List of Semiconductor Manufacturing Equipment products

Presentation of explanatory materials on JIS and ISO standards. We propose suitable safety barriers from a rich product series! Free rental of demo kits.

• Other safety and hygiene products

You can download a free booklet that introduces the uses, structures, and examples of various types of frames.

• Other machine tools
• Solar power generator
• Other energy equipment

Equipped with a flow management system! Processing of powders at high temperatures using CVD/PECVD is possible.

• CVD Equipment

Various plasma sources can be equipped! Customized design for CVD, MOCVD, and ALD equipment.

• CVD Equipment

Minimize radioactive contamination! Capable of proposing plasma excitation technology tailored to specific applications.

• Ion implantation equipment

We propose fine processing technology for next-generation package substrates using KrF excimer lasers!

• Other semiconductor manufacturing equipment

Metal, dielectric, and organic film deposition! Introducing the thermal evaporation device.

• Evaporation Equipment

The maximum film-forming temperature is 800°C! It can accommodate up to 4x DLI evaporators with the chamber heating mechanism.

• CVD Equipment

Due to lamp heating, RTP and RTCVD processing is possible! Quartz tube-type chamber.

• Annealing furnace

Turbo pump compatible! Low temperature (1100°C) / high temperature (1300°C) pyrometer.

• Annealing furnace

Supports a maximum substrate size of 156mm x 156mm! Compatible with vacuum or atmospheric transport systems and can be equipped with a load lock.

• Annealing furnace

Rapid cooling mechanism after annealing! Introducing the high-speed heat treatment equipment from Annealsys.

• Annealing furnace

Compatible with SI 500-1M, SI 500 PPD-1M, etc.! The transport chamber is available in three types.

• CVD Equipment

Control of ion density by ICP power! Achieving low-temperature film formation, low damage, and high conformality.

• CVD Equipment

High-selectivity etching! Optimization of radical supply by adjusting the spacing between the ICP source and the substrate electrode.

• Other semiconductor manufacturing equipment

Top-class throughput! Flexible modular design.

• Other semiconductor manufacturing equipment

Many safety measures specifications necessary for mass production! Compact device size with a film formation temperature of 50 to 285°C.

• Other semiconductor manufacturing equipment

500℃ wafer stage! Adoption of a remote ICP source with no plasma damage.

• Other semiconductor manufacturing equipment

For research and development, for small-scale batches! Standard equipped with a simple decontamination unit ALD Shield Vapor Trap.

• Other semiconductor manufacturing equipment

Substrate bias mechanism! Introducing our microwave PECVD/etching equipment.

• Etching Equipment

Introducing the ion beam sputtering device equipped with a maximum of 5 targets (220mm diameter) or 4 targets (300mm diameter)!

• Sputtering Equipment

Maximum 200mm diameter substrate! Double ring magnetron (Fraunhofer FEP)

• Sputtering Equipment

Mechanical clamp or electrostatic chuck compatible! Sub-nanometer etching mechanism.

• Etching Equipment

Supports wafers up to 150 or 200 mm! Etching angle and stage tilt/rotation mechanism.

• Etching Equipment

Interlock covers are also available! We have achieved further efficiency in polishing operations.

• Wafer processing/polishing equipment
• Other processing machines

Ideal for sample preparation for research and development! Successfully reduced vibration and noise significantly.

• Wafer processing/polishing equipment
• Other processing machines

High-precision angular bearings are adopted as the main axis! Achieving a flatness accuracy of ±10μm on the reference table.

• Wafer processing/polishing equipment
• Other processing machines

We offer a wide range of products, including vacuum chuck holders and adhesive holders!

• Wafer processing/polishing equipment
• Other processing machines
• Other machine elements

High-precision and high-efficiency polishing technology! A comprehensive catalog of precision polishing equipment is available as a gift.

• Wafer processing/polishing equipment

We will introduce a wide variety of grinding wheels, from fixed abrasive wheels to free abrasive wheels and polishing cloths.

• CMP Equipment
• Wafer processing/polishing equipment
• Other processing machines

More economical than manually spraying diamond liquid onto the grinding wheel! Introducing the automatic spraying device.

• Wafer processing/polishing equipment
• Other processing machines
• Other physicochemical equipment

There is no edge sagging, and there are no detachments of foreign substances, making it suitable for evaluation using methods such as EPMA!

• Wafer processing/polishing equipment
• Other processing machines