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Exposure Equipment Product List and Ranking from 31 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

Exposure Equipment Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

  1. null/null
  2. サーマプレシジョン Tokyo//others
  3. ピーエムティー 本社・工場 Fukuoka//Industrial Machinery
  4. 4 ネオアーク 東京営業部 Tokyo//Industrial Electrical Equipment
  5. 5 大日本科研 Kyoto//Optical Instruments
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Exposure Equipment Product ranking

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

  1. LED light source maskless exposure device DL-1000 series
  2. Maskless exposure device "ME-120F" ピーエムティー 本社・工場
  3. High-performance direct exposure device *for circuit patterns *for solder resist サーマプレシジョン
  4. Maskless exposure device PALET 'DDB-701 Series' ネオアーク 東京営業部
  5. 4 Manual equal exposure device (manual mask aligner) エイ・エス・エイ・ピイ

Exposure Equipment Product List

46～60 item / All 81 items

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Technical Data: Manual Exposure Device for Parallel Light 'FRC-2500'

Technical Data: Manual Exposure Device for Parallel Light 'FRC-2500'

Detailed information about the device overview, specifications, and outline specifications will be presented using tables!

This document introduces the "FRC-2500," a manual exposure device with parallel light. This product is equipped with a U-shaped light source developed with a new design philosophy to meet the increasing precision requirements of printed circuit boards. It offers three types of power supplies that can be selected according to the required brightness: "6.5kW," "8kW," and "6.5kW & 8kW (switchable)." Additionally, it employs linear guides that can withstand moment loads from various directions generated during frame movement. [Contents] 1. Device Overview and Specifications 2. Summary Specifications *For more details, please refer to the PDF document or feel free to contact us.

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Ultraviolet Polarized Exposure Device HC-1001PUFM

Ultraviolet Polarized Exposure Device HC-1001PUFM

A light source device that selectively irradiates only uniform and excellent polarized light.

【Features】 ○ A light source device that uses a mercury-xenon lamp as the light source, and by employing a UV cold mirror and optical integrator, selectively irradiates only uniform polarized light with excellent consistency. ○ Emits polarized light with a extinction ratio of 50:1 or higher. ○ By attaching a high-transmittance interference filter, it is possible to select the irradiation wavelength. ○ Capable of accommodating desired irradiation area and intensity.

  • Ultraviolet irradiation equipment

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Fully automatic double-sided exposure device for φ300mm (12-inch) wafers.

Fully automatic double-sided exposure device for φ300mm (12-inch) wafers.

Efficient production at each engineering integration!!!

<Features> MLCSP, a dual-side alignment exposure device for C-MOS backside wiring. Equipped with an environment (Foup), compatible with GEM300 and OHT. Spin coater and developer can also be integrated, allowing for fully automated processes from resist coating to exposure and development. Patterning is possible (optional). Automatic reticle exchange (optional).

  • Other semiconductor manufacturing equipment
  • Wafer processing/polishing equipment

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Small wafer automatic exposure device

Small wafer automatic exposure device

It is a fully automatic exposure device ideal for LED/crystal devices!

<Features> This is a fully automatic exposure device optimized for LED/crystal devices. It features a high-rigidity design focused on productivity, utilizing stone plates for the base and supports. It has high throughput access with random control via a double-hand robot. It is also equipped with an Orifla aligner.

  • Other semiconductor manufacturing equipment
  • Wafer processing/polishing equipment

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Wafer exposure equipment (mask aligner) for research and development.

Wafer exposure equipment (mask aligner) for research and development.

Manual type for research and development

Overview Capable of multi-purpose applications from research and development to small lot production Offers suggestions based on the intended use by selecting hard contacts, soft contacts, or proximity.

  • Other semiconductor manufacturing equipment

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UV exposure device UVL-3

UV exposure device UVL-3

This is a simple exposure device using a super high-pressure mercury lamp as the light source.

The "UVL-3" is a tabletop UV exposure device. It allows for easy exposure curing primarily in photolithography processes using glass substrates and the like. Equipped with a color LCD and a directional pad, it accurately controls the exposure time. 【Features】 ■ A simple exposure curing device for photolithography processes ■ Space-saving design as it is a tabletop and integrated unit ■ Equipped with a microcontroller for precise control of exposure time *For more details, please refer to the PDF document or feel free to contact us.

  • Ultraviolet irradiation equipment
  • Other lighting equipment

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2-size inch compatible automatic equal exposure device (auto mask aligner)

2-size inch compatible automatic equal exposure device (auto mask aligner)

A wafer 2-size compatible auto mask aligner that allows for easy size switching. Simple setup, automatic parallel adjustment, complete non-contact gap management, and auto alignment.

