F.A.S.T Solution
High-quality oxide, nitride, and metal films can be deposited with a high film formation rate!
"KOBUS-F.A.S.T" is a solution that achieves high-quality thin film deposition processing, not only through the F.A.S.T process that balances the coverage of ALD and the deposition rate of PECVD but also enables ALD deposition. It is used for applications involving base layer SiO2, barrier layer TiO2, and metal layers Cu, Co, or transparent conductive ZnOx with ALD and F.A.S.T high-rate deposition while maintaining good coverage. This is recommended for engineers who are exploring methods to improve deposition speed while maintaining film quality and coverage in ALD deposition. 【Features】 ■ A process that balances the coverage of ALD and the deposition rate of PECVD ■ ALD deposition is also possible with this equipment ■ Capable of high-quality deposition of oxides, nitrides, and metals with high deposition rates *For more details, please feel free to contact us.
- Company：プラズマ・サーモ・ジャパン
- Price：Other
