See Semiconductor Manufacturing Equipment's detailed category ranking
- CVD Equipment
- Sputtering Equipment
- Annealing furnace
- Coater
- Resist Device
- Oxidation/Diffusion Device
- Stepper
- Etching Equipment
- Ion implantation equipment
- Ashing device
- Evaporation Equipment
- Electron beam lithography equipment
- Tester
- Semiconductor inspection/test equipment
- Wafer processing/polishing equipment
- Molding Equipment
- Bonding Equipment
- CMP Equipment
- Photomask
- Other semiconductor manufacturing equipment
Safe and efficient semiconductor wafer transport containers! A wide lineup is available. Compatible with various wafer sizes.
We deliver products that make life simpler and more comfortable.
A light curing device that can dry and bake only the surface area without damaging substrates with low heat resistance!
A new temperature management system that combines "efficiency" and "savings."
Introducing the comprehensive catalog of the pioneer of laminators, the MCK Laminator!
The introduction of a ceramic transport hand for the atmosphere that minimizes particle generation risk to the extreme!
Experimental device equipped with an ion source, applicable for ultra-thin film multilayer deposition in precision optics.
We are publishing new data on the non-bosch process for silicon.
Installation of an inverter is also possible! A buffing machine suitable for bench work with a low spindle center height.
High-speed maskless aligner capable of fine drawing at 0.6μm.
The O-ring cherry seal molds O-rings of various sizes according to the AS568 standard (aerospace standard) and other specifications, using a wide variety of materials.
A sturdy and beautifully finished ABS resin casing! Capable of grinding and polishing various samples.
Cleaning sheets for probe cards in the semiconductor wafer inspection process!
Achieving high-precision coating on a lab scale. Compatible with a variety of materials in the experimental and prototype stages, from low viscosity to high viscosity.
Featuring the latest products from Tokyo Electron Kyushu, a leading company in semiconductor manufacturing equipment!
Patent obtained! The original detachable frame system by Sun Kogei allows for one-touch installation and removal of metal masks!
Ideal for collecting fallen or adhered foreign objects.
Automatic cleaning of Laura Belt's dirt! Safe, fast, clean, and reduced yield loss.
Injection into various products from semiconductors to medical applications is possible! Suitable for Si, SiC, GaN, etc.!
A versatile dry etching device boasting hundreds of successful installations.
Introducing a full-scale production device equipped with a vacuum cassette chamber, offering excellent process reproducibility and stability.
Value Impact Co., Ltd. offers value in "connecting." We provide tube fittings used for vacuum piping and high-pressure gas piping.
Free circular coating with a unique slit die! A new product has arrived to replace the Spiral Coater!
The full coating process proceeds in a completely sealed state! A CED coater utilizing the latest advanced technology.
We will design and manufacture the fixtures according to the specifications and requirements of the existing plating equipment.
Far superior in corrosion resistance and plasma resistance compared to protective films created by thermal spraying or aerosol deposition! Yttrium oxide produced by a unique ion-assisted deposition method.
Multi-purpose fully automatic screen printing machine
Solving issues such as storage and supply stability, wettability, and heat resistance! Next-generation environmental compatibility!
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Frostech's glass surface treatment agent is a 3R chemical aimed at achieving zero emissions that is friendly to both the natural environment and the workplace.
This is a high-viscosity dedicated spin coater that uniformly applies high-viscosity polyimide with a viscosity of around 10,000 cP. It also achieves material savings with a rotating cup-type chuck!
Compatible with low to high viscosity resists! We can manufacture equipment for any wafer size, from small diameter to large diameter!
High-performance metal seals!! Ideal for various vacuum equipment and semiconductor manufacturing devices!
Always regenerate and reuse cleaning solvents! A cleaning machine that achieves high cleaning precision and reduces solvent consumption.
Super engineering plastic PEEK [square plate, natural black] standard material. A wide variety at low prices!
High rigidity general-purpose servo press machine ideal for precision press processing, deep drawing processing, and Thomson processing.
Further evolved, speed and stability.
High-speed high-resolution laser exposure device
Strong dust collection power, high dust collection efficiency, stable suction power! A dust collector that can be used for various applications.
High-precision alignment (within 1μm of the target) is now possible in all directions of X-Y-Z-θx-θy-θz.
Can be set up to 180℃! Leakless high-temperature compatible model.
A necessary item for lawn mower maintenance, used for intermediate finishing until the blade is sharpened!
Short delivery time available! Inline gas filter for high purity gas!
Leave the automation of metal polishing, grinding, and deburring to FUJIYA TECH.
Press the start button to automatically measure all items continuously! Introduction to the laser diode inspection device.
Contributes to shortening development/delivery times and reducing costs in the exposure processes of semiconductor manufacturing.
A circular rotating table made with aluminum honeycomb panels! Achieved both weight reduction and cost savings!
No special tools are required! The three processes of drilling, pulling, and end face machining can be easily performed with one machine.
A wide range of products from general ion-exchange type metal removal membranes to metal removal membranes specialized for semiconductor applications.
We will process SiC and GaN substrates using the CARE method!
Providing mass production solutions for high-speed and flexible substrate film deposition applications!
Carbon dioxide has excellent effects in preventing static electricity. This is a device that controls the resistivity of DIW by supplying CO2 gas through a hollow fiber membrane.
Carbon dioxide has excellent effects in preventing static electricity. It is a device that controls the specific resistance value of DIW by supplying CO2 gas through a hollow fiber membrane.
Compact and low operating torque high-pressure compatible needle valve H-300U series with integrated bonnet and PTFE packing, allowing for flow adjustment.
20MPa (maximum) compatible stainless steel 316, high-performance compact one-piece ball valve H-800 series. Three-way valves are also available.
The QC-LOK quick connector for instrumentation allows for easy locking with just a push, thanks to its high-performance, high-strength locking mechanism, enabling smooth and safe connections.
Device dimensions: 560W × 850D × 1300H
High precision and high rigidity frame structure with a tabletop machine! Achieved the creation of high-precision polished samples.
We provide service for Canon FPA3000 and Nikon NSR.
It brings smooth rotation to the rotating system of the optical vacuum deposition device, achieving improved yield and longer lifespan of the rotating system components.
Perfect for voltage measurement! The probe's stray capacitance is minimal + the impedance is infinite!
Proven results with a variety of chemical solutions! The reason for our low prices is that we handle everything in-house, from design to sales.
Supports low to high viscosity resist! Equipment can be manufactured for any wafer size!
Seamless uniform air discharge nozzle. Length can be freely adjusted in millimeter increments.
High-frequency cleaning machines suitable for precision cleaning (500kHz, 1MHz) ---- <<Test machine rental (for a fee), please contact us>>
FOUP/FOSB compatible wafer transfer system (300mm wafer transfer system)
Water-resistant grinding paper, grinding belts, grinding discs, and more are included! Catering to a wide range of grinding needs!
A probe card that excels at simultaneously measuring a large number of microchips created on a semiconductor wafer.
