List of Semiconductor Manufacturing Equipment products
- classification：Semiconductor Manufacturing Equipment
181～225 item / All 5157 items
Reduce the workload from handling heavy objects! Here are five case studies that solved customer challenges! We are also accepting free consultations and tests tailored to your work!
- Other conveying machines
Work can be done in narrow spaces, and with commercially available spanners and monkey wrenches! A highly convenient screw joint that minimizes tightening scratches.
- Pipe Fittings
- Piping Materials
- valve
For prototyping, development, and small lot production For deposition of NSG(SiO2)/BSG/PSG/BPSG Batch processing (simultaneous processing of multiple substrates) APCVD system
- CVD Equipment
Small quantities and wide varieties. NSG(SiO2)/PSG/BPSG deposition. Single-wafer processing atmospheric pressure CVD (APCVD) system (Compatible with 8-inch SiC wafers)
- CVD Equipment
No damage to the substrate! A vacuum deposition device capable of ultra-low temperature sputtering.
- Sputtering Equipment
High cleaning performance! The internal structure is very simple with no fluid retention areas! No metal leaching!
- Semiconductor inspection/test equipment
Notice of Participation in the 28th Interphex Japan
We will be exhibiting at the "28th Interphex Japan" trade show, which will be held from May 20 to 22, 2026, featuring auto connectors, automatic piping switching devices, Quitto, and electronic listening rods. At our booth, we will have demonstration units of the auto connectors and automatic piping switching devices, allowing you to see how the connectors automatically align and how the piping is attached and detached. In the Quitto experience corner, you can try out the new product "Quitto" for easy attachment and detachment with just one action. Additionally, we will also display the actual electronic listening rod Kirari MUSE, a diagnostic device that digitizes and visualizes "sound." If you are interested in factory automation, facing challenges with automation, want to eliminate the hassle of Hurel clamps, or are troubled by abnormal sound diagnostics, please stop by. We sincerely look forward to your visit. "28th Interphex Japan" Date: May 20 (Wed), May 21 (Thu), May 22 (Fri), 2026, 10:00 AM - 5:00 PM Venue: Makuhari Messe (Booth Number: 30-27) Exhibits: Auto connectors for powder, automatic piping switching devices, "Quitto," electronic listening rods.
![[Success Case] Reduced Dress Time w...](https://image.mono.ipros.com/public/product/image/1a4/2001504731/IPROS4442094283797007228.png?w=280&h=280){kind=small}
The dressing of the grinding pad significantly changes the time in tool management.
- Wafer processing/polishing equipment
![[Success Case] What is the work eff...](https://image.mono.ipros.com/public/product/image/ed8/2001504730/IPROS16238364279115532907.png?w=280&h=280){kind=small}
When it comes to the modification of grinding pads, it's the DP-equipped modification carrier, but what about improving work efficiency?
- Wafer processing/polishing equipment
We have a proven track record in various fields such as semiconductors, physical and chemical instruments, and kitchen equipment. Our heater bending technology allows us to design various shapes.
- Other semiconductor manufacturing equipment
- Electric furnace
- Other heaters
The comprehensive catalog has been renewed.
We have renewed our comprehensive catalog to convey our products and services in a clearer and more understandable manner. Our company is a manufacturer that specializes in industrial heaters and machinery equipped with heating components. We deliver customized products tailored to each customer, handling everything from design and manufacturing to sales in-house. We also welcome inquiries about sheath heaters and various consultations regarding heat-related issues, so please feel free to contact us.
A heater that achieves high efficiency and clean heating without the need for insulation! The gas heater "Clean Hot" is an electric heater that utilizes bending technology!
- Other semiconductor manufacturing equipment
- Heating device
Reproducing the process of image formation in the resist on a computer! Efficiently discovering optimal process conditions.
- Resist Device
Introducing HMDS treatment, which is said to improve the adhesion of the resist!
- Resist Device
"I want to increase uniformity more," "It's inevitable that liquid unevenness occurs with ultra-thin materials," such concerns can be resolved all at once!
- Other semiconductor manufacturing equipment
- Used goods purchase
For stainless steel containers and parts processing, leave it to us!
- Stainless steel container
- Stone Processing Machinery
- Other semiconductor manufacturing equipment
This is a panel mount joint that can be easily installed by simply drilling a hole in the panel and securing it with screws.
