plasma sources, can provide. We will design and manufacture according to the specifications required by our customers. 【Features】 - Easy operation with automatic matching - Compact chamber and simple structure for easy maintenance - Equipped with interlocks for high voltage electric shock prevention against PF - Mechanisms that safely stop in case of high-frequency leakage or power outages - Option to add a load lock mechanism ● For other functions and details, please download the catalog.

• Testing Equipment and Devices

Discharge and extraction sections are made of high-purity PBN, allowing for long-term stable operation even during the introduction of active gases, and enabling the generation of a clean atomic and radical beam, making it a radical beam source. 【Features】 ○ Forms chemically active radicals through ICP-type RF discharge and extracts flux via differential pressure. ○ Standard equipment includes a viewport for visual confirmation of discharge, allowing verification of discharge and excitation states using a light emission monitor or spectrometer. ○ Compatible with various ultra-high vacuum devices such as MBE systems due to complete metal sealing and 200°C bakeable capability. ○ Designed with the premise of attaching a molecular beam cell port, making it possible to expand conventional MBE systems. ● For other functions and details, please contact us.

• Other semiconductor manufacturing equipment

A simplified XY mechanism combined with an optimal tilt adjustment mechanism for positioning transfer rods. 【Features】 ○ Bakeable due to all-metal seals ○ Usable with various ultra-high vacuum devices such as MBE systems due to the conflat flange specification ○ Compatible with φ70CF to φ203CF ○ Tilt adjustment possible by adjusting four rods ○ By combining with transfer rods, rotary introducers, and linear introducers, multi-axis motion transmission into the vacuum can be achieved economically ● For other functions and details, please download the catalog.

• Other FA equipment

Transfer rod capable of chucking operations using a 2-axis structure magnetic coupling 【Features】 ○ High torque rotation and linear motion can be introduced into a vacuum due to a powerful magnetic circuit ○ Bakeable with an all-metal seal ○ Usable with various ultra-high vacuum devices such as MBE systems due to CF specifications ○ Installation is φ70 CF specification ○ High torque achieved through optimal magnetic circuit design ● For other functions and details, please download the catalog.

• Vacuum Equipment