Temperature control stage with stirrer for semiconductor thin film formation
It is possible to maintain temperature while stirring within a range of -10℃ to 80℃.
In the semiconductor industry, temperature management is crucial for achieving uniform film thickness and high-quality thin films during the thin film formation process. In particular, controlling the temperature of the reaction solution has a significant impact on the crystallinity and composition of the thin film, which in turn affects the performance of the product. If the temperature is uneven or control is unstable, the quality of the thin film may deteriorate, potentially leading to a decrease in yield. A temperature-controlled stage with stirring capability allows for precise temperature control while enabling the stirring of liquids, contributing to the improvement of quality in the thin film formation process. 【Application Scenarios】 - Temperature control of the reaction solution in thin film formation - Stirring and temperature management of precursor solutions - Optimization of the film formation process 【Benefits of Implementation】 - Improved uniformity of thin films - Enhanced reproducibility of the film formation process - Improved yield
- Company：Nippon Blower Co.,LTD.
- Price：100,000 yen-500,000 yen
