更新日： 集計期間:Jul 16, 2025～Aug 12, 2025
※当サイトの各ページの閲覧回数を元に算出したランキングです。
更新日： 集計期間:Jul 16, 2025～Aug 12, 2025
※当サイトの各ページの閲覧回数を元に算出したランキングです。
更新日： 集計期間:Jul 16, 2025～Aug 12, 2025
※当サイトの各ページの閲覧回数を元に算出したランキングです。
1～15 件を表示 ／ 全 22 件
Non-destructive line measurement of film and sheet thickness.
First of all, each device component is designed to be simple, allowing us to introduce customized packaging that meets the needs of each customer, which is also optimal for cost reduction. We have adopted a highly reliable measurement calculation method called FFT, so you can collect data with confidence.
Measurement device that enables the use of IR reflectance measurement heads! Achieves high-throughput measurement of epitaxial film thickness.
The "EIR-2500" is a unique epitaxial film thickness measurement device equipped with an infrared spectroscopic reflectometer and FTIR functionality. It achieves high-throughput epitaxial film thickness measurements and fully complies with applicable SEMI/CE standards. Additionally, the EIR product series is based on high-performance and reliable electronic components, improving equipment uptime and reducing maintenance needs. 【Features】 ■ Wafer size: 4 to 12 inches ■ Materials: Si, SOI, SiC, SiGe, III-V, etc. ■ FTIR functionality ■ High-precision measurement of epitaxial film thickness ■ Measurement of film thickness in the transition region *For more details, please refer to the related link page or feel free to contact us.
No sample adjustment needed! You can measure the coated sample as it is.
The "Auto Crater" is a testing machine that measures film thickness by polishing samples with a rotating steel ball and measuring the polishing marks using optical microscopes and other methods. Sample preparation for cross-section creation, such as cutting, polishing, and resin embedding, is not required. The coated samples can be measured as they are. Additionally, by using chemical treatments to change the composition of the film, the thickness of each layer can be evaluated based on differences in color tone. 【Features】 ■ No sample preparation required ■ Direct measurement of coated samples ■ Evaluation of multilayer films possible ■ Fully domestically produced *For more details, please refer to the PDF materials or feel free to contact us.
Maintains high precision and outstanding stability! Used in various fields and has gained immense trust.
We handle the "thickness measurement device" manufactured by Helmut Fischer. Because it is accurate, it helps reduce waste of paint. It can measure the correct purity of expensive materials such as gold and silver. It is non-contact, has a fast response time, and allows for continuous measurement. 【Features】 ■ Accurate, thus reducing "waste of paint" ■ Can measure the correct purity of "expensive materials" such as gold and silver ■ Non-contact with a fast response time, enabling continuous measurement ■ Easy to use and measurable by anyone *For more details, please refer to the PDF document or feel free to contact us.
High-performance thickness gauge that meets the on-site needs for film thickness measurement.
Measurement of various products such as disks, printed circuit boards, and electronic devices is possible!
Eliminate the issues of film thickness measurement in the coating process!
High-performance film thickness inspection equipment that meets the on-site needs for plating thickness measurement.
USB Simple Film Thickness Measurement Device
It measures optical film thickness from 300nm to 30μm (100μm) with good reproducibility, which was not possible with conventional contact methods.
Film thickness measurement device capable of measuring film thickness on wafer glass substrates and mirror substrates.
The "LF-1000" is a non-contact automatic film thickness measurement device equipped with a spectrometer and optical interference film thickness analysis software, enabling film thickness measurement by setting various parameters. This analysis software allows for non-contact automatic measurement and mapping of the thickness, refractive index, and absorption coefficient of transparent or translucent thin films by analyzing the interference waveforms from the surface of the thin film and the interface with the substrate. 【Features】 - Capable of measuring film thickness not only on wafers and glass substrates but also on other mirror-like substrates. - Various film thickness measurements can be performed by setting the optical constants of the film. - Excellent for measuring thin film oxide layers, SOI, EG films, color filters, etc. - Comes with an auto stage compatible with standard 3, 4, 5, 6, 8, and 12-inch wafers. - Loader specifications can also be accommodated as an option (consultation available for cassette/FOUP and number of ports). - Capable of measuring film thickness from thin films to thick films depending on the measurement head specifications. - GEM communication is optional. *For more details, please refer to the PDF materials or feel free to contact us.
