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stage Product List and Ranking from 124 Manufacturers, Suppliers and Companies | IPROS GMS

Last Updated: Aggregation Period:Mar 18, 2026~Apr 14, 2026
This ranking is based on the number of page views on our site.

stage Manufacturer, Suppliers and Company Rankings

Last Updated: Aggregation Period:Mar 18, 2026~Apr 14, 2026
This ranking is based on the number of page views on our site.

  1. PI Japan Kanagawa//Electronic Components and Semiconductors
  2. 神津精機 Kanagawa//Optical Instruments
  3. ミラック光学 Tokyo//Testing, Analysis and Measurement
  4. 4 シグマ光機 Tokyo//Testing, Analysis and Measurement
  5. 5 オーテックス Tokyo//Electronic Components and Semiconductors

stage Product ranking

Last Updated: Aggregation Period:Mar 18, 2026~Apr 14, 2026
This ranking is based on the number of page views on our site.

  1. Reproducibility of up to 0.1μm! High-precision linear stage, 1-axis L-836. PI Japan
  2. Positioning accuracy inspection of general machine tools. 高橋レーザー計測 高橋レーザー計測
  3. Ultra-high precision 6-axis alignment stage "RSTZ Series" 神津精機
  4. 4 Ultra-thin XYθ (alignment) stage "NAF3C series" ヒーハイスト 本社・埼玉工場
  5. 4 Rotary Pump DUO Series / 2-Stage Type 伯東 本社

stage Product List

631~660 item / All 713 items

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Temperature control stage with stirrer for the energy sector

It is possible to maintain temperature while stirring within a range of -10℃ to 80℃. Insulation material set included.

In the research and development of catalytic reactions in the energy sector, precise control of the reaction temperature is a crucial factor that influences reaction efficiency and product quality. Particularly, even slight fluctuations in reaction temperature can significantly affect reaction rates and selectivity, making accurate temperature management essential. This product enhances the uniformity of reactions and enables highly reproducible experiments by maintaining a constant temperature while stirring the reaction mixture. 【Application Scenarios】 - Research and development of catalytic reactions - Experiments requiring precise control of reaction temperature - Reactions that demand a uniform temperature distribution 【Effects of Implementation】 - Improved reaction efficiency - Stabilization of product quality - Enhanced reproducibility of experiments

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  • Stirrer
  • stage

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Vacuum-compatible 5nm feedback stage system

For positioning applications within a vacuum chamber, built-in linear encoder enables positioning with a resolution of 5nm and a maximum movement range of 50mm.

An ultra-high-resolution positioning device (feedback stage system) has achieved a resolution of 5nm and a reproducibility of ±10nm for optical linear encoders. It can be used in a vacuum chamber with a vacuum level of 10^-4 Pa. Compared to positioning devices that utilize piezo technology, it is utilized in a wide range of applications due to its "low cost," "easy control," and "large stroke capability." The available strokes are "20mm," "40mm," and "50mm." If you are facing challenges with positioning, please feel free to contact us. ■ For more details, please download the catalog or contact us.

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Vacuum-Compatible Submicron Feedback Stage System

For positioning applications within a vacuum chamber, positioning with sub-micron resolution, maximum movement range of 100mm.

A precision positioning device (feedback stage system) has achieved reproducibility with sub-micron resolution (0.1μm or 0.05μm) using an optical linear encoder built into the stage. It can be used within a vacuum chamber with a vacuum level of 10^-4 Pa. Compared to positioning devices that utilize piezo technology, it is widely used due to its "low cost," "easy control," and "large stroke capability." The stroke ranges from 20mm to 100mm. If you are facing issues with positioning, please feel free to contact us. For more details, please download the catalog or contact us.

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10nm Feedback Stage FS-3150X/XY

"Precision positioning device" with high resolution, excellent positioning reproducibility, and strong position retention after positioning!

This is a high-resolution positioning stage with an optical linear scale built into the center of the stage to reduce detection errors. It has a stroke of 150mm with a resolution of 10nm (*1). Thanks to our in-house developed linear scale and unique feedback control circuit, it offers high resolution, excellent positioning repeatability, and position retention after positioning. (*1) In combination with the feedback stage controller FC-511.

