ナノテック List of Products and Services

The MM605 is a simple photomask production machine for laboratories that performs 1/5 reduction exposure. Photomasks, which are essential for the fabrication of various semiconductor and MEMS microstructures, are particularly needed in a wide variety at universities and research institutes. This device allows for easy production of photomasks at the laboratory level, using drawings printed from your graphic software or CAD systems, which are then copied onto OHP film to be used as the mask original. With a specially designed optical system, the mask original is projected with high precision at a 1/5 reduction, allowing you to create emulsion masks. This enables you to easily and inexpensively produce masks that you previously relied on external contractors for. 【Features】 ■ Vertical design for space-saving ■ Ideal for research with many modifications ■ Cost-effective mask production at your fingertips, among others *For more details, please refer to the catalog or feel free to contact us.

• Other medical supplies and cosmetics manufacturing machines

The micro contact printer "PA400S" is a micro contact printing device that supports the mCP (micro contact printing) method, which is gaining attention as a next-generation device fabrication technique, as well as a simplified optical nanoimprint (UV-NIL) method. The mCP method fabricates organic electronics and bio-microstructures that have rapidly developed through the transfer of thiol ink using PDMS stamps. The UV-NIL method produces ultra-fine microdevices using quartz molds and photo-curable resins. Two independent stations for ink replenishment and the printing process allow for programmable control of contact speed, contact pressure, distance, and time using high-precision pressure sensors and Z-axis servo control. Additionally, it can also be used as a mask aligner, providing flexible support for various experiments and production. 【Features】 ■ Programmable control of contact speed and contact pressure ■ Programmable control of distance and time ■ Can be used as a mask aligner, among others *For more details, please refer to the catalog or feel free to contact us.

• Other medical supplies and cosmetics manufacturing machines

The dual-sided simultaneous exposure mask aligners 'BS425' and 'BS620' have a proven track record in both research and development and small to medium lot production. They adopt a method where the primary exposure is simultaneous on both sides, and subsequent exposures are done one side at a time, making them simple and versatile, with customization available to meet specific needs. Since the secondary exposure and beyond are done on one side, a separate "sample stage" is required. Please feel free to contact us. 【Features】 ■ Supports maximum φ4 inch wafers 'BS425' ■ Supports maximum φ6 inch wafers 'BS620' ■ Compact design ■ Semi-automatic operation possible during primary exposure with a footswitch ■ Easy to accommodate non-standard shape samples due to the hand placement style ■ Equipped with wafer positioning guide (optional) and more *For more details, please refer to the catalog or feel free to contact us.

• Other semiconductor manufacturing equipment

The mask alignment exposure device "BA Series" for backside alignment of samples is a low-cost mask alignment device that enables alignment from the backside of the sample, which was difficult with conventional exposure devices. This device allows for alignment and exposure of the mask pattern to a specified position on the opposite side (the second side) relative to the alignment mark pre-formed on the first side of the sample. Its compact design also allows it to be used as a standard single-sided exposure mask aligner, supporting the development of various MEMS and semiconductor devices with double-sided features. 【Features】 ■ Equipped with a dual-objective 2-field CCD microscope dedicated to backside observation ■ Minimum objective lens spacing of 16mm ■ Capable of aligning small samples ■ Equipped with a freeze-wipe processing device optimized for backside alignment ■ High-precision alignment stage with front slide for convenient sample access, among others *For more details, please refer to the catalog or feel free to contact us.

• Other medical supplies and cosmetics manufacturing machines
• Other experimental equipment and supplies

The experimental and research mask aligner "ES410" is a low-cost mask aligner that possesses sufficient functionality for photolithography. It features a wide range of customization unique to the ES series, allowing you to select various units and options to set up a device that fits your specific needs. Additionally, most units can be added or changed later, accommodating future upgrades. As a fully manual machine, it can be used for various experiments, research, and learning about photolithography. 【Features】 ■ Wide range of customization unique to the ES series ■ Options to select various units and options ■ Can be set up to fit specific purposes ■ Most units can be added or changed later ■ Accommodates future upgrades, among others *For more details, please refer to the catalog or feel free to contact us.

• Other medical supplies and cosmetics manufacturing machines
• Other experimental equipment and supplies

The MM605 is a simplified mask-making machine for research laboratories that produces 1/5 reduced exposure photomasks. Photomasks are essential for the fabrication of various semiconductor and MEMS microstructures. In particular, universities and research institutes require a variety of masks. This device allows for easy production of photomasks at the laboratory level. You can use drawings printed from your graphic software or CAD system on OHP film as the mask original. The MM605 uses a specially designed optical system to project the mask original with high precision at a 1/5 reduction, creating emulsion masks. You can now easily and inexpensively produce masks that you previously relied on external contractors for. It is especially recommended for research with frequent modifications. The design is also vertical, saving installation space. For more details, please contact us or refer to the catalog.

