Exposure equipment for industrial and electronic components
A exposure machine that aligns the glass mask and work, and transfers fine mask patterns.
We have both automatic and manual exposure machines available.
- Company：ウシオライティング
- Price：Other
Exposure Equipment Product List and Ranking from 31 Manufacturers, Suppliers and Companies
Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.
Exposure Equipment Manufacturer, Suppliers and Company Rankings
Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.
- null/null
- サーマプレシジョン Tokyo//others
- ピーエムティー 本社・工場 Fukuoka//Industrial Machinery
- 4 ネオアーク 東京営業部 Tokyo//Industrial Electrical Equipment
- 5 大日本科研 Kyoto//Optical Instruments
Exposure Equipment Product ranking
Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.
- LED light source maskless exposure device DL-1000 series
- Maskless exposure device "ME-120F" ピーエムティー 本社・工場
- High-performance direct exposure device *for circuit patterns *for solder resist サーマプレシジョン
- Maskless exposure device PALET 'DDB-701 Series' ネオアーク 東京営業部
- 4 Manual equal exposure device (manual mask aligner) エイ・エス・エイ・ピイ
Exposure Equipment Product List
61～75 item / All 81 items
Displayed results
Automatic exposure device
A mask aligner that achieves a high throughput of 190 WPH.
This is a fully automatic exposure device compatible with a 2-inch wafer size. By replacing the conventional multi-joint robots used in wafer transport with three self-developed transport robots, we have achieved a high throughput of 190 pieces (2-inch wafers) per hour. In particular, the newly developed alignment image processing employs auto-alignment that performs composite searches with arbitrary coordinate specification and intelligent θ search. Additionally, to ensure stable visibility, the microscope's halogen lighting incorporates a new mechanism that feeds back illumination attenuation through image processing. The operator simply sets the photomask and wafer and selects a pre-stored exposure recipe, allowing for automatic wafer transport, alignment with the photomask, and exposure, enabling stable exposure with precision that does not depend on the operator or experience level.
- Company：ウシオライティング
- Price：Other
Maskless exposure device PALET 'DDB-701 Series'
A maskless exposure device suitable for research and prototyping where trial and error is essential.
The "DDB-701 Series" is a maskless exposure device that allows for photolithography, a representative of MEMS technology, to be performed easily and freely on a desktop. The device size has been thoroughly minimized to achieve an installation area of A3 size. By adopting a floating structure, vibrations are suppressed, eliminating the need for an anti-vibration table and incorporating an air source for vacuum suction, thus removing utilities such as compressed air that can often be obstacles during installation. 【Features】 ■ Desktop type that does not require a specific installation location ■ Low price setting that overturns industry norms ■ Pursuit of user-friendly operability *For more details, please download the PDF or feel free to contact us.
- Company：ネオアーク 東京営業部
- Price：Other
Projection Exposure Device "MRS Series" adopts UV-LED light source.
Wafer size post-process projection exposure equipment MRS adopts UV-LED light source as the standard light source (enabling reduction of running costs without sacrificing productivity!)
■ For 8 inches and below, "single exposure method" is available, while for 12 inches, "step and repeat exposure method" can be selected. ■ Achieves high productivity due to a wide exposure area. ■ Has a deep focal depth, with numerous achievements in the MEMS and RF filter industries. ■ Compatible with TAIKO wafers. ■ Global alignment method. ■ High-precision alignment exposure is achieved with a high-rigidity frame. ■ Focus map mechanism is standard equipment.
- Company：サーマプレシジョン
- Price：Other
Batch exposure machine
Mirror projection mask aligner, a unit that enables double-sided exposure with contact aligners. There is also a proven track record for IR (near-infrared) specifications.
There is a strong demand for mirror projection exposure machines that can perform batch exposure without damaging masks. This machine has contributed to the production of MEMS, such as transistors and power semiconductors, for many years with its compact footprint and low maintenance costs. It continues to tackle challenges related to degradation over time, such as reduced illuminance and deterioration of resolution and uniformity, through unique technologies like mirror regeneration. 【Equipment Modification】 ■ Sale of refurbished used equipment ■ Change of substrate size ■ Chamber refrigerant modification ■ Mirror regeneration 【Parts Sales】 【Pickup Overhaul】 【Regular Maintenance】 【Relocation Services】 ■ In-house relocation ■ Factory relocation 【Troubleshooting】
- Company：インターテック販売 東京本社（拠点－関西営業所、熊本営業所）
- Price：Other
i-line stepper exposure device
We provide service for Canon FPA3000 and Nikon NSR.
The FPA3000 series, which is an i-line stepper, has a proven track record as a standard silicon wafer production machine, and it is highly regarded for its ability to handle the characteristics of compound wafers, such as warping and weight, making it widely supported in that field. Our company is committed to maintaining appropriate inventory levels and has established a demo environment equipped with a developer, microscope, and CDSEM. 【Equipment Modification】 ■ Sale of refurbished used equipment ■ Wafer size change ■ Reticle size change ■ Change of reticle changer type ■ Chamber refrigerant modification 【Parts Sales】 【Parts Repair】 ■ Repair of circuit boards 【Regular Maintenance】 【Relocation Services】 ■ In-house relocation ■ Factory relocation 【Troubleshooting】
- Company：インターテック販売 東京本社（拠点－関西営業所、熊本営業所）
- Price：Other
Vertical double-sided exposure device for outer layer board Light FE205C
The dust prevention measures are different from previous exposure devices!
