List of CVD Equipment products
- classification：CVD Equipment
1～45 item / All 270 items
A film deposition platform for semiconductor wafers and advanced packaging capable of various film deposition treatments.
- Sputtering Equipment
- Etching Equipment
- CVD Equipment
Meeting the high cleanliness standards required in the semiconductor and medical device fields. We carry out everything from precision cleaning to packaging and assembly in a consistent clean environm...
- CVD Equipment
- Sputtering Equipment
- Resist Device
There is a track record of growing nitride semiconductor crystals on various semiconductor substrates. Customization is also possible according to your requests.
- CVD Equipment
- LED Module
- Wafer
High-performance vacuum equipment customizable to meet customer needs.
- CVD Equipment
TiC treatment and TiCN treatment are possible! It can be used under harsher conditions than PVD treatment.
- CVD Equipment
Adopting a unique LIA method plasma source, we achieve ultra-fast, high-quality vacuum deposition on resin films and metal foils!
- CVD Equipment
Adopting a unique LIA method plasma source, we achieve ultra-fast, high-quality vacuum deposition on flat substrates such as glass and metal!
- CVD Equipment
With a space-saving design, the vacuum pump module can be installed up to 18 meters away from the process module.
- CVD Equipment
Demo available at our company! New technology launched in the market. CVD with atmospheric pressure plasma. Capable of handling small quantities and a variety of products.
- CVD Equipment
- Other painting machines
- Other processing machines
Silicon nitride, which has heat resistance and excellent thermal shock resistance, is a material with strong mechanical strength and good balance.
- Fine Ceramics
- CVD Equipment
- Heating device
Equipped with a flow management system! Processing of powders at high temperatures using CVD/PECVD is possible.
- CVD Equipment
Various plasma sources can be equipped! Customized design for CVD, MOCVD, and ALD equipment.
- CVD Equipment
The maximum film-forming temperature is 800°C! It can accommodate up to 4x DLI evaporators with the chamber heating mechanism.
- CVD Equipment
Compatible with SI 500-1M, SI 500 PPD-1M, etc.! The transport chamber is available in three types.
- CVD Equipment
Control of ion density by ICP power! Achieving low-temperature film formation, low damage, and high conformality.
- CVD Equipment