• Other processing machines

The Micro Contact Printer PA400S is a micro contact printing device that supports the mCP (micro contact printing) method, which is gaining attention as a next-generation device manufacturing technique, as well as a simplified optical nanoimprint (UV-NIL) method. The mCP method fabricates organic electronics and bio-microstructures that have rapidly developed through the transfer of thiol ink using a PDMS stamp. The UV-NIL method produces ultra-fine microdevices using quartz molds and photo-curable resins. The two independent stations for ink replenishment and printing processes can programmatically control contact speed, contact pressure, distance, and time using high-precision pressure sensors and Z-axis servo control. Additionally, it can also be used as a mask aligner, providing flexible support for various experiments and production. For more details, please contact us or refer to the catalog.

• Other processing machines
• Commercial printers

The BS320 dual-sided simultaneous exposure mask aligner has a proven track record in research and development as well as small to medium lot production. It adopts a method where the primary exposure is done simultaneously on both sides, and subsequent exposures are done one side at a time, making it a simple and versatile model. Customization to meet various needs is also available. Since the subsequent exposures are done on one side, a separate "sample stage" is required. The BS320u, which allows for simultaneous dual-sided exposure even after the primary exposure, is also part of the lineup. It supports semi-automatic operation for medium lot production. For more details, please contact us or refer to the catalog.

• Other inspection equipment and devices

The BA series backside mask alignment exposure device is a low-cost mask alignment system that enables alignment from the backside of the sample, which was difficult with conventional exposure devices. It can also be used as a standard single-sided exposure mask aligner, supporting the development of various MEMS and semiconductor devices with double-sided configurations. This device allows for the alignment and exposure of mask patterns to specified positions on the opposite side (the second side) of the sample, relative to pre-formed alignment marks on the first side. For more details, please contact us or refer to the catalog.

• Other inspection equipment and devices

The high-performance mask aligner LA series is a standard device for compact fine exposure with 4/6/8 inch standard mask aligners. It is an exposure device capable of high-resolution pattern exposure in research fields requiring photolithography, such as semiconductor device fabrication. It is equipped with a specially designed dual-objective two-field CCD microscope, allowing alignment of small samples with a minimum objective lens spacing of 18mm. It features a wipe device for simultaneous two-field monitoring display, and the Z-axis is driven by air pressure with a gap fine adjustment lever. It supports hard contact, soft contact, and proximity exposure. The parallel mechanism employs reliable spherical bearings for compactness and high versatility. For more details, please contact us or refer to the catalog.

• Other inspection equipment and devices

The MA series sample alignment temporary fixing device is a sample alignment device that aligns and adheres two samples, such as films, glass, silicon, and metals with microstructures on their surfaces, with high precision. The two samples are arranged vertically, and the lower sample is aligned in the XYZ∂ axis direction relative to the upper sample, which serves as a fixed reference. Various types of alignment microscopes are available, including eyepiece types, CCD camera and monitor observation types, variable magnification types, and infrared observation types. An image freeze system that allows alignment even with gaps exceeding the microscope's depth of focus is also supported. The sample mounting section accommodates various sample sizes, and holders made of Pyrex glass for fragile samples like films, as well as sample holders with spacers for degassing in an anodic bonding device chamber, can also be manufactured. For more details, please contact us or refer to the catalog.

• Other processing machines

The ES410 mask aligner for experiments and research is a low-cost device that possesses sufficient functions necessary for photolithography. It is a fully manual machine suitable for various experiments, research, and learning about photolithography. With the wide customization options unique to the ES series, it can be set up to better fit specific purposes by selecting various units and options. Most units can be added or changed later, allowing for future upgrades. For more details, please contact us or refer to the catalog.

• Other inspection equipment and devices

We build up the optimal mask aligner tailored to your specifications and budget. By selecting only the necessary units and options from various choices, we can create an easy-to-use device that minimizes unnecessary costs. We will listen to your requests and propose the best specifications. Additionally, most units can be added or replaced later, allowing for future upgrades and reductions in initial installation costs. You can choose from two types of UV light source devices (various exposure sizes) that accommodate samples from φ1 to 4 inches (including custom shapes like square samples) and masks from 2 to 5 inches. You can also select from various observation microscopes, including CCD cameras, stereo, and eyepiece types. It is compact and low-cost. For more details, please contact us or refer to the catalog.

