List of Semiconductor Manufacturing Equipment products

  • classification:Semiconductor Manufacturing Equipment

1396~1440 item / All 5093 items

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You can monitor the COF (friction coefficient), pad surface temperature, polishing liquid temperature, and room temperature inside the device.

  • CMP Equipment

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This one machine handles everything from wrapping (rough polishing) to polishing, and is capable of precision polishing of compound semiconductors such as GaAs and InP.

  • CMP Equipment

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We support hole pitches within 20 microns, and the material is AC4A! Here are examples of processing for electronic circuit manufacturing equipment.

  • Other semiconductor manufacturing equipment

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Processing with the newly introduced large 5-axis machining center! Here we present examples of processing for semiconductor manufacturing equipment.

  • Other semiconductor manufacturing equipment

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Stabilizing quality by improving jigs! Introducing processing examples of electronic circuit board manufacturing equipment.

  • Other semiconductor manufacturing equipment

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The size is 1060×1030×700, and the material is SS400! Here is an example of processing for electronic circuit manufacturing equipment.

  • Other semiconductor manufacturing equipment

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Reduce friction by smoothing the surface! We also have an in-house designed paper wrapping machine.

  • Wafer processing/polishing equipment
  • Hand polishing and filing
  • Other abrasives

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φ450 (18 inches) jig, equivalent specific gravity and Young's modulus to Si wafers! Low price!

  • Fine Ceramics
  • Other semiconductor manufacturing equipment

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You are using SiC/Si composite materials as the target material.

  • Sputtering Equipment
  • Other metal materials
  • Fine Ceramics

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We provide high-precision SiC ceramic products with a maximum size of 800 x 40t. We will introduce the benefits of adoption through proven results, such as improved device performance and resolution o...

  • Fine Ceramics
  • Other machine elements
  • Other semiconductor manufacturing equipment

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The performance of the device is improved by lightweight, high-rigidity metal-ceramic composite materials.

  • Mounter
  • Other semiconductor manufacturing equipment
  • Other industrial robots

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Customization according to experimental purposes is possible. Small RF sputtering device.

  • Coater

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Oxidation diffusion, injection devices, etching, etc.! Introducing the installation of manufacturing equipment carried out by our company.

  • Other semiconductor manufacturing equipment

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Magnetrons, ion beams, and more! You can choose from a variety of thin film deposition solutions.

  • Other semiconductor manufacturing equipment

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Electron beam lithography equipment, EUV exposure equipment, nanoimprint lithography applications. Two types available: powder and solution!

  • Resist Device

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We will be exhibiting at the "Light and Laser Science and Technology Fair 2023."

Optronics Corporation will exhibit at the "Light and Laser Science and Technology Fair 2023." 【Event Overview】 Date: November 7 (Tuesday) to November 9 (Thursday), 2023 Venue: Pacifico Yokohama (Exhibition Hall C) Booth Location: S-10 Main Exhibits: Laser power meters, compact spectrometers, integrating spheres, quantum dots, light distribution devices, high-power LEDs, resist For more details, please refer to the following link. https://www.optronics.co.jp/fair/

Video of fiber laser welding by a robotic welder.

  • Other machine elements
  • Other semiconductor manufacturing equipment
  • Vacuum Equipment

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Remote source ion beam sputtering device manufacturer for remote plasma sources.

  • 20170928_160044.jpg
  • Sputtering Equipment

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Information on commissioned test film formation services (test film formation of high-quality reaction films, etc.)

Research on Co-sputtering of different materials, such as ferromagnetic targets and metal and ceramic targets, which are considered difficult to film using conventional sputtering devices. We strongly support advanced material research and process development, including the deposition of AlScN, which is attracting attention for next-generation MEMS applications. This is a groundbreaking technology that uses a helicon ion source as a plasma source, accelerating high-density ions obtained from it by applying a bias voltage to the target. Since it is an ion beam-type deposition method using a remote plasma system, stable film formation can be achieved even with ferromagnetic and dielectric targets, which are challenging for magnetron sputtering devices. By individually controlling the ion source and target application, it is possible to accommodate a wide range of deposition conditions while also achieving high deposition rates. Independent gas supply near the target and substrate allows for the deposition of various multilayer thin films, including oxide and nitride films. Since the substrate surface is not exposed to plasma, it is possible to maintain a low temperature during film formation.

