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Film forming equipment Product List and Ranking from 36 Manufacturers, Suppliers and Companies | IPROS GMS

Last Updated: Aggregation Period:Apr 01, 2026~Apr 28, 2026
This ranking is based on the number of page views on our site.

Film forming equipment Manufacturer, Suppliers and Company Rankings

Last Updated: Aggregation Period:Apr 01, 2026~Apr 28, 2026
This ranking is based on the number of page views on our site.

  1. Creative Coatings Co., Ltd. Tokyo//Electronic Components and Semiconductors
  2. プラズマ・サーモ・ジャパン Kanagawa//Electronic Components and Semiconductors
  3. JSWアフティ Tokyo//Electronic Components and Semiconductors
  4. 4 京浜ラムテック Kanagawa//Manufacturing and processing contract
  5. 5 栗田製作所 本社・京都事業部 Kyoto//Industrial Electrical Equipment

Film forming equipment Product ranking

Last Updated: Aggregation Period:Apr 01, 2026~Apr 28, 2026
This ranking is based on the number of page views on our site.

  1. RAM cluster-type sputtering deposition device 京浜ラムテック
  2. Low-temperature DLC film deposition device (multilayer a-C:H, hydrogen-containing Cr system) Creative Coatings Co., Ltd.
  3. Powder Low-Temperature (Room Temperature) ALD Film Deposition Device CMP-400 Creative Coatings Co., Ltd.
  4. 4 Plasma Ion Injection Film Deposition Device PBII-R1000 栗田製作所 本社・京都事業部
  5. 4 [Case Study on the Use of Conductive Diamond Technology] Decomposition of PFAS by Electrolytic Oxidation Method DIAM

Film forming equipment Product List

61~70 item / All 70 items

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Preparation of combinatorial composition gradient samples

It is possible to create composition gradient films of 2 yuan and 3 yuan! We will deposit functional materials used in various solid devices.

Since our establishment, we have received great acclaim for our unique service of creating thin film samples using combinatorial technology. We can produce single composition films of arbitrary compositions, as well as binary and ternary composition gradient films. We deposit functional materials used in various solid-state devices, such as thermoelectric materials, ferroelectrics, ferromagnets, battery electrodes, phase change memory materials, and intermetallic compounds. 【Features】 ■ Experienced technical staff to assist in the development of new functional materials ■ We use sputtering and PLD (Pulsed Laser Deposition) methods for thin film deposition ■ We can produce single composition films of arbitrary compositions, as well as binary and ternary composition gradient films *For more details, please refer to the PDF document or feel free to contact us.

  • Other contract services
  • Film forming equipment

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Ion Beam Etching and Deposition Device 'QuaZar(TM)'

Achieving high throughput! Large-area ion source and advanced motion control.

We would like to introduce our ion beam etching and deposition system, 'QuaZar(TM)'. With a large-area ion source and advanced motion control, it achieves high throughput. In particular, the Marathon(TM) grid allows for excellent uniformity over a long period compared to conventional methods. 【Specifications】 ■ Ion beam system ■ Process temperature: -40℃ to +60℃ ■ Tilt angle: +90 degrees to -80 degrees ■ Load lock or CtoC ■ Wafer sizes: 100mm, 150mm, 200mm * You can download the English version of the catalog. * For more details, please refer to the PDF document or feel free to contact us.

  • Etching Equipment
  • Film forming equipment

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Ion Beam Etching and Deposition Equipment 'QuaZar'

It is possible to reduce total ownership costs! Achieving top-class uniformity and throughput.

"QuaZar" is an etching and deposition device that achieves process results in challenging etching processes and thin film formation applications through a large-area ion source and advanced motion control. The Marathon grids technology of this product is a key element and can be installed in your existing systems. Many customers around the world have successfully improved the performance of their existing equipment with grid technology, extending its lifespan by more than double. 【Features】 ■ Uniformity <2% 3σ (200mm wafer), with scanning motion achieving <0.6% 3σ ■ Ion Source, Marathon Grid, and Dual PBN have doubled the MTBM compared to conventional systems and can be equipped on existing devices from other manufacturers ■ Clustering with our PVD, CVD, etc. is possible ■ 150mm, 200mm *For more details, please feel free to contact us.

  • Etching Equipment
  • Film forming equipment

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Tabletop Type Etching and Film Deposition Device 'Plasma POD Series'

For educational institutions and small facilities! A desktop system that allows for easy operation with a touch panel.

The "Plasma POD Series" is a small and compact tabletop etching and deposition device. It is recommended for those who have limited installation space and are considering the introduction of an etching and deposition device at a low cost. Please feel free to contact us if you have any inquiries. 【Features】 ■ Maximum device size: 80cm x 80cm x 80cm (height) ■ Easy operation with a touch panel * You can download the English version of the catalog. * For more details, please feel free to contact us.

  • Etching Equipment
  • Film forming equipment

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Damage-free ion beam film deposition solution "QuaZar"

The tilt/rotation function of the wafer stage allows for feature setting!

