List of Semiconductor Manufacturing Equipment products
- classification:Semiconductor Manufacturing Equipment
1081~1125 item / All 5067 items
For those who have isolators. Achieving high chemical resistance and workability. Low cost and short delivery times are also possible for glove box and isolator gloves.
- Work gloves
Notice of participation in 'INTERPHEX Week Tokyo' from May 20 (Wednesday) to May 22 (Friday), 2026.
Ito Corporation will be exhibiting at "INTERPHEX Week Tokyo" held at Makuhari Messe. This exhibition is the largest in Japan, showcasing a wide range of products and services related to the research and manufacturing of pharmaceuticals, cosmetics, and regenerative medicine from 25 countries and regions around the world. Pharmaceutical and cosmetic manufacturers, as well as regenerative medicine companies, will be attending from all over the globe. We will be showcasing "Gloves for Glove Boxes/Isolators" manufactured by Tron Power. We look forward to your visit.
From simple window cutouts to intricate design patterns, a variety of applications are possible.
- Etching Equipment
A high-output, high-stability LED light source device capable of mounting multiple modules of the same wavelength. Maximum high-power UV output of 80W, mercury-free.
- Stepper
- Other semiconductor manufacturing equipment
SEMICON Japan 2024 Exhibition
Event Date: December 11 (Wednesday) to December 13 (Friday), 2024 Venue: Tokyo Big Sight, East Exhibition Hall, Hall 7 Featured Products: - Mask aligners, peripheral exposure, high-output LED irradiation devices for steppers - Semiconductor surface inspection equipment - High-spectral camera capable of video recording - Compact spectrometer - LPP-EUV light source - Laser-excited white light source (190–2500nm) - Ultra-high sensitivity CCD camera for VUV and X-ray regions - Plasma source - SC light source (supercontinuum light source)
You can attach three types of targets simultaneously! It is possible to create a multilayer film.
- Coater
Equipped with three sources of cathodes in a compact tabletop size. It is also possible to produce insulating thin films, oxide, and nitride thin films.
- Sputtering Equipment
Optimal for sample preparation for SEM! It is the most compact coater in the series.
- Coater
Adoption of an easy-to-operate TMP exhaust system! A tabletop vacuum deposition device with excellent expandability.
- Evaporation Equipment
Ideal for sample preparation for scanning electron microscopy! It eliminates the hassle of sample preparation.
- Coater
A simple pursuit of a coat; it can be easily operated with just one button.
- Coater
A simple structure that anyone can handle! A rotary barrel polishing machine that can polish various materials and shapes.
- Wafer processing/polishing equipment
Micro-capacity inspection with high resolution! Capable of inspecting various products such as thin-film RF filters and accelerometers.
- Tester
Overall alignment accuracy ±2.5μm! Inspection equipment for large individual pieces/quarter panels.
- Semiconductor inspection/test equipment
LUL can provide proposals tailored to your specifications! We accommodate a variety of automation requirements.
- Semiconductor inspection/test equipment
Double table/shuttle type! Inspection equipment for FC-CSP/large individual chip substrates.
- Semiconductor inspection/test equipment
IC multi-function inspection support! Equipped with an LCR meter developed in-house.
- Tester
Compatible with flat cables! Equipped with automatic mechanisms, manual mechanisms, and desktop mechanisms, etc.
- Tester
TELEMARK Electronic Gun Series
- Vacuum Equipment
- Other physicochemical equipment
- Evaporation Equipment
TELEMARK Electronic Gun Series
- Vacuum Equipment
- Other physicochemical equipment
- Evaporation Equipment
TELEMARK Electronic Gun Series
- Other surface treatment equipment
- Vacuum Equipment
- Evaporation Equipment
Leave vacuum deposition, such as electron guns for evaporation, to us.
- Vacuum Equipment
- Other physicochemical equipment
- Evaporation Equipment
We provide the ideal ion source for ion assist deposition.
- Evaporation Equipment
- Other physicochemical equipment
- Vacuum Equipment
Information on major suppliers! Sputtering target market and supply chain.
- Sputtering Equipment
Information on the dynamics of the semiconductor-related CMP ancillary market.
- CMP Equipment
Minimizes scattering with a unique spiral structure, achieving sharp edges and a masking-free coating.
- Coater
Simultaneously smooth out tiny bumps and remove relatively large bumps to achieve a glossy finish!
- Wafer processing/polishing equipment
A fiber-type device that radiates laser light over a wide area has appeared!
- Oxidation/Diffusion Device
Electronic Patent Technology Trend Survey Report on Thermal Management of SiC/GaN High-Temperature Semiconductors
- Other semiconductor manufacturing equipment
Supports liquids up to 100,000 CPS! We have a proven track record of spraying various products such as syringes and catheters.
