List of Semiconductor Manufacturing Equipment products
- classification：Semiconductor Manufacturing Equipment
1696～1710 item / All 5074 items
For those who have isolators. Achieving high chemical resistance and workability. Low cost and short delivery times are also possible for glove box and isolator gloves.
- Work gloves
Notice of participation in 'INTERPHEX Week Tokyo' from May 20 (Wednesday) to May 22 (Friday), 2026.
Ito Corporation will be exhibiting at "INTERPHEX Week Tokyo" held at Makuhari Messe. This exhibition is the largest in Japan, showcasing a wide range of products and services related to the research and manufacturing of pharmaceuticals, cosmetics, and regenerative medicine from 25 countries and regions around the world. Pharmaceutical and cosmetic manufacturers, as well as regenerative medicine companies, will be attending from all over the globe. We will be showcasing "Gloves for Glove Boxes/Isolators" manufactured by Tron Power. We look forward to your visit.
We propose fine processing technology for next-generation package substrates using KrF excimer lasers!
- Other semiconductor manufacturing equipment
Metal, dielectric, and organic film deposition! Introducing the thermal evaporation device.
- Evaporation Equipment
The maximum film-forming temperature is 800°C! It can accommodate up to 4x DLI evaporators with the chamber heating mechanism.
- CVD Equipment
Due to lamp heating, RTP and RTCVD processing is possible! Quartz tube-type chamber.
- Annealing furnace
Turbo pump compatible! Low temperature (1100°C) / high temperature (1300°C) pyrometer.
- Annealing furnace
Supports a maximum substrate size of 156mm x 156mm! Compatible with vacuum or atmospheric transport systems and can be equipped with a load lock.
- Annealing furnace
Rapid cooling mechanism after annealing! Introducing the high-speed heat treatment equipment from Annealsys.
- Annealing furnace
Compatible with SI 500-1M, SI 500 PPD-1M, etc.! The transport chamber is available in three types.
- CVD Equipment
Control of ion density by ICP power! Achieving low-temperature film formation, low damage, and high conformality.
- CVD Equipment
High-selectivity etching! Optimization of radical supply by adjusting the spacing between the ICP source and the substrate electrode.
- Other semiconductor manufacturing equipment
Top-class throughput! Flexible modular design.
- Other semiconductor manufacturing equipment
Many safety measures specifications necessary for mass production! Compact device size with a film formation temperature of 50 to 285°C.
- Other semiconductor manufacturing equipment
500℃ wafer stage! Adoption of a remote ICP source with no plasma damage.
- Other semiconductor manufacturing equipment
For research and development, for small-scale batches! Standard equipped with a simple decontamination unit ALD Shield Vapor Trap.
- Other semiconductor manufacturing equipment
Substrate bias mechanism! Introducing our microwave PECVD/etching equipment.
- Etching Equipment