- Other machine tools
- Other semiconductor manufacturing equipment
- Pipe Fittings
![[Tooling-Free Mass Production] Mach...](https://image.mono.ipros.com/public/product/image/2000158412/IPROS4317513488585082420.JPG?w=280&h=280){kind=small}
Fast and flexible low-volume production
- Contract manufacturing
- Etching Equipment
- Engine parts
Integrate the functions of the flow sensor and valve to automatically control the water flow, such as coolant, using a microcontroller.
- Other semiconductor manufacturing equipment
- Flow Control
- Piping Materials
A super high-resolution camera capable of wide-angle and ultra-high-definition imaging, suitable for various MV applications.
- Monochrome camera
- Color camera
- Semiconductor inspection/test equipment
High-durability PTFE hoses achieve both high flexibility and durability due to their fine wave PTFE structure. They are suitable for chemical supply lines and movable piping sections in semiconductor ...
- hose
- Other semiconductor manufacturing equipment
- Etching Equipment
![[For Semiconductors] High voltage r...](https://image.mono.ipros.com/public/product/image/2074022/IPROS3851412570407366522.jpeg?w=280&h=280){kind=small}
High-pressure resistant PTFE hoses adopt a fine wave PTFE corrugation structure. They achieve both high pressure resistance and low reaction force, making them suitable for high-purity chemical lines ...
- hose
- Other semiconductor manufacturing equipment
- Etching Equipment
Filter cartridge replacement without removing piping.
- Other semiconductor manufacturing equipment
- Other process controls
- Piping Materials
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
- Heating device
- Annealing furnace
- Electric furnace
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
- Heating device
- Annealing furnace
- Electric furnace
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
High-precision pressure sensor for high-purity fluids.
- CMP Equipment
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We are not an ordinary valve manufacturer! We can widely produce "unit integrated valves" that combine filters, sensors, and more, tailored to your needs!
- Other semiconductor manufacturing equipment
High-precision pressure gauge for high-purity fluids.
- CMP Equipment
For the pharmaceutical, food, beverage, biotechnology, and cosmetics industries.
- Other semiconductor manufacturing equipment
All-fluoropolymer durable pressure gauge!!
- Pressure
- CMP Equipment
- Other semiconductor manufacturing equipment
Minimize the footprint within the device! But with excellent high pressure and flow capacity! Fluororesin valve.
- valve
- Other semiconductor manufacturing equipment
We propose a solution for pressure relief valves related to semiconductor chemical supply in a new form! It can be selected for a wide range of applications.
- valve
- Other semiconductor manufacturing equipment
GEMÜ stainless steel diaphragm valve for high-purity organic solvents
- valve
- Resist Device
Custom-made modular type! Easy maintenance and flexible combinations realized by the customer!
- valve
- Other semiconductor manufacturing equipment
Achieving stable slurry supply! GEMU slurry supply application case for semiconductor manufacturing.
- valve
- Other semiconductor manufacturing equipment
Fluororesin diaphragm valve ideal for abrasive fluids such as slurries.
- CMP Equipment
[Online Exhibition 3/8-3/10] Invitation to Exhibit at the Future of Japanese Manufacturing Exhibition
From March 8 to 10, 2021, we will be exhibiting at the "Future of Japanese Manufacturing" exhibition. Once called a "manufacturing powerhouse," the Japanese manufacturing industry is now facing a crisis due to delays in digital transformation (DX) and other factors, bringing together technologies that will have a significant impact. Mr. Akira Ikegami and Mr. Wang, the chairman of HUAWEI, will also be speakers at the event. This is an opportunity to think together about the "future" of Japanese manufacturing! We look forward to your visit.
Compatible with highly corrosive chemicals!! GEMÜ high-purity fluoropolymer valves
- valve
- Resist Device
- CMP Equipment
The "FHR.Star.600-EOSS" is a high-performance magnetron sputtering device developed for precise optical filter film deposition.
- Sputtering Equipment
Highly acclaimed high-precision optical filter deposition magnetron sputtering device
This is a device specialized in optical thin films, such as high-performance optical filters that require multilayering and high reproducibility, particularly for applications like LiDAR, which are expected to see significant demand in the future. It demonstrates strong capabilities for high-quality and stable production. - Film formation that eliminates the influence of film quality changes due to target consumption using a cylindrical cathode. - Stable film formation of oxide films achieved by incorporating a reactive ion source. - Film formation of a wide range of multilayer films enabled by the installation of up to four cathodes.