- Coater
- Filling and bottling machines
- Other pumps
Easily replace with a cable swap for signals! Display the plasma display on an LCD display!
- Other semiconductor manufacturing equipment
A spin sheet device that can obtain high-quality substrates at a low cost.
- Other semiconductor manufacturing equipment
It is possible to select an optimal acceleration based on the viscosity of the resist coating agent! We also pay attention to maintainability.
- Photomask
Of course, the airflow control inside the chamber, along with the excellent maintainability of the resist spin coat unit.
- Photomask
Consistent processing of photolithography is possible.
- Photomask
Practical application of ultrasonic ultrasonic technology mounted on a spin sheet device!
- Semiconductor inspection/test equipment
Significant reduction in footprint and purchase costs, increased throughput, and substantial improvement in substrate quality.
- Other semiconductor manufacturing equipment
It is a long-selling model with cumulative sales of over 200 units in the series.
- Other semiconductor manufacturing equipment
During scanning, uniformity improvement through peripheral speed control is also possible! We have received numerous uses and have a wealth of experience compared to conventional methods.
- Etching Equipment
We will introduce the new model of the automatic scrub cleaning device for mass production, as well as the photo mask cleaning device with a cumulative total of over 200 units in the series.
- Other semiconductor manufacturing equipment
I want to shave, but I don't want to shave too much! If you have such concerns, our unique abrasive material, which combines moderate softness with strong resilience, will solve your problem!
- Wafer processing/polishing equipment
Explanation of various wheels! We also answer questions by application【Free Q&A collection】.
- Hand polishing and filing
- Other abrasives
- Wafer processing/polishing equipment
Easily achieve communication tests for 1553 signals! DBT300 Network Tester
- Tester
It is a high-performance vacuum deposition source that can be used as a high-temperature heating cell for vacuum applications, with an organic deposition source up to 800°C and a metal deposition sour...
- Evaporation Equipment
- Heating device
- Electric furnace
★☆★☆【MiniLab-026】Small Thin Film Experimental Device for R&D Development★☆★☆
This is a flexible thin film experimental device for R&D that eliminates waste by integrating the necessary minimum modules and controllers into a 19" compact rack with a Plug & Play feel, achieving compact size, space-saving design, simple operation, and high cost performance. It supports magnetron sputtering (up to 3 sources) or resistance heating evaporation (metal sources up to 2, organic materials x4), and can also be equipped with a substrate heating stage, allowing for the production of annealing devices and RF etching. There is also a glove box storage type available (specifications to be discussed). We offer a wide range of optional components that can be flexibly customized. ◉ Φ2 inch magnetron cathode (up to 3 sources) ◉ Resistance heating evaporation source filament, crucible, boat type (up to 4 poles with automatic switching via controller) ◉ Organic evaporation cell: 1cc or 5cc ◉ Glove box compatible (optional, specifications to be discussed) ◉ Other options: simultaneous film deposition, HiPIMS, automatic film deposition controller, custom substrate holders, load lock, substrate rotation/heating/cooling, and many more options available. *Please first contact us with your required specifications, and we will configure the system to meet your needs.
<30W Low power - Etching control precision 10mW Achieving damage-free and delicate etching processing.
- Etching Equipment
★☆★☆【MiniLab-026】Small Thin Film Experimental Device for R&D Development★☆★☆
This is a flexible thin film experimental device for R&D that eliminates waste by integrating the necessary minimum modules and controllers into a 19" compact rack with a Plug & Play feel, achieving compact size, space-saving design, simple operation, and high cost performance. It supports magnetron sputtering (up to 3 sources) or resistance heating evaporation (metal sources up to 2, organic materials x4), and can also be equipped with a substrate heating stage, allowing for the production of annealing devices and RF etching. There is also a glove box storage type available (specifications to be discussed). We offer a wide range of optional components that can be flexibly customized. ◉ Φ2 inch magnetron cathode (up to 3 sources) ◉ Resistance heating evaporation source filament, crucible, boat type (up to 4 poles with automatic switching via controller) ◉ Organic evaporation cell: 1cc or 5cc ◉ Glove box compatible (optional, specifications to be discussed) ◉ Other options: simultaneous film deposition, HiPIMS, automatic film deposition controller, custom substrate holders, load lock, substrate rotation/heating/cooling, and many more options available. *Please first contact us with your required specifications, and we will configure the system to meet your needs.
◉ Short time: Easily conduct graphene synthesis experiments in just 30 minutes per batch. ◉ High-precision temperature and pressure control. ◉ Sophisticated software.
- CVD Equipment
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
Introduction of various experimental devices for research and development in semiconductors, electronic devices, fuel cells, displays, and thin film experiments.
- Sputtering Equipment
- Evaporation Equipment
- Annealing furnace
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.