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10nm Feedback Stage FS-3200X/XY

"Precision positioning device" with high resolution, excellent positioning repeatability, and strong position retention after positioning!

This is a high-resolution positioning stage with an optical linear scale built into the center of the stage, reducing detection errors. It has a stroke of 200mm with a resolution of 10nm (*1). Thanks to our in-house developed linear scale and unique feedback control circuit, it offers high resolution, excellent positioning repeatability, and position retention after positioning. Equipped with a slowdown sensor, it minimizes the impact during stops at the stroke end. (*1) In combination with the feedback stage controller FC-514.

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Vacuum-compatible 5nm feedback stage, 50mm operation.

High-performance positioning stage with 5nm resolution, high reproducibility, and high retention that can be used in a vacuum.

This is a vacuum-compatible feedback stage equipped with exhaust gas countermeasures. It can be directly introduced into a vacuum chamber. It features a built-in linear scale developed in-house, allowing for a slim and lightweight design, as well as high-precision repeat positioning performance through full closed-loop control. It can operate with a 50mm stroke at a resolution of 5nm.

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Vacuum-compatible 5nm feedback stage, 40mm operation

High-performance positioning stage with 5nm resolution and 40mm travel, usable in a vacuum.

This is a vacuum-compatible feedback stage equipped with exhaust gas countermeasures. It can be directly introduced into a vacuum chamber. It has a built-in linear scale developed in-house, providing high-precision repeat positioning performance through full closed-loop control. It can operate with a 40mm stroke at a resolution of 5nm.

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Vacuum-compatible 5nm feedback stage with 20mm operation.

High-performance positioning stage with 5nm resolution using a linear encoder, usable in a vacuum.

Since the positioning stage is equipped with outgassing countermeasures, it can be directly introduced into the vacuum chamber. It features full closed-loop control based on the position information from the built-in optical linear encoder, providing high-precision repeatability in positioning performance. It can operate with a 20mm stroke at a resolution of 5nm.

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Vacuum-compatible 10nm feedback stage, 40mm operation

High-performance positioning stage operating in a 40mm range with 10nm resolution for vacuum applications.

This is a vacuum-compatible feedback stage equipped with exhaust gas countermeasures. It can be directly introduced into a vacuum chamber. It features full closed-loop control based on the positional information from an integrated optical linear encoder, providing high-precision repeatability in positioning performance. It can operate with a 40mm stroke at a resolution of 10nm.

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Vacuum-compatible 10nm feedback stage, 100mm operation

Long stage with built-in linear encoder capable of 10nm resolution, usable in a vacuum.

This is a vacuum-compatible feedback stage equipped with outgassing countermeasures. It can be directly introduced into a vacuum chamber. It has a built-in optical linear encoder, and based on the position information detected by the encoder, it performs full closed-loop control, providing high-precision repeat positioning performance. With a movement range of 100mm, it allows for sample movement and precise positioning with a single unit, making it effective when a wide range of data (such as spectra) is required.

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Vacuum-compatible 10nm feedback stage, lifting type

Vacuum-compatible positioning stage for the Z-axis with a built-in linear encoder and 10nm resolution.

This is a high-resolution Z-axis positioning stage equipped with an optical linear encoder. It offers a resolution of 10nm with stroke options of 5mm or 10mm. It has been designed to mitigate outgassing, making it usable in a vacuum. The structure minimizes changes in the tilt of the table surface, and with our proprietary linear encoder and unique feedback control circuit, it provides high resolution, excellent positioning repeatability, and position retention after positioning.

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Vacuum-compatible 10nm feedback stage, micro-rotation type

Micro-rotation stage with an encoder that operates with a minimum resolution of 0.00001° and ±4° in vacuum conditions.

This is a high-resolution micro-rotation stage equipped with an optical linear encoder. It has a resolution of 0.00001° and a stroke of ±4°. It has been treated for outgassing and can be used in a vacuum. It is suitable for adjusting the rotation direction.

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