A high ion current helicon plasma ion source PVD module that achieves directional film formation and enables reactive sputtering.
- Sputtering Equipment
- Plasma Generator
High-throughput roll-to-roll sputtering equipment for the manufacture of FCCL (Flexible Copper Clad Laminate).
- Sputtering Equipment
FHR Star.100-Tetra Co is a very compact sputtering device designed for MEMS and high-performance optical products.
- Sputtering Equipment
High-performance, high-quality magnetron sputtering cathodes! Sales, repair, and maintenance services are also available.
- Sputtering Equipment
- Vacuum Equipment
- Other metal materials
The Spatakaso Sword Service Center has been established.
Starting in April 2024, we will establish a service center for inspection and repair of the "Magnetron Sputter Cathode" manufactured by Angstrome Science in the United States. The new service center will be equipped with clean room facilities, vacuum leak checkers, and various inspection instruments to ensure comprehensive maintenance. All work will be supervised and guided by qualified personnel who have completed training at Angstrome Science, providing services similar to those in the United States. Until now, we have primarily focused on repairs due to malfunctions, but with the opening of the service center, we will also be able to offer regular maintenance. We will conduct periodic inspections of the cathodes to support operations without downtime.
High-rate and high-quality film formation of dielectric and ferromagnetic materials.
- Sputtering Equipment
We will exhibit at the MEMS Engineer Forum 2025.
The MEMS Engineer Forum is a unique forum operated primarily by engineers among the key players in MEMS technology, which is considered a key technology of the 21st century. At this forum, where MEMS researchers, developers, and engineers from around the world gather, we will introduce and showcase the Remote Plasma Ion Beam Sputtering System manufactured by Plasma Quest Ltd. This is an excellent opportunity to see cutting-edge technologies related to MEMS, not only from our exhibition but also from others. We cordially invite you to attend. Venue: International Fashion Center Hall 1-6-1 Yokogawa, Sumida-ku, Tokyo 130-0015, Japan Access: https://www.tokyo-kfc.co.jp/access/ Exhibited Product: Remote Plasma Ion Beam Sputtering System by Plasma Quest Ltd. https://mono.ipros.com/product/detail/2001148974 https://www.plasmaquest.com/
Production ion beam milling equipment that achieves high rate and high reliability.
- Sputtering Equipment
We achieve film formation by freely controlling reactive sputtering and alloy sputtering.
- Sputtering Equipment
- Plasma Generator
- Other surface treatment equipment
We have updated the page for the remote plasma ion beam sputtering system manufactured by PlasmaQuest.
We have updated the page for the Remote Plasma Ion Beam Sputtering System manufactured by PlasmaQuest, which has received positive feedback from various companies since its introduction. We have also included a video on Remote Plasma Target Bias Sputtering. If you have any questions or requests, please feel free to contact us.
Remote source ion beam sputtering device manufacturer for remote plasma sources.
- Sputtering Equipment
Information on commissioned test film formation services (test film formation of high-quality reaction films, etc.)
Research on Co-sputtering of different materials, such as ferromagnetic targets and metal and ceramic targets, which are considered difficult to film using conventional sputtering devices. We strongly support advanced material research and process development, including the deposition of AlScN, which is attracting attention for next-generation MEMS applications. This is a groundbreaking technology that uses a helicon ion source as a plasma source, accelerating high-density ions obtained from it by applying a bias voltage to the target. Since it is an ion beam-type deposition method using a remote plasma system, stable film formation can be achieved even with ferromagnetic and dielectric targets, which are challenging for magnetron sputtering devices. By individually controlling the ion source and target application, it is possible to accommodate a wide range of deposition conditions while also achieving high deposition rates. Independent gas supply near the target and substrate allows for the deposition of various multilayer thin films, including oxide and nitride films. Since the substrate surface is not exposed to plasma, it is possible to maintain a low temperature during film formation.
We will extend the life of your equipment with bolt-on and coupler-on solutions.
- Sputtering Equipment
- Solenoid Actuators
- Transport and handling robots