See Semiconductor Manufacturing Equipment's detailed category ranking
- CVD Equipment
- Sputtering Equipment
- Annealing furnace
- Coater
- Resist Device
- Oxidation/Diffusion Device
- Stepper
- Etching Equipment
- Ion implantation equipment
- Ashing device
- Evaporation Equipment
- Electron beam lithography equipment
- Tester
- Semiconductor inspection/test equipment
- Wafer processing/polishing equipment
- Molding Equipment
- Bonding Equipment
- CMP Equipment
- Photomask
- Other semiconductor manufacturing equipment
Perfect for creating high-precision samples! We are currently giving away a technical book that reveals the best polishing conditions, leading to process reduction and improved accuracy!!
Contributes to the efficiency and quality improvement of semiconductor manufacturing processes. Since there are no specialized parts, maintenance is easy, allowing for quick recovery. It achieves low costs.
If you're looking for low-cost, high-performance semiconductor IC testers, choose CCTECH. We're revealing the reasons why we can provide extensive support!
3D metal powder molded parts with complex shapes, R shapes, and spiral shapes can be polished to a mirror finish, even with fine pores!
An automatic polishing machine specialized for "reproducibility"! It is a single unit that also excels in maintainability.
2018 edition of the NFPA-approved Japanese version materials. A sample version including up to Chapter 3 is available for free.
A semiconductor collet with faster defect detection, higher visibility, and consideration for scratches on the chip.
Using a UV-LED with a wavelength of 365nm, at room temperature irradiation, with low running costs!
Visualize surface foreign substances, dirt, and scratches! It is well-received as a daily management tool for yield management, quality control, cleaning management, and hygiene management. *Demo units available for loan.
Far superior in corrosion resistance and plasma resistance compared to protective films created by thermal spraying or aerosol deposition! Yttrium oxide produced by a unique ion-assisted deposition method.




































































































