Our unique system performs exposure with the substrate in an upright position, eliminating yield loss due to debris issues.
- Company：豊和工業 機械事業部ＣＥ営業グループ電子機械チーム
- Price：Other
Photo Process Analysis Exposure Device UVES Series
Up to 25 locations can be exposed with varying exposure conditions using open-frame exposure.
The UVES series photo process analysis exposure device is an exposure tool for research and development of photoresists. By performing step exposure, it allows for open-frame exposure with varying exposure conditions at up to 25 locations. By developing and analyzing the exposed samples using a resist development analyzer, it accelerates the material and process development of photoresists. Furthermore, by using the optional degassing collection unit, it enables component analysis of outgassing from the resist during exposure. For more details, please contact us or refer to the catalog.
- Company：リソテックジャパン
- Price：Other
EUV exposure device for resist analysis EUVES-7000
EQ-10 equipped with EUV light source, extreme ultraviolet light compatible analysis exposure device.
The EUV exposure device EUVES-7000 for resist analysis is equipped with the EQ-10 EUV light source manufactured by Energetiq Technology in the United States, enabling open-frame exposure compatible with extreme ultraviolet light at a wavelength of 13.5 nm.
- Company：リソテックジャパン
- Price：Other
Exposure device, large exposure device
It has excellent exposure stability and reproducibility.
JEM's large exposure device is a state-of-the-art high-performance large exposure system that incorporates an integrated light integrator, ballast mechanism, large dry rotary pump, vacuum regulator, and other components to achieve consistently uniform exposure.
- Company：日本電子精機
- Price：Other
Experimental and research exposure device
It is a compactly designed manual auto-alignment exposure device (mask aligner).
【Main Features】 - A manual batch exposure device ideal for multi-variety, small-lot production and experiments/research. - Equipped with high-precision auto-alignment and backside alignment functions. - Capable of auto-alignment for cracked substrates. - Achieves space-saving by reducing the footprint. - UV-LED light source can be installed. - Recipe management function. - Operator assistance and log storage using a barcode reader.
- Company：大日本科研
- Price：Other
300mm Compatible Exposure Device
Exposure device (mask aligner) compatible with Ø200mm and Ø300mm.
**Main Features** - Equipped with a self-developed mirror optical lamp house, achieving uniformity on the irradiation surface and high brightness. - Adopts a unique coaxial alignment method and high-speed image processing technology, enabling high-precision alignment. Compatible with IR methods and back-side methods. - Utilizes a proprietary optical gap sensor to set the proximity gap between the mask and substrate non-contactly with high speed and precision. - Equipped with a mask changer that can automatically exchange up to 20 photomasks. Up to 3 load ports can be installed.
- Company：大日本科研
- Price：Other
Compact UV Hard Light Device for Experiments and Research "Demo Unit Available"
Selectable irradiation range according to purpose! Versatile wavelength compatibility for experiments and research.
The "UV-1500MT" is a UV exposure device suitable for experiments and research, capable of interchangeable use with a 1500W metal halide lamp and mercury lamp, and compatible with multiple wavelengths. It features a unique optical design that achieves high power and compactness. By using high-stability, long-life, ozone-free lamps, it allows for the selection of irradiation wavelengths according to the application. It is equipped with a variety of functions, including rich remote capabilities for automated lines and comprehensive noise prevention measures. 【Features】 ■ Unique optical design that achieves high power and compactness ■ Use of high-stability, long-life, ozone-free lamps ■ Ability to select irradiation wavelengths according to application ■ Intensity adjustment possible from 70% to 100% ■ Rich remote functions compatible with automated lines ■ Comprehensive noise prevention measures *For more details, please refer to the PDF document or feel free to contact us.
- Company：三永電機製作所
- Price：500,000 yen-1 million yen
Rear Alignment System (IRAS)
Mirror projection mask aligner, a unit that enables double-sided exposure with contact aligners.
The "Backside Alignment System (IRAS)" is a unit that allows for the alignment of the backside of wafers by being mounted on MPA and PLA. It is designed for using MPA and PLA as backside exposure devices. It is suitable for users considering the purchase of a new backside exposure device. Please feel free to contact us if you have any inquiries. 【Overview】 ■ Main Additional Components - CCD camera for mask alignment - Near-infrared CCD camera for backside wafer alignment - Monitor and computer for image analysis - Backside camera unit stage - Others ■ Compatible Models: MPA600 Series, PLA Series ■ Installation Period: 1.5 weeks ■ Near-infrared specifications are also available * For more details, please download the PDF or contact us.
- Company：インターテックエンジニアリング 東京営業所
- Price：Other
Printed circuit board business
We also provide proposals and support for consumables! We handle everything from selecting and installing pharmaceuticals to manufacturing equipment comprehensively.
At YKC Corporation, our "Printed Circuit Board Business" provides comprehensive services from the selection and installation of manufacturing equipment to the chemicals involved in printed circuit board manufacturing. We also offer proposals and support for consumables such as router bits, drills, and cartridge filters. We respond to diverse needs, so please feel free to contact us when you require assistance. 【Features】 ■ Comprehensive support from the selection and installation of chemicals to manufacturing equipment ■ Proposals and support for consumables *For more details, please refer to the PDF materials or feel free to contact us.
- Company：ワイケイシー
- Price：Other
