List of Sputtering Equipment products
- classification：Sputtering Equipment
91～135 item / All 212 items
Various antibacterial/antiviral treatments, anti-mold, etc.! Sputtering processing on fibers and films.
- Sputtering Equipment
Rich experience in processing various materials and substrates! Substrate × thin film = optical adjustment, conductivity, antibacterial/antiviral.
- Sputtering Equipment
Multi-purpose vacuum deposition device HEX system RF & DC sputtering source
- Sputtering Equipment
Modular Structure Vacuum Device - Multi-Purpose Vacuum Deposition Device HEX Series - High Expandability & High Maintainability
The 'True Modular Structure' changes the common understanding of vacuum devices. A compact vacuum device with a minimum installation area of 60cm square, which can be introduced with a minimal configuration and allows for flexible changes in structure according to shifts in research direction. Traditionally, vacuum devices had a fixed number and arrangement of ports upon installation, making changes impractical. However, the HEX system, featuring a hexagonal prism-shaped chamber, adopts a groundbreaking 'modular structure' that allows for the number and arrangement of ports to be freely changed by swapping out the panels that make up each side. This enables easy configuration changes and functional expansions, akin to assembling blocks, in response to changes in research direction. ◆ The 'Modular Structure' allows for flexible changes to the system configuration ◆ Supports sputtering, resistance heating deposition, electron beam deposition, and organic deposition ◆ Capable of simultaneous film deposition from multiple sources ◆ Supports sample rotation, heating, and water cooling ◆ Can be equipped with a film thickness monitor ◆ Compact design with a footprint of 60cm x 60cm ◆ Excellent expandability and maintainability ◆ Compatible with glove boxes *Please feel free to contact us for more details.
Resistance heating evaporation source for the multi-purpose vacuum deposition device HEX system.
- Sputtering Equipment
Modular Structure Vacuum Device - Multi-Purpose Vacuum Deposition Device HEX Series - High Expandability & High Maintainability
The 'True Modular Structure' changes the common understanding of vacuum devices. A compact vacuum device with a minimum installation area of 60cm square, which can be introduced with a minimal configuration and allows for flexible changes in structure according to shifts in research direction. Traditionally, vacuum devices had a fixed number and arrangement of ports upon installation, making changes impractical. However, the HEX system, featuring a hexagonal prism-shaped chamber, adopts a groundbreaking 'modular structure' that allows for the number and arrangement of ports to be freely changed by swapping out the panels that make up each side. This enables easy configuration changes and functional expansions, akin to assembling blocks, in response to changes in research direction. ◆ The 'Modular Structure' allows for flexible changes to the system configuration ◆ Supports sputtering, resistance heating deposition, electron beam deposition, and organic deposition ◆ Capable of simultaneous film deposition from multiple sources ◆ Supports sample rotation, heating, and water cooling ◆ Can be equipped with a film thickness monitor ◆ Compact design with a footprint of 60cm x 60cm ◆ Excellent expandability and maintainability ◆ Compatible with glove boxes *Please feel free to contact us for more details.
Multi-purpose vacuum deposition device for HEX system with 1-source and 4-source electron beam deposition sources.
- Sputtering Equipment
Modular Structure Vacuum Device - Multi-Purpose Vacuum Deposition Device HEX Series - High Expandability & High Maintainability
The 'True Modular Structure' changes the common understanding of vacuum devices. A compact vacuum device with a minimum installation area of 60cm square, which can be introduced with a minimal configuration and allows for flexible changes in structure according to shifts in research direction. Traditionally, vacuum devices had a fixed number and arrangement of ports upon installation, making changes impractical. However, the HEX system, featuring a hexagonal prism-shaped chamber, adopts a groundbreaking 'modular structure' that allows for the number and arrangement of ports to be freely changed by swapping out the panels that make up each side. This enables easy configuration changes and functional expansions, akin to assembling blocks, in response to changes in research direction. ◆ The 'Modular Structure' allows for flexible changes to the system configuration ◆ Supports sputtering, resistance heating deposition, electron beam deposition, and organic deposition ◆ Capable of simultaneous film deposition from multiple sources ◆ Supports sample rotation, heating, and water cooling ◆ Can be equipped with a film thickness monitor ◆ Compact design with a footprint of 60cm x 60cm ◆ Excellent expandability and maintainability ◆ Compatible with glove boxes *Please feel free to contact us for more details.
Easy discharge operation! Compact design with automatic matching for RF power supply.
- Sputtering Equipment
Reduce initial implementation costs and enable high performance through expansion! Upgrade according to the research stage.
- Sputtering Equipment
High-precision alignment (within 1μm of the target) is now possible in all directions of X-Y-Z-θx-θy-θz.
- Sputtering Equipment
- Semiconductor inspection/test equipment
- Photomask
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The electron backscatter diffraction method (EBSD) is useful for evaluating the performance of aluminum sputter films and selecting substrate materials.