"QuaZar" is a damage-free ion beam deposition solution that enables a precise thin film deposition application through a large-area ion source and advanced motion control. The extension of maintenance cycles, including the application of our uniquely developed Marathon-grids technology, is a crucial factor for production and can also be installed in your existing systems. The target is sputtered by an ion beam with the set energy, allowing for a wide process window. 【Features】 ■ REDEP breaker that prevents short circuits in the ion source using RF shunting ■ Auxiliary electrode system that prevents anode loss in the ion source ■ Adoption of a virtual shutter that eliminates the need for a mechanical shutter, reducing particles ■ Dual PBN (optional) that integrates two neutralizers *For more details, please feel free to contact us.

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  • Film forming equipment

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Business Introduction: Thin-Film Solar Cells

Low cost and high productivity! With modular design, the equipment can be configured to meet customer requirements.

Our film deposition systems continue to set the standard for thin-film solar cells. PIA|nova and XENIA are advanced automated equipment platforms that adopt a modular approach for depositing back electrode layers, transparent conductive films (TCO), and various types of absorber layers such as CIGS and CdTe technologies. Through long-standing partnerships with thin-film solar cell manufacturers and the experience accumulated in the deposition of large glass substrates, we are driving down production costs while simultaneously improving conversion efficiency. 【Other Businesses (Partial)】 ■ Glass deposition for building materials and mobility ■ Crystalline solar cells ■ Flexible substrates ■ Special applications ■ Modular process systems *For more details, please refer to the PDF document or feel free to contact us.

  • Other electronic parts
  • Wafer
  • Film forming equipment

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Large panel deposition system CLUSTERLINE 600

Higher productivity for PLP! More process possibilities. Optimized for advanced packaging.

The "CLUSTERLINE600" is a PVD deposition system specialized for large panels. All platforms share a cluster architecture equipped with cassette-to-cassette processing and fully automated processing. 【Chamber Configuration】 ■ Degassing Chamber ■ Ion Etching ■ Ti Sputtering ■ Cu Sputtering *For more details, please download the PDF (English version) or feel free to contact us.

  • Sputtering Equipment
  • Etching Equipment
  • Film forming equipment

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Retrofitting services for existing equipment.

From site surveys to design and construction, experienced engineers will handle it!

We will introduce advanced film deposition technology while making the most of your existing equipment. This is ideal for companies that want to upgrade performance while keeping their current facilities as they are. We also handle the import and sale of overseas equipment, and even first-time representatives can consult with us confidently through careful hearings and on-site investigations. Additionally, we sell our own sputtering deposition sources and engage in the import and sale of overseas products. 【Service Content】 ■ Achieve cost reduction, extend equipment life, and improve performance ■ Considerate planning for on-site operations ■ Direct support from technicians who are well-versed in the actual equipment ■ Tailored designs to meet customer challenges *For more details, please download the PDF or feel free to contact us.

  • Other electronic parts
  • Sputtering Equipment
  • Film forming equipment

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Low-temperature DLC film deposition device (multilayer CrN/TiAIN, hydrogen-containing Ti-based)

Multi-layer film formation enables the creation of low-temperature DLC (Diamond-like carbon) thin film hard coatings with improved impact resistance!

High-density and stable high-quality film formation is possible! By performing DLC film formation that is highly hard (wear-resistant), has a low friction coefficient (wear-resistant), is corrosion-resistant, adhesion-resistant, and smooth, we contribute to the longevity of mold parts for semiconductor manufacturing equipment, resin molding molds, sliding parts, and tools. This is not only optimal for customer cost reduction but also for reducing maintenance work hours such as cleaning tasks and improving operations. It is also possible to achieve "strong adhesion, smooth & hard low-temperature DLC film formation" for three-dimensional ultra-precise complex-shaped molds and machine parts. In addition to improving high hardness and wear resistance, we also accept "peeling treatment and re-coating," contributing to the reduction of product lifecycle costs and material waste, thus reducing environmental impact. ++++++++++++++++++++++++++++++ DLC stands for Diamond-Like Carbon, which refers to a hard thin film coating with good sliding properties that possesses intermediate characteristics between diamond and graphite. By adjusting the ratio of SP3 (diamond bonds) to SP2 (graphite bonds) and the ratio of H (hydrogen) contained within, as well as by applying multilayer coatings, it is possible to create thin films with various physical properties and characteristics (industrial value).

  • Plasma surface treatment equipment
  • Surface treatment contract service
  • Other semiconductor manufacturing equipment
  • Film forming equipment

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[Case Study on the Use of Conductive Diamond Technology] Decomposition of PFAS by Electrolytic Oxidation Method

Decomposition of PFAS through electrochemical oxidation using the power of diamonds.

Chemically stable and considered difficult to decompose, organic fluorine compounds (PFAS). The method we propose for their treatment is an electrochemical decomposition method using diamond electrodes. The extensive potential window of diamond electrodes efficiently generates reactive species such as ozone (O₃) and hydroxyl radicals (•OH), which have extremely strong oxidative power during the electrolysis of water. These reactive species strongly attack and cleave the chemical bonds of PFAS, breaking them down into harmless substances. Additionally, when sulfuric acid is used as the electrolyte, peroxodisulfate (S₂O₈²⁻) is generated due to the action of the diamond electrode. This powerful oxidizing agent has also been reported in recent studies to significantly contribute to the decomposition of PFAS, attracting attention.

  • Company:DIAM
  • Price:Other
  • Other water treatment
  • Film forming equipment

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