Sputtering Equipmentの製品一覧
- 分類：Sputtering Equipment
136～180 件を表示 ／ 全 218 件
This is a copper plate for low-temperature devices made of C1020, used in low-temperature environments.
- Sputtering Equipment
- Other semiconductor manufacturing equipment
This is an example of a heat sink that has been gold-plated.
- Sputtering Equipment
It is a backing plate used in a film-forming device.
- Sputtering Equipment
- Other semiconductor manufacturing equipment
No need for pre-sputtering aimed at preventing oxidation films, allowing for a reduction in labor! This is a sputtering target that also minimizes cracking due to thermal expansion.
- Sputtering Equipment
Using high-performance fabrics to prevent spatter, fire, and heat, also suitable for anti-splash applications!
- Sputtering Equipment
- Welding robot
- Welding Machine
Sulfur compound compatibility available. Dedicated film deposition device for research on thin-film solid-state batteries. Comprehensive support from target to film deposition testing, including dedic...
- Plasma surface treatment equipment
- Sputtering Equipment
Rich experience in processing various materials and substrates! Substrate × thin film = optical adjustment, conductivity, antibacterial/antiviral.
- Sputtering Equipment
- Processing Contract
- Surface treatment contract service
Specialized for responding to R&D and niche processes, a new type of multi-chamber sputtering device for small-scale production and prototyping/research and development, which is difficult with mass p...
- Sputtering Equipment
- Plasma surface treatment equipment
Equipped with two connection ports for sputtering devices and PLD devices! Samples can be transferred to each sample holder.
- Sputtering Equipment
An almost ideal mixture can be created! It has excellent linearity, and the geometric arrangement and composition within the sample correspond one-to-one.
- Sputtering Equipment
A film formation technology with excellent reproducibility that utilizes high energy to forge the material itself!
- Processing Contract
- Wafer
- Sputtering Equipment
Aluminum cutting / Aluminum processing / Aluminum machining
- CVD Equipment
- Sputtering Equipment
- Coater
Lathe machining / Aluminum processing / Precision parts machining
- CVD Equipment
- Sputtering Equipment
- Annealing furnace
We specialize in processing sizes from 500 to 1200 mm and can guarantee precision in the 1000s range. Please feel free to consult with us first.
- Stepper
- Sputtering Equipment
- Semiconductor inspection/test equipment
Machining/Metalworking
- Sputtering Equipment
- Annealing furnace
- Resist Device
Inverted sputtering is also possible! Equipped with a 500W high-frequency power supply, it can deposit metals, oxides, insulators, and more.
- Sputtering Equipment
High-performance materials (tungsten and molybdenum) products from Plansee are available for purchase online. Sheets, rods, wires, vapor-deposited parts, heat sinks, and more.
- Non-ferrous metals
- Industrial Furnace
- Sputtering Equipment
CNC lathe processing, aluminum precision cutting, semiconductor manufacturing equipment parts [Leave cost reduction to Philir Co., Ltd.]
- Sputtering Equipment
- CVD Equipment
- Ion implantation equipment
A5056 / Lathe processing / Aluminum processing [Leave cost reduction to Firiru Co., Ltd.]
- CVD Equipment
- Sputtering Equipment
- Other semiconductor manufacturing equipment
Aluminum cutting / A5052 / Lathe processing / Osaka [Leave cost reduction to Firiru Co., Ltd.]
- CVD Equipment
- Sputtering Equipment
- Semiconductor inspection/test equipment
Polycrystalline silicon is used as a raw material for the semiconductor industry and the solar cell industry (PV). Material: Nickel alloy Process: Filter
- Sputtering Equipment
■Advantages ・Custom-made to meet your requirements ・Uniform gas diffusion ・Standard connector elements
- Sputtering Equipment
A composition distribution with several hundred conditions is formed on a single substrate. The effective film formation area is an equilateral triangle with a side length of 25 mm.
- Sputtering Equipment
Effective area of a 25mm side triangle! It forms a composition distribution of hundreds of conditions on a single substrate.
- Sputtering Equipment
Aluminum processing, anodizing treatment, Osaka [Leave cost reduction to Philir Co., Ltd.]
- Sputtering Equipment
- CVD Equipment
- Evaporation Equipment
It is an introduction device that transmits linear motion from the atmospheric side to samples and equipment in a vacuum.
- Sputtering Equipment
- CVD Equipment
- Other semiconductor manufacturing equipment
Conductive carbon thin films are formed by sputtering. Stable film formation is achieved through a simple process with inert gas and carbon target at low temperatures (below 400°C).
- Sputtering Equipment
- Plasma surface treatment equipment
- Other processing machines
Aluminum precision parts for semiconductor manufacturing equipment, Osaka. [Leave cost reduction to Philir Co., Ltd.]
- Sputtering Equipment
- Ion implantation equipment
- Evaporation Equipment
Development of new thin films using simultaneous three-source sputtering! Customizable according to experimental content and budget.
- Sputtering Equipment
Multi-layer film deposition using a maximum of 5 yuan cathodes. Wear resistance, heat resistance, and smooth thin films. High throughput even for high-temperature deposition with a load lock type.
- Sputtering Equipment
- Plasma surface treatment equipment
From discrete components to advanced devices, from R&D to mass production. A compact, high-quality, multi-purpose CtoC type sputtering system.
- Sputtering Equipment
- Plasma surface treatment equipment
- Other mounting machines
Currently responding to sample tests, developing films and metal foils for flexible devices and advanced functional materials, and supporting mass production. Process support with demo equipment.
- Other processing machines
- Sputtering Equipment
- Plasma surface treatment equipment
A lineup with over 20 years of proven history. Customized processes and hardware for high-end niche processes from R&D to mass production.
- Sputtering Equipment
- Plasma surface treatment equipment
AlN templates for UV-LEDs using sputtering. AlN films with high crystallinity and C-axis orientation can be created by sputtering. Latest model deposition equipment.
- Sputtering Equipment
- Plasma surface treatment equipment
Developed for the purpose of achieving high uniformity and excellent reproducibility in the deposition of optical multilayer films!
- Sputtering Equipment
Ideal for research and development of advanced thin film devices. A customizable single-sheet ultra-high vacuum inline system. Responding to demands with a wealth of options and flexible support.
- Sputtering Equipment
- Plasma surface treatment equipment
Multi-functional, compact, flexible support, a standard lineup with proven results and trust.
- Sputtering Equipment
- Plasma surface treatment equipment
Support from research and development to mass production!
- Sputtering Equipment
- Printed Circuit Board
- Other semiconductors
A must-see for engineers considering new film formation methods! Fully automated film formation of metal films and protective films on resin substrates.
- Vacuum Equipment
- Sputtering Equipment
Compact, low-cost, and feature-rich, low-cost sputtering equipment for research and development. Sample testing and facility tours available.
- Sputtering Equipment