- Other metal materials
- Sputtering Equipment
- Ceramics
Supports work widths of 255, 350, 450, 550, 600, and 750 mm!
- Sputtering Equipment
- Food Packaging Machinery
- Beverage Production Equipment
Ideal for use in clean rooms! It is a fully automatic system for cleaning rolls.
- Sputtering Equipment
- Bag making machine/slitter
- Special labels, etc.
The ULT roll-to-roll web cleaner device stably removes dust even at a converting production line speed of 300m/min.
- Sputtering Equipment
- Bag making machine/slitter
- Food Packaging Machinery
Equipped with a heater stage (1000°C)! Usable for various applications from the development process to mass production.
- Sputtering Equipment
Introducing the ion beam sputtering device equipped with a maximum of 5 targets (220mm diameter) or 4 targets (300mm diameter)!
- Sputtering Equipment
Maximum 200mm diameter substrate! Double ring magnetron (Fraunhofer FEP)
- Sputtering Equipment
EUROVAC's VARIAN type low-cost 3keV ion gun
- Plasma surface treatment equipment
- Vacuum Equipment
- Sputtering Equipment
This device can clean adhesive rolls during maintenance more quickly and efficiently, addressing a challenge that has troubled customers across various industries!
- Sputtering Equipment
This is a sheet-type sputtering device that achieves high-quality radio wave transmission films.
- Sputtering Equipment
It is an optimal post-oxidation sputtering device for multilayer optical thin films.
- Sputtering Equipment
This is a research and development sputtering device suitable for various film deposition applications, featuring high-level specifications and a wide range of options.
- Sputtering Equipment
We will give you a free copy of "Thin Film Q&A," which summarizes the differences and characteristics of various coating methods, coating examples, and frequently asked questions!
- Surface treatment contract service
- Sputtering Equipment
- Ceramics
Leave your analysis requests to us! Free download of the "Analysis Equipment List"!
The evaluation of thin films is determined by the purpose for which the thin film is used. For example, if the thin film is used for enhancing mechanical strength, important factors for evaluation include hardness and adhesion. If the film is intended to impart optical properties, values such as reflectivity and transmittance become important. Toho Kaken has three main divisions: the "Ion Plating Division," the "Material Analysis Division," and the "Environmental Analysis Center," which allows us to possess a wide range of analytical equipment. In addition to requests for thin film coating, we can also handle analysis and evaluation. We also accept inquiries for "inspection and analysis only" apart from thin film coating, so please feel free to contact us!
Free technical data available! Enables precise and hard film formation! Applicable to the production of automotive mirrors and more.
- Sputtering Equipment
We offer assembly services mainly related to the installation, assembly, modification, and maintenance of semiconductor manufacturing equipment.
- Other semiconductor manufacturing equipment
- Contract manufacturing
- Sputtering Equipment
A book that I want to have on hand!
- Technical and Reference Books
- Technical Seminar
- Sputtering Equipment
Equipped with a simple yet φ3-inch target magnetron cathode and a wide-range turbo molecular pump with a capacity of 200 L/s.
- Plasma surface treatment equipment
- Organic EL
- Sputtering Equipment
1-inch UHV-compatible sputter cathode with 2 sources! The load lock chamber can be expanded!
- Sputtering Equipment
A research membrane environment that aims to eliminate oxygen and moisture! Supports multilayer membranes, compound membranes, and reactive membranes!
- Sputtering Equipment
The substrate dimensions can accommodate up to 3 pieces with a maximum size of 3 inches! It is equipped with a heating mechanism and a reverse sputtering mechanism!
- Sputtering Equipment
Transport between chambers is achieved by the transfer rod! Continuous film formation is possible without releasing into the atmosphere!
- Evaporation Equipment
- Sputtering Equipment
Custom production is possible according to application from single item prototypes! Lineup includes "EB Gun" and "K Cell"!
- Sputtering Equipment
- Other machine elements
We will introduce energy semiconductor device research and development systems compatible with φ4-inch substrates!
- Plasma surface treatment equipment
- Sputtering Equipment
- Analytical Equipment and Devices
Metal films and protective films can be deposited automatically on resin substrates!
- Vacuum Equipment
- Sputtering Equipment
Build a reliable system! Leave maintenance and modifications to us.
- Evaporation Equipment
- Sputtering Equipment
- Vacuum Equipment
Components for single crystal growth and CVD that can handle SiC processes above 2000℃. Electrostatic chucks compatible with sputtering and ion implantation at high temperatures.
- Sputtering Equipment
This is a copper plate for low-temperature devices made of C1020, used in low-temperature environments.
- Sputtering Equipment
- Other semiconductor manufacturing equipment
This is an example of a heat sink that has been gold-plated.
- Sputtering Equipment
It is a backing plate used in a film-forming device.
- Sputtering Equipment
- Other semiconductor manufacturing equipment
No need for pre-sputtering aimed at preventing oxidation films, allowing for a reduction in labor! This is a sputtering target that also minimizes cracking due to thermal expansion.
- Sputtering Equipment