This is a lineup of devices incorporating Rise One's precision transfer technology.

  • Other semiconductor manufacturing equipment

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This is a high-viscosity dedicated spin coater that uniformly applies high-viscosity polyimide with a viscosity of around 10,000 cP. It also achieves material savings with a rotating cup-type chuck!

  • Coater

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From silicon to compound semiconductors, from manual machines to mass production machines! Here is an introduction to our products!

  • Resist Device

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This is a coater with minimal in-plane uniformity of the resist film and small differences in average film thickness between wafers. It supports low to high viscosity resist (up to 10,000 cP)!

  • Coater

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Supports low to high viscosity resist! Can produce semi-automatic machines for any wafer size!

  • Coater

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Research and development, manual equipment for small lot production! Equipped with a resist coating mechanism equivalent to that of automatic machines, unlike tabletop types!

  • Coater

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After spin coating BARC and other chemical solutions, it can be baked at a maximum of 400°C! Automatic resist coating device with high-temperature baking capability.

  • Coater

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Compatible with 10,000 cP polyimide and resist! ASAP is a manufacturer specialized in high-viscosity resist and chemicals.

  • Coater

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We have a proven track record with a variety of chemical solutions! The reason for our low prices is that we handle everything in-house, from design to sales.

  • Coater

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We are confident in applying high-viscosity photoresist! For 10,000 cP polyimide, the standard uniformity within the plane is within ±5%, with a proven record of within ±3%.

  • Coater

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Effective in reducing polyimide and expensive high-viscosity resists! It is a rotary cup-type spin coater.

  • Coater

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We have extensive experience (know-how) in the transport and coating of fragile and thin wafers such as GaAs, LT, and glass!

  • Coater

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We can create a device that accommodates both the current wafer size and the wafer size you wish to use in the future (e.g., 2-4 inches, 6-8 inches, etc.).

  • Coater

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Proven results with a variety of chemical solutions! The reason for our low prices is that we handle everything in-house, from design to sales.

  • Resist Device

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High-throughput roll-to-roll sputtering equipment for the manufacture of FCCL (Flexible Copper Clad Laminate).

  • Sputtering Equipment

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FHR Star.100-Tetra Co is a very compact sputtering device designed for MEMS and high-performance optical products.

  • Sputtering Equipment

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Production ion beam milling equipment that achieves high rate and high reliability.

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  • Sputtering Equipment

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In response to requests from many customers, we have handled a quantity of up to 2,300 pieces.

  • Photomask

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CST Corporation is a mask blanks manufacturer.

  • Photomask

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The "FHR.Star.600-EOSS" is a high-performance magnetron sputtering device developed for precise optical filter film deposition.

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  • FHR.Star.500-EOSS.jpeg
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  • Sputtering Equipment

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Highly acclaimed high-precision optical filter deposition magnetron sputtering device

This is a device specialized in optical thin films, such as high-performance optical filters that require multilayering and high reproducibility, particularly for applications like LiDAR, which are expected to see significant demand in the future. It demonstrates strong capabilities for high-quality and stable production. - Film formation that eliminates the influence of film quality changes due to target consumption using a cylindrical cathode. - Stable film formation of oxide films achieved by incorporating a reactive ion source. - Film formation of a wide range of multilayer films enabled by the installation of up to four cathodes.

PHT will operate globally as a niche top company in the semiconductor industry, specializing in wafer automatic peeling devices (peeling and cleaning machines).

  • Wafer processing/polishing equipment

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Filter