Roll to roll single-sided exposure device
High-precision single-sided exposure equipment for flexible printed circuit boards (FPC).
High resolution can be obtained with a parallel light source.
- Company：ウシオライティング
- Price：Other
Exposure Equipment Product List and Ranking from 32 Manufacturers, Suppliers and Companies
Last Updated： Aggregation Period:Nov 05, 2025～Dec 02, 2025
This ranking is based on the number of page views on our site.
Exposure Equipment Manufacturer, Suppliers and Company Rankings
Last Updated： Aggregation Period:Nov 05, 2025～Dec 02, 2025
This ranking is based on the number of page views on our site.
- 三明 Shizuoka//Industrial Electrical Equipment
- インターテック販売 東京本社（拠点－関西営業所、熊本営業所） Tokyo//Electronic Components and Semiconductors
- null/null
- 4 大日本科研 Kyoto//Optical Instruments
- 5 サーマプレシジョン Tokyo//others
Exposure Equipment Product ranking
Last Updated： Aggregation Period:Nov 05, 2025～Dec 02, 2025
This ranking is based on the number of page views on our site.
- LED light source maskless exposure device DL-1000 series
- i-line stepper exposure device インターテック販売 東京本社（拠点－関西営業所、熊本営業所）
- Semi-automatic exposure device "Semi-automatic Mask Aligner" 三明
- 4 Maskless exposure device "MX Series" 大日本科研
- 5 Automatic double-sided exposure device ラットコーポレーション 本社：営業部・業務部
Exposure Equipment Product List
16～30 item / All 81 items
Displayed results
Roll to roll exposure device with dual-side alignment
High-precision double-sided exposure device for flexible printed circuit boards (FPC)
Achieves high productivity through simultaneous exposure on both sides.
- Company：ウシオライティング
- Price：Other
Single-sheet exposure device
Semi-automatic exposure device with alignment for film that demonstrates its power in FPD manufacturing processes.
Equipped with a 5kW short arc UV lamp.
- Company：ウシオライティング
- Price：Other
Manual exposure device
A highly productive and user-friendly aligner, such as a microscope auto-move.
This is a manual exposure device compatible with 2-inch wafers. It is an exposure device where the operator manually sets the wafer. Using a 4-inch glass mask, the alignment marks of the photomask and the wafer are captured with a microscope, and alignment is performed while viewing the images displayed on the monitor, along with setting the exposure gap, allowing for exposure to take place. Additionally, when the exposure switch is pressed, the microscope automatically retracts, the lamp house moves to the designated position, and the exposure is carried out with the set light intensity, followed by automatic retraction.
- Company：ウシオライティング
- Price：Other
3D shape laser exposure device *under development*
Achieving maskless photolithography for three-dimensional shapes through 5-axis stage control!
The "3D Shape Laser Exposure Device" enables fine patterning on various shapes through a 5-axis stage configuration (3 linear axes and 2 rotational axes). Since it performs direct exposure using a semiconductor laser, there is no need for a metal mask, contributing to reduced research and development time and budget. Additionally, it can read data created in 2D and 3D CAD using dedicated conversion software. 【Features】 ■ 5-axis stage configuration (3 linear axes and 2 rotational axes) ■ Capable of fine patterning on various shapes ■ No need for a metal mask, contributing to reduced research and development time and budget ■ Can read data created in 2D and 3D CAD using dedicated conversion software ■ Easy alignment of three-dimensional structural samples with the alignment assistance mechanism *For more details, please refer to the PDF document or feel free to contact us.
- Company：ネオアーク 東京営業部
- Price：Other
Full panel mass production projection exposure equipment 'CMS-Ck' ★ Demo now available!
Improves resolution and alignment accuracy, compatible with mass production processes. Adopts UV-LED light sources to reduce running costs.
The "CMS (Cerma Micro Stepper) - Ck" is a projection exposure device capable of fine pattern exposure, compatible with full-size substrates of 650×550mm. It uses a UV-LED light source as the standard light source. It is suitable for applications that require high precision, high resolution (L/S) of 2μm, and high productivity, starting with interposers. 【Features】 ■ Supports mass production processes from L/S = 1.4/1.4μm ■ Die-by-die alignment & global alignment methods ■ Capable of chip-first processes ■ Equipped with a tilt mechanism for each shot to improve yield *For more details, please refer to the documentation. Additionally, we have a clean room where our products can be evaluated. If you would like a demo, please feel free to contact us. (We can accommodate surrounding processes including lamination, coating, and development.)
- Company：サーマプレシジョン
- Price：Other
High-performance direct exposure device *for circuit patterns *for solder resist
LED/LD hybrid wave lens: high speed, high production capacity, and high cost performance.
- LD405 + LED385 + LED365 three-wavelength mixing technology - High-output light source + front and rear double-row structure for higher production capacity ◆ Features - High-speed and high production capacity - High-precision alignment - High cost performance - High-output LD equipped (self-manufactured)
- Company：サーマプレシジョン
- Price：Other
Screen printing exposure device
Screen printing exposure device
As a manufacturer of screen printing machines, we have created screen plate production equipment that embodies our commitment and experience in screen plates. The instant-on lamps provide excellent light distribution, and the management of exposure data through an integrated light meter ensures a consistently optimal exposure environment. During the exposure process, the rubber sheet maintains a tight seal, preventing any leakage of ultraviolet light and minimizing the impact on the working environment.
- Company：ミノグループ 本社/機械事業部
- Price：Other
Exposure Device MA300 Gen2
Dual-side mask aligner for 300mm wafers, ideal for re-wiring processing.
In-house developed diffraction light reduction optical system, adopting WEC system.
- Company：ズース・マイクロテック
- Price：Other
Exposure Device MA/BA8 Gen4 Pro
Optimal for small lot production in R&D.
In-house developed diffraction light reduction optical system, adopting WEC system.
- Company：ズース・マイクロテック
- Price：Other
Exposure device MJB4
Ideal for research purposes.
In-house developed diffraction light reduction optical system, adopting WEC system.
- Company：ズース・マイクロテック
- Price：Other
UV LED exposure machine
It is a compact, low-power consumption, long-life ultraviolet LED exposure lamp.
This is essentially an exposure lamp for metal photo that our company sells. Until now, we have been using high-output lamps such as xenon lamps, metal halide lamps, and mercury lamps, but recently we have adopted the trendy LED light and developed our own ultraviolet LED exposure lamp. 【Features】 ■ Comes with a height-adjustable arm and a digital timer ■ The LED part is detachable from the arm and weighs only 220g ■ The vacuum table listed in the catalog is also a product designed by our company ■ Can be used for other applications as long as the wavelength and output match, not limited to metal photo ■ Customizable due to in-house design, allowing for changes in light source or size adjustments
- Company：東光化学工業
- Price：Other
Double-sided simultaneous exposure device for inner layer boards Light HDE110S
The productivity is different from previous exposure devices!
The usual tact time of 12 seconds has been reduced to an incredible 9 seconds! When converted to a minute, this allows for an increase in production of 1 to 2 more units compared to before.
- Company：豊和工業 機械事業部ＣＥ営業グループ電子機械チーム
- Price：Other
Photo Process Analysis Exposure Device ES-3500LP
Equipped with an excimer lamp manufactured by Ushio Electric. A 193nm compatible analytical exposure device.
The photo process analysis exposure device ES-3500LP is equipped with a Ushio Electric Co., Ltd. excimer lamp instead of the laser light source used in the VUVES-4500. It does not require a large gas supply system like a laser light source, allowing for installation in various locations. For more details, please contact us or refer to the catalog.
- Company：リソテックジャパン
- Price：Other
