It is possible to form thick film patterns by screen printing on ceramic substrates and thin film patterns using photolithography.
As the main methods of metallization processing, we can accommodate thick film pattern formation through screen printing, and thin film pattern formation through vacuum deposition, plating, photolithography, and etching.
In addition to pattern formation, we can also accommodate VIA filling, resistor formation, and through-hole formation.
We will propose the optimal metallization processing to achieve the desired functions and performance.
<Processing Specification Examples>
- Thin Film Metallization
Processing Accuracy: Line/Space = 30μm/30μm
Processing Method: Vacuum deposition (sputtering or evaporation) + plating + photolithography (resist formation, exposure, development) + etching
Other Processing: Through-hole formation (Φ0.1mm and above) / resistor formation
- Thick Film Metallization
Processing Accuracy: Line/Space = 100μm/100μm
Processing Method: Screen printing
Other Processing: VIA filling / resistor formation
*For more details, please refer to the catalog or website, or feel free to contact us.