The product is an automatic batch equal exposure mask alignment device. It can accommodate two sizes of wafers: φ3, 4 inches and φ4, 6 inches. Switching between sizes is very simple; just replace three components. No fine adjustments of the transport robot are necessary. Furthermore, it performs fully non-contact automatic parallel adjustment of the photomask and wafer, significantly reducing setup time in the manufacturing process. Equipped with a super-precise UVW drive stage and high-performance image processing, it accurately aligns the photomask and wafer. It supports both soft and hard contact. With a lineup tailored to production volume, ranging from manual machines to fully automatic machines, we achieve low prices by handling everything from design to manufacturing and sales in-house. 【Features】 ■ Supports multiple substrate sizes ■ Easy setup change ■ Fully non-contact parallel alignment and exposure of photomask and wafer ■ Auto-alignment function ■ Space-saving and easy maintenance ■ Achieves low price and compact design, suitable for small-batch production of various types ■ Equipped with a super-precise UVW stage *For more details, please refer to the PDF document or feel free to contact us.

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Semi-automatic double-sided simultaneous exposure device (Semi-auto double mask aligner)

Semi-automatic double-sided simultaneous exposure device (Semi-auto double mask aligner)

This is a device that allows simultaneous exposure of the front and back surfaces of wafers using a belt conveyor method. It can be set to fast exposure mode or alignment exposure mode.

This product is a semi-automatic double-sided simultaneous exposure device. The removal and loading from the wafer carrier is done using a belt system. The mask and wafer come into contact and are exposed simultaneously. There are two exposure modes selectable via recipes: a fast exposure mode without alignment and an alignment exposure mode where the alignment of the wafer and mask is performed manually. Utilizing the features of the belt transport system, the fast exposure mode allows for high throughput processing. The alignment of the upper and lower masks, as well as the mask-wafer alignment, is done with the same I.F., ensuring that operations do not become complicated. Additionally, changing the mask is also easy. Since we handle everything from design to manufacturing and sales in-house, we have achieved low prices. 【Features】 ■ Simultaneous double-sided exposure ■ Fast exposure mode, alignment exposure mode ■ Easy setup change, compatible with multiple substrate sizes ■ Space-saving & easy maintenance ■ Achieves low cost and compact design, suitable for small-batch production of various types ■ Belt transport system *For more details, please refer to the PDF document or feel free to contact us.

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Mass production process exposure device "Fully Automatic Mask Aligner"

Mass production process exposure device "Fully Automatic Mask Aligner"

We offer sizes of 4 inches and 8 inches! It has high versatility compatible with round and square samples.

We would like to introduce our mass production process exposure equipment, the "Fully Automatic Mask Aligner." It achieves a simple structure at a low cost. It has high versatility compatible with circular and square samples. We offer the "ALA410" for 4-inch size and the "ALA810" for 8-inch size. 【Features】 ■ High versatility (compatible with circular and square samples) ■ Reliable spherical bearing parallel mechanism ■ Achieves low cost with a simple structure ■ Available in Φ4in, Φ6in, and Φ8in specifications ■ CToC automatic transport *For more details, please refer to the PDF document or feel free to contact us.

  • Other semiconductor manufacturing equipment

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Semi-automatic exposure device "Semi-automatic Mask Aligner"

Semi-automatic exposure device "Semi-automatic Mask Aligner"

Available in 4-inch and 8-inch sizes! A semi-automatic exposure device for mass production of various types that allows for alignment exposure!

We would like to introduce the "Semi-Automatic Mask Aligner" handled by Sanmei Corporation. This product is a semi-automatic exposure device for mass production of various types, with an exposure light source that maintains an illumination distribution within ±5%. It can perform automatic gap adjustment, manual alignment, automatic contact exposure, and automatic transport in a streamlined process. Please feel free to contact us for more details. 【Specifications】 ■ φ4in φ6in φ8in specifications ■ Top-side alignment ■ Bottom-side alignment *For more details, please refer to the PDF document or feel free to contact us.

  • Other conveying machines

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Automatic alignment exposure device

Automatic alignment exposure device

Equipped with an image processing automatic alignment system using a CCD camera.

It is an automatic alignment exposure device equipped with an image processing automatic alignment system using a CCD camera.

  • Stepper

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Automated transport exposure device

Automated transport exposure device

The conveying system can be used inline with a roller conveyor method!

It is an exposure machine that aligns a glass mask and a workpiece in the photolithography process for glass substrates, and transfers fine mask patterns using soft contact exposure.

  • Stepper

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Screen version exposure device

Screen version exposure device

It is a high-precision exposure device equipped with a Fresnel lens.

It is a high-precision exposure device equipped with a Fresnel lens. The new vacuum system reduces distortion in the screen frame and further improves light distribution balance. We offer two types: a screen frame device and a large device for PDP.

  • Stepper

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Exposure device for printing plate making

Exposure device for printing plate making

Pseudo-parallel light exposure device equipped with a Fresnel lens.

Screen version, used in the film exposure process.

  • Printing Machinery
  • Lighting for image processing

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