• Other inspection equipment and devices

The Spray Coater 3D Resist Coating Device DC110/DC210 is a spray coater developed for MEMS devices and various semiconductor research. With a spray nozzle capable of fine particle generation, it can form a uniform film even on inclined surfaces, trapezoidal shapes, and right-angle vertex areas that are difficult to coat with conventional spinners. It also enables resist embedding coating in cavity, via hole, and trench structures, which are challenging to achieve with spinners. The coating thickness can range from spinner-class thin films to ultra-thick films. It supports ultra-thick resists such as the AZ Electronic Materials AZ-P4000 series, MicroChem SU8, KMPR series, as well as benzocyclobutene resin (BCB) and various polymers. Additionally, it can apply high-viscosity liquids (depending on the liquid properties). By applying only to the necessary minimum area, there is no waste of liquid as seen in spin coating. The nozzle-moving multi-pass scanning method accommodates large samples. For more details, please contact us or refer to the catalog.

• Coater

The ImpFlex Essential, a simplified UV nanoimprint lithography device, is attracting attention as a next-generation microfabrication technology due to its high miniaturization, low cost, and high throughput compared to conventional photolithography. This device is a low-cost model that has undergone thorough cost reduction based on the higher-end model, Impflex. Despite its low price, the imprint engine inherits features that achieve low residual film and uniform film thickness. Mold materials such as quartz and Ni electroforming, among others, are available as options. This experimental device can be used in various fields, including optical devices, MEMS (NEMS), optical communication devices, diffraction gratings, microlenses, microfluidic devices, and biochips for DNA analysis. For more details, please contact us or refer to the catalog.

• Other processing machines
• Commercial printers

The Microcontact Printer MP200 is an experimental and research support device that corresponds to the μCP method (Microcontact Printing), which is gaining attention as a next-generation device fabrication technology. The μCP method utilizes PDMS stamps to not only pattern self-assembled monolayers (SAM) using thiol molecules but also to pattern functional materials such as organic semiconductor materials with higher precision than conventional printing methods. This has led to ongoing research and development as a fabrication technology for organic electronics and nano-bio devices. The MP200 significantly reduces defects that occur during fine patterning by adopting a bubble trapping prevention mechanism based on research results from AIST. The transfer process stage allows for programmable control of contact speed, contact pressure, distance, and time using high-precision pressure sensors and Z-axis servo control. The operation is intuitive and user-friendly, utilizing a touch panel and joystick. For more details, please contact us or refer to the catalog.

• Other processing machines
• Commercial printers

The "MEMS Development Tools" includes a variety of equipment such as standard single-sided mask aligners, sample backside observation aligners referred to as "mask aligners," UV nanoimprinters and micro-contact printers called "imprints," spray coaters known as "coaters," and a unique low-cost mask fabrication machine called "simple mask fabrication machine." It also features numerous devices including alignment equipment for anodic bonding, infrared observation alignment equipment, various bonding alignment devices referred to as "temporary bonding devices," vacuum bonding equipment known as "anodic bonding devices," and the simple mask fabrication machine "MM605." For more details, please contact us or refer to the catalog.

• Other processing machines

In the "MEMS Development Process Equipment," we offer a variety of devices including the compact standard model for fine exposure, the "Single-Sided Mask Aligner," the low-cost assist model for double-sided processes, the "Front Mask Aligner," the standard mass production machine for double-sided and multi-sided processes, the "Simultaneous Double-Sided Exposure Mask Aligner," the custom equipment for automation and mass production, the "Auto Mask Aligner," the dedicated exposure device, the "Custom Mask Aligner," the alignment fixing device compatible with custom designs, the "Precision Alignment Holder" using a unique clamping mechanism, the "UV Nano Imprinter / Micro Contact Printer" for precise transfer with low residual film and low bubbles, the industry-standard "General Purpose Spray Coater," and the unique low-cost mask production machine, the "Simple Mask Production Machine," among many others. For more details, please contact us or refer to the catalog.

• Other processing machines

NanoTech Co., Ltd. is engaged in the research and development of semiconductor manufacturing equipment (mask aligners, spinners, developers, cleaning machines), MEMS (micro-machines), and the development and manufacturing of various tools. Our areas of expertise include optical-related precision machinery (development design, machining, assembly production, sales), and our industrial fields encompass semiconductor manufacturing equipment, precision machinery, optical instruments, MEMS devices, and medical devices. We also accept the development and manufacturing of research and development support equipment. Our company brochure includes "95 Years of Innovation in Precision Technology (Advancement of Sokeisha Co., Ltd.)", "History of Product Development", "Company Overview", and "Company History". For more details, please contact us or refer to the catalog.

• Other processing machines
• Other semiconductor manufacturing equipment
• Contract manufacturing

In addition to the general-purpose mask aligner ES20 series, we offer a variety of products including a wafer double-sided exposure type and a back-side observation mask aligner. We also accept custom equipment development and manufacturing tailored to customer specifications for photolithography-related devices and MEMS research and development support equipment.

• Coater
• Other semiconductor manufacturing equipment

It is being adopted for various purposes other than microprinting and exposure devices.

• Other semiconductor manufacturing equipment