CVD Equipmentの製品一覧
- 分類：CVD Equipment
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For those who have isolators. Achieving high chemical resistance and workability. Low cost and short delivery times are also possible for glove box and isolator gloves.
- Work gloves
Notice of participation in 'INTERPHEX Week Tokyo' from May 20 (Wednesday) to May 22 (Friday), 2026.
Ito Corporation will be exhibiting at "INTERPHEX Week Tokyo" held at Makuhari Messe. This exhibition is the largest in Japan, showcasing a wide range of products and services related to the research and manufacturing of pharmaceuticals, cosmetics, and regenerative medicine from 25 countries and regions around the world. Pharmaceutical and cosmetic manufacturers, as well as regenerative medicine companies, will be attending from all over the globe. We will be showcasing "Gloves for Glove Boxes/Isolators" manufactured by Tron Power. We look forward to your visit.
![[Nanofurnace] BWS-NANO Thermal CVD ...](https://image.mono.ipros.com/public/product/image/0d0/2000191194/IPROS99314670218218380543.jpeg?w=280&h=280){kind=small}
Hot Wall Type Thermal CVD Equipment: A compact, high-performance CVD device ideal for fundamental research.
- CVD Equipment
- Annealing furnace
- Heating device
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
TiC treatment and TiCN treatment are possible! It can be used under harsher conditions than PVD treatment.
- CVD Equipment
Adopting a unique LIA method plasma source, we achieve ultra-fast, high-quality vacuum deposition on resin films and metal foils!
- CVD Equipment
Adopting a unique LIA method plasma source, we achieve ultra-fast, high-quality vacuum deposition on flat substrates such as glass and metal!
- CVD Equipment
With a space-saving design, the vacuum pump module can be installed up to 18 meters away from the process module.
- CVD Equipment
Demo available at our company! New technology launched in the market. CVD with atmospheric pressure plasma. Capable of handling small quantities and a variety of products.
- CVD Equipment
- Other painting machines
- Other processing machines
Silicon nitride, which has heat resistance and excellent thermal shock resistance, is a material with strong mechanical strength and good balance.
- Fine Ceramics
- CVD Equipment
- Heating device
The passivation MBE device is composed of various chambers specially designed for laser facet passivation and other purposes.
- Evaporation Equipment
- CVD Equipment
Eliminate concerns about vacuum piping equipment! Presenting examples of measures against degradation of centering due to plasma and heat.
- Other semiconductor manufacturing equipment
- valve
- CVD Equipment
Equipped with a flow management system! Processing of powders at high temperatures using CVD/PECVD is possible.
- CVD Equipment
Various plasma sources can be equipped! Customized design for CVD, MOCVD, and ALD equipment.
- CVD Equipment
The maximum film-forming temperature is 800°C! It can accommodate up to 4x DLI evaporators with the chamber heating mechanism.
- CVD Equipment
Compatible with SI 500-1M, SI 500 PPD-1M, etc.! The transport chamber is available in three types.
- CVD Equipment
Control of ion density by ICP power! Achieving low-temperature film formation, low damage, and high conformality.
- CVD Equipment
A must-see for semiconductor material manufacturers! We are presenting examples of proposals addressing the challenges of high-temperature conditions in solid material supply.
- Other semiconductor manufacturing equipment
- valve
- CVD Equipment
![[Super Heat Resistant] Various Supe...](https://image.mono.ipros.com/public/product/image/648/2000848039/IPROS45219775091001426142.jpeg?w=280&h=280){kind=small}
Heat-resistant above 300℃! We can offer various super engineering plastics. There has been an increase in inquiries from the semiconductor industry as an alternative proposal to the "depletion of high...
- CVD Equipment
- valve
- plastic
You can convert thermal conductivity into pressure and perform vacuum measurements.
- CVD Equipment
This is a compact thermal cathode ionization vacuum gauge with an integrated sensor, circuit, and display. It supports 16 types of gases and also uses a metal sensor!
- CVD Equipment
Currently presenting a summary of three particularly popular case studies! Changing the valve can also reduce the incidence of troubles. A collection of safety measures to protect workers from danger.
- Other semiconductor manufacturing equipment
- valve
- CVD Equipment
"Complete Case Study of Flow Paths" A must-see for semiconductor material manufacturers! Presenting examples of diaphragm valves that enable disassembly cleaning.
- Other semiconductor manufacturing equipment
- valve
- CVD Equipment
Complete Case Study of Flow Paths: Lock valves with locks and tagged wires! Presenting examples of measures against valve misoperation.
- Other semiconductor manufacturing equipment
- CVD Equipment
- Oxidation/Diffusion Device
"Complete Case Study of Flow Paths" For those with near-miss incidents due to partially open valves and those struggling with closure confirmation in confined spaces, this is a must-see! We are curren...
- CVD Equipment
- Oxidation/Diffusion Device
- Other semiconductor manufacturing equipment
"Complete Case Study of Flow Paths" Taking proactive measures against risks during the transportation of semiconductor gas supply equipment. Presenting examples of safety measures.
- Other semiconductor manufacturing equipment
- CVD Equipment
- Oxidation/Diffusion Device
Attention those struggling with byproduct management in the front section of pest control devices or CVD exhaust lines! We present a case study on suppressing byproducts using a high-temperature (180°...
- CVD Equipment
- Oxidation/Diffusion Device
- Other semiconductor manufacturing equipment
"Complete Case Study of Flow Paths" No need for wire or lock installation! Presenting cases of lockable valves that prevent erroneous operation of valves due to human error.
- CVD Equipment
- Other semiconductor manufacturing equipment
- valve
Can be applied inside pipes with an inner diameter of just 1mm! Excellent in lubrication, corrosion resistance, and release properties, making it suitable for a wide range of applications from kitchen...
- Other surface treatment equipment
- CVD Equipment
Adopts a mechanism that discharges exhaust upward. It picks up and transfers surrounding chips non-contact without blowing them away with the ejected gas.
- Wafer
- CVD Equipment
- Wafer processing/polishing equipment
Used semiconductor manufacturing equipment
- CVD Equipment
Fluororesin tube lining is a lining technology that involves bonding a fluororesin tube (with an inner diameter of 3mm or more) to the inner surface of a metal pipe through baking.
- Printing Machinery
- Filtration Equipment
- CVD Equipment
What are the value criteria for devices sought by device manufacturers? KITZSCT helps improve space-saving design and construction efficiency for exhaust system lines.
- Other semiconductor manufacturing equipment
- CVD Equipment
- Oxidation/Diffusion Device
A compact and space-efficient device! The substrate supports φ4 inch, and it comes with a heating mechanism and T/S variable mechanism!
- CVD Equipment
Semiconductors, components for liquid crystal manufacturing equipment, heat-resistant and corrosion-resistant materials, setters, and heat dissipation plates!
- CVD Equipment
Nisshin Giken Co., Ltd. - Single Crystal Growth Equipment - Comprehensive Catalog Available for Free Distribution!
- CVD Equipment
Early detection of liquid leaks to minimize accidents! The OD-7, compliant with RoHS and CE, has been added to the oil and organic solvent detectors.
- CVD Equipment
We provide MOCVD equipment for high-performance, high-throughput advanced compound semiconductors, uniquely developed by Agnitron.
- CVD Equipment
This is a Windows-based SCADA package MOCVD equipment control software with the latest control features and data logging capabilities.
- CVD Equipment
The AgniTemp-MOCVD in-situ temperature monitor developed by Agnitron is a highly accurate and stable temperature monitor.
- CVD Equipment
We provide fully refurbished and upgraded legacy MOCVD equipment along with the best service and support.
- CVD Equipment
An in-situ monitor that measures wafer stress, warpage, curvature, anisotropy, etc., in various vacuum devices in real-time and with high precision.
- CVD Equipment
Components that are resistant to high-temperature ammonia and can easily achieve high temperatures, high-temperature heaters, and structural materials. Support from single crystal growth of nitrides t...
- CVD Equipment
Why introduce the insulation material "Silsaam"? Here are its benefits explained.
- CVD Equipment
- Industrial Furnace
- Annealing furnace
Water-repellent coating with plasma treatment. Compatible with resin films through low-temperature processing. Development support through sample testing. Compact type plasma surface treatment device.
- Plasma surface treatment equipment
- CVD Equipment