Optimal for dual-sided processes! Dual-sided automatic photoresist coating device - Coater
By using the wafer inversion unit, both sides of the wafer can be automatically coated!
This device allows for automatic processing of both sides of a wafer with just a single setup. Coating is performed on one side at a time, but using a flipping unit, resist is applied to both sides by the time the automatic operation is complete. The processing is carried out using optimized transport procedures for coating, baking, and flipping to ensure that wafer processing is not rate-limiting. It can accommodate both positive and negative resists, ranging from low to high viscosity. This product is equipped with spin coating, HMDS treatment, baking, and cooling functions. Since we handle everything from design to manufacturing and sales in-house, we have achieved a low price. We have a proven track record with a variety of chemicals, including polyimide, SOG, WAX, and silicone. 【Features】 ■ Achieves low cost ■ Automatically recognizes wafer size for processing ■ Proven track record with a variety of chemicals ■ Reduced footprint ■ Numerous options with minimal resist ■ Lineup tailored to production volume *For more details, please refer to the PDF document or feel free to contact us.
- Company:エイ・エス・エイ・ピイ